Establishment of novel materials surface treatment/modification technology with using supercritical fluid plasma beam

超临界流体等离子体束新型材料表面处理/改性技术的建立

基本信息

批准号：
15360380
负责人：
TERASHIMA Kazuo
金额：
$ 9.86万
依托单位：
The University of Tokyo
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2003
资助国家：
日本
起止时间：
2003 至 2004
项目状态：
已结题

项目摘要

(1)Development of a Supercritical Fluid Dielectric Barrier Discharge Microplasma Processing DeviceWe have developed a supercritical fluid dielectric barrier discharge (DBD) microplasma processing device. Using this device, we applied optical emission spectroscopy (OES) to plasmas generated in high-pressure CO_2 environments up to supercritical condition. Two types of plasmas, namely, dielectric barrier discharge (DBD) and DC discharge were employed. Up to supercritical conditions, the spectra of C_2 molecule and atomic O were remarkable by optical emission spectroscopy of both types of discharge. Rotational temperature of C_2 was estimated as approximately 4000 K in DBD at 2.0 MPa.(2)Application of supercritical fluid plasmas to novel materials surface treatment & fabricationWe have applied two types of supercritical fluid plasmas, namely arc type & DBD type, to materials surface treatment and fabrication. Their dependences of process parameters, such as temperature, pressure, and frequency, on synthesized materials have been intensively investigated. Through these experiments, we have succeeded in carbon nanostructured materials, such as carbon nanotube and carbon nano-onion, synthesis and their thin films from scCO_2 as raw-materials at around 400K. In addition, metal film deposition has been also succeeded at around 400K.(3)Generation of Laser-induced supercritical fluid plasmaThe generation of laser-induced supercritical fluid plasma (for scCO_2 and scH_2O) has been successfully achieved. Moreover, SRS(Stimulated Raman Scattering) phenonema has been observed.

（1）开发超临界流体介电屏障排放的微质量处理设备，我们已经开发了超临界流体介电屏障排放（DBD）微质量处理设备。使用此设备，我们将光发射光谱（OES）应用于在高压CO_2环境中生成的等离子体，直到超临界条件。采用了两种类型的等离子体，即介电屏障放电（DBD）和直流排放。直到超临界条件，通过两种排放的光学发射光谱法，C_2分子和原子O的光谱显着。 C_2的旋转温度估计为2.0 MPa的DBD大约4000K。（2）将超临界流体等离子体应用于新型材料表面处理和制造中，我们应用了两种类型的超临界流体等离子体，即ARC Type＆DBD类型和DBD类型，用于材料表面处理和制造。他们对合成材料的过程参数（例如温度，压力和频率）的依赖性进行了深入研究。通过这些实验，我们成功地获得了碳纳米结构的材料，例如碳纳米管和碳纳米纳米碳，合成及其薄膜，从SCCO_2作为原始材料（约400K）作为原始物质。此外，金属膜的沉积也已在40万左右的大约40万。（3）激光诱导的超临界流体纤溶酶的产生激光诱导的超临界流体等离子体（对于SCCO_2和SCH_2O）已成功实现。此外，已经观察到SRS（刺激的拉曼散射）现象。