The Establishment of C_<60> Plasma Production and Its Applications

C_<60>等离子体生产的建立及其应用

基本信息

批准号：
06402063
负责人：
SATO Noriyoshi
金额：
$ 21.12万
依托单位：
TOHOKU UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1994
资助国家：
日本
起止时间：
1994 至 1996
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-06402063/
关键词：
Production of C_<60> Plasma Dust Plasma Negative Ion Plasma Processing Production of New Materials with Unique Functions C_<60>生成

项目摘要

An ultrafine-particle plasma consisting of electrons, positive K^+ ions, and large negative C_<60>^- ions is produced by introducing "Buckminsterfullerene, C_<60>" particles into a low-temperature (<similar or equal>0.2eV) potassium plasma column confined by a strong axial magnetic field. When a new-type sublimation oven system with jets on four sides is used in order to control a plasma structure and achieve an efficient production of the K-fullerene plasma, K^+ and a large fraction of C_<60>^- are observed to broadly distribute across the magnetic-field lines in contrast with well-confined electrons. With an increase in the C_<60>^- fraction, the electron shielding decreases, yielding clear effects on plasma collective phenomena, which are demonstrated for ion-acoustic wave propagations and drift-type instabilities. It is also observed that a local production of large negative ions C_<60>^- results in the electrostatic potential formation along the magnetic-field lines.When biases of particle-deposition substrates immersed in the plasma consisting mainly of K^+ and C_<60>^- are varied with respect to local plasma potentials.on the other hand, K and C_<60> components of thin films formed are successfully controlled. In accordance with this bias control of fluxes of K^+ and C_<60>^- ions coming into contact with the substrate, drastic changes in thin-film structure and quality such as surface roughness and electrical conductivity are observed in the formation of K-C_<60> compounds. The substrate bias is also accompanied by energy control of the incoming K^+ and C_<60>^-ions. Due to this effect of selective acceleration of the ion species, K^+ with the ionic radius larger than a fullerene six-membered-ring radius is observed to be inserted into the C_<60>^+ cage, forming an air-stable endohedral metallofullerene K@C_<60> on the substrate.

通过将“ Buckminsterfullerene，c_ <60>”颗粒引入低温（<相似或等于> 0.2ev）钾等化剂，由“ buckmintterfullerene，c_ <60>”引入钾等化剂。当使用四个侧面的新型升华烤箱系统以控制等离子体结构并实现K-富勒烯等离子体的有效产生，k^+和大量C_ <60>^ - 在与良好结合的电子中相比之下。随着C_ <60>^ - 分数的增加，电子屏蔽量减少，从而对等离子体集体现象产生了明显的影响，这对于离子声波传播和漂移型的不稳定性证明了这一点。还观察到，局部生产大型负离子C_ <60>^ - 导致沿磁场线的静电电势形成。当颗粒沉积底物的偏差浸入血浆中，主要由K^+和C_ <60>^ - 由局部血浆电位而变化。根据对K^+和C_ <60>^ - 离子与底物接触的偏置控制，在K-C_ <60>化合物的形成中观察到了薄膜结构和质量等薄膜结构和质量（例如表面粗糙度和电导率）的急剧变化。底物偏置还伴随着传入的K^+和C_ <60>^ - 离子的能量控制。由于离子物种选择性加速的这种影响，观察到大于富勒烯六元环半径大的离子半径的k^+被插入C_ <60>^+笼子中，形成了空气稳定的内膜金属金属甲烯烃K@c_@c_@c_ <60> substrate上。