Development of STM operational in a plasma and its application to a control of plasma materials surface processing on an atomic scale

等离子体中运行的 STM 的开发及其在原子尺度上等离子体材料表面处理控制中的应用

• 批准号: 09555215
• 负责人: TERASHIMA Kazuo
• 金额: $ 6.14万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09555215/
• 关键词: Plasma environment; STM (scanning tunneling microscope); plasma-solid surface interface; etching; atomic image; plasma surface processing; 格子像; プラズマ-個体界面; プラズマ材料表面プロセシング

In this project, we performed the first attempt at the development of a scanning tunneling microscope (STM) for use under a plasma environment. The apparatus consists of an STM system and a radio-frequency (rf) (430MHz) plasma generation system housed in a vacuum chamber with a rotary pump. A special amplifier with a resolution of 10 femtoamp. up to 1kV is employed for tunneling current measurements. To prevent noise current from the plasma, the Pt-Ir probe tip is coated with epoxy grease and insulated glass using the sol-gel method except around its apex of about 3 mum. Under the conventional glow-plasma condition, the noise current from the plasma was deduced to be less than 0.1 nA during plasma exposure for 1800 sec. Using this apparatus, the step structure on a nanometer scale and atomic image of highly oriented pyrolytic graphite (HOPG) were obtained under rf, low-pressure (0.3 Tbrr) air glow plasma. We also discussed the role of the STM tip for successful, realistic "in situ" observation.

在这个项目中，我们首次尝试开发扫描隧道显微镜（STM），以在等离子体环境下使用。该设备由STM系统和射频（RF）（430MHz）等离子体生成系统组成，该系统容纳在带有旋转泵的真空室中。一个特殊的放大器，分辨率为10 femtoamp。多达1KV用于隧道电流测量。为了防止血浆中的噪声电流，使用SOL-GEL方法将PT-IR探针尖端涂在环氧油脂和绝缘玻璃中，除非其顶点约3妈妈。在常规的发光 - 血浆条件下，在1800秒的血浆暴露期间，血浆中的噪声电流低于0.1 Na。使用此设备，在RF下，在低压（0.3 tbrr）空光等离子体的RF下获得了高度定向热解石墨（HOPG）的纳米尺度和原子图像的阶跃结构。我们还讨论了STM尖端在成功，现实的“原位”观察中的作用。

项目成果

Y.Takamura, K.Hayasaki, K.Terashima, T.Yoshida: "Claster size measurement using microtrench method in a thermal plasma flash evaporation process." J.Vac.Sci.Technol.B. Vol15,N3. 558-565 (1997)

Y.Takamura、K.Hayasaki、K.Terashima、T.Yoshida：“在热等离子体闪蒸工艺中使用微沟槽方法测量碎石尺寸。”

K.Terashima: "HIGH RATE DEPOSITION OF THICK EPITAXIAL FILMS BY THERMAL PLASMA FLASH DEPOSITION" Pure and Applied Chemistry. 70/6. 1193-1197 (1998)

K.Terashima：“通过热等离子体闪光沉积实现厚外延薄膜的高速率沉积”纯粹与应用化学。

服部 伴之: "ホットクラスターエピタキシーによる高温超伝導体YBCO厚膜作製" 日本金属学会誌. 63/1. 68-73 (1999)

Tomoyuki Hattori：“通过热团簇外延制备高温超导体 YBCO 厚膜”，日本金属学会杂志 63/1（1999）。

K.Terashima: "Scanning tunneling microscopy operating under a plasma environment" Thin Solid Films. (印刷中). (1999)

K.Terashima：“在等离子体环境下运行的扫描隧道显微镜”薄固体薄膜（1999 年出版）。

N.Yamaguchi: "Scanning tanneling microscopy of YB_<a2> Cu_3O_<τ-x> clustor deposited by plasma flash eraporation method" J.Mater.Sci.Lett.17. 2067-2069 (1998)

N.Yamaguchi：“通过等离子体闪光蒸发法沉积的 YB_<a2> Cu_3O_<τ-x> 簇的扫描鞣制显微镜”J.Mater.Sci.Lett.17 2067-2069 (1998)。