Establishment of novel microscale surface treatment/processing technology with ultra-small plasma beam

新型超小等离子束微尺度表面处理/加工技术的建立

• 批准号: 12450288
• 负责人: TERASHIMA Kazuo
• 金额: $ 9.6万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2000
• 资助国家: 日本
• 起止时间: 2000 至 2001
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-12450288/
• 关键词: microscale plasma; VHF plasma; plasma optical emission spectroscopy; thermal plasma; cold plasma; microscale fabrication; VEFプラズマ; プラズマ発光分光; RFマイクロプラズマ; ピエゾシステム; 発光分光; 非平衡プラズマ

In this project, we performed an establishment of novel microscale surface treatment/processing technology with ultrta-small plasma beam as followed.(1) We generated various type small beam plasmas ranging from 2mm to 25μmφusing dc, ac, and VHF plasma generator. Especially, thermoelectron enhancede micrometer-scale plasma (TEMP), which had been proposed and developed by our group made it easy to generate a small size plasma. Examples of typical performances were as follows: (A) small size (from 2mm to 25μmφ). (B) multi probes (six). (C) low sustain power (1W).(2) The various plasmas (gas : N2, O2, Ar, power : 0.1-30W, gas flow : 0-1000sccm, preasure : 7600-40torr) were characterized by optical emission spectroscopy, which shows the various plasma conditions, such as typical plasma temperatures of three plasmas, namely as thermal, cold, and interface plasma. For instance, the gas temperature of Ar gas at 760torr was about 4000-5000K.(3) Using these ultra-small plasma beam, we succeeded various micro-processing as follows : (A) melting of metal (Fe, Al, Cu). (B) oxidization. (C) deposition (C-system).Especially, due to the advance of matching performance, far from the plasma generating electric source, we could generate such small plasma and performe surface-treatment as mentioned above.

在这个项目中，我们建立了一种新型的超小等离子体束微尺度表面处理/加工技术，具体如下：(1)特别是使用直流、交流和甚高频等离子体发生器产生从2mm到25μmφ的各种类型的小束等离子体。我们课题组提出并开发的热电子增强微米级等离子体（TEMP）可以很容易地产生小尺寸等离子体，其典型性能示例如下：（A）小尺寸。 （从2mm到25μmφ）。（B）多探头（6个）。（C）低维持功率（1W）。（2）各种等离子体（气体：N2，O2，Ar，功率：0.1-30W，气体流量： 0-1000sccm，压力：7600-40torr）通过光学发射光谱进行了表征，显示了各种等离子体条件，例如三个等离子体的典型温度等离子体，即热等离子体、冷等离子体和界面等离子体，例如，760托的Ar气体温度约为4000-5000K。(3)利用这些超小型等离子体束，我们成功地进行了如下各种微加工：( A）金属（Fe、Al、Cu）的熔化（B）氧化（C）沉积（C系统）。特别是，由于匹配性能的先进，远离等离子体产生电源。可以产生如此小的等离子体并进行如上所述的表面处理。