Development of modified magnetron-typed plasma source

改进型磁控管型等离子体源的研制

基本信息

批准号：
08558043
负责人：
SATO Noriyoshi
金额：
$ 8.96万
依托单位：
Tohoku University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 1998
项目状态：
已结题

项目摘要

A new plasma source named "modified magnetron-typed (MMT) radio frequency (RF) plasma source" which has following several advantages compared with other plasma sources is successfully developed.High-density plasma is easily produced and confined in a localized magnetic field supplied by permanent magnet rings which are annularly wounded on a cylindrical RF electrode. The effect of the magnetic field is, however, reduced on the surface of the substrate with a diameter of 12 inch. Changing the strength and spacing of the magnet rings controls plasma density profile. Two substrate plates are placed on both sides of the RF electrode. If necessary, one of them can be used as a subsidiary electrode for a control of the density uniformity.Ion energy distribution function (IEDF) hitting the RF electrode is also controlled by the magnetic fields, as a result of the change of sheath potential in front of the RF electrode, where the magnetic field is arranged parallel to the RF electrode surface. Therefore, the sputtering yield from the RF electrode as well as the : energy width of the JEDF can also be controlled by the magnetic field.Electron energy distribution function (EEDF) of the MMT plasma is easily controlled by changing the slit width of two cylindrical grids which are connected axially, separating a central plasma region from the plasma production region. The range of the EEDF variation is about one order of magnitude, and quite low electron temperature plasma is produced in the central region. Variation of the electron energy is confirmed by the optical emission method.

成功研制出一种新型等离子体源，名为“改进的磁控管型（MMT）射频（RF）等离子体源”，与其他等离子体源相比，它具有以下几个优点。在提供的局部磁场中很容易产生和限制高密度等离子体由环形缠绕在圆柱形射频电极上的永磁环组成。然而，在直径为 12 英寸的基板表面上，磁场的影响会减弱。改变磁环的强度和间距可以控制等离子体密度分布。两个基板放置在射频电极的两侧。如有必要，其中之一可用作辅助电极，用于控制密度均匀性。击中射频电极的离子能量分布函数 (IEDF) 也受磁场控制，这是由于射频电极中鞘层电势发生变化而导致的。 RF电极的前面，其中磁场平行于RF电极表面布置。因此，射频电极的溅射产率以及 JEDF 的能量宽度也可以通过磁场进行控制。MMT 等离子体的电子能量分布函数 (EEDF) 可以通过改变两个圆柱体的狭缝宽度来轻松控制。轴向连接的栅极，将中心等离子体区域与等离子体产生区域分开。 EEDF变化范围约为一个数量级，中心区域产生相当低的电子温度等离子体。电子能量的变化通过光发射法来确认。