Plasma Production by New Type ECR Antenna for Large Area Uniform Processing

利用新型ECR天线进行等离子体生产，实现大面积均匀处理

• 批准号: 05558053
• 负责人: SATO Noriyoshi
• 金额: $ 10.37万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research (B)
• 财政年份: 1993
• 资助国家: 日本
• 起止时间: 1993 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-05558053/
• 关键词: Large-diameter uniform plasma; ECR plasma; Slotted antenna; Plasma processing; Etching; Energy control; Radical control; Electron temperature control; 大口径プラズマ; ECRプラズマ; 均一プラズマ; マイクロ波

The results using plane slotted ECR (Electron Cyclotron Resonance) antenna are summarized as follows ;(1)A uniform plasma with a diameter larger than 45cm is easily produced by using a smaller slotted sntenna of 15cm in diameter. This has an advantage in a practical use.(2)The plasma density increases with the microwave power in the range of 1kW owing to the antenna water-cooling system. A new type the ECR antenna structure which can be placed outside the vacuum chamber is discussed and designed for the high power operation.(3)Good plasma uniformity is obtained even in reactive plasma with O_2, CF_4, and N_2.(4)The uniformities of the plasma processing such as photoresist ashing in O_2 plasma, polysilicon etching in SF_6 plasma, and silicon and silicon dioxide etchings in CF_4 plasma are obtained within 5% over 45cm in diameter.(6)A new method for controlling electron and ion energy distribution functions is developed for a qualified plasma processing with radical and ion-assist chemical reactions, respectively. The electron and ion temperatures are found to be varied by one order of magnitude.

使用平面开槽的ECR（电子回旋谐振）天线的结果总结如下；（1）通过使用直径为15厘米的较小的槽网na轻松产生直径大于45厘米的均匀血浆。 （2）由于天线冷却系统，血浆密度随着1kW范围的微波功率而增加。一种新型的ECR天线结构，可以在真空室外放置并为高功率操作设计。（3）即使在具有O_2，CF_4和N_2的反应性等离子体中，也可以获得良好的血浆均匀性。（4）均匀性。（4）均匀性在O_2等离子体中的血浆加工，SF_6等离子体中的PolySilicon蚀刻以及CF_4等离子体中的硅和二氧化硅蚀刻的含量，在直径45cm的5％内获得了5％。分别针对具有自由基和离子辅助化学反应的合格等离子体加工而开发的功能。发现电子温度通过一个数量级变化。

项目成果

S. Hiyama: "Wide-area uniform plasma processing in an ECR plasma" Plasma Sources Science and Technology. (1996)

S. Hiyama：“ECR 等离子体中的广域均匀等离子体处理”等离子体源科学与技术。

A. Takahashi: "Control of ion energy in an ECR plasma" Proc. 12th Symp. on Plasma Processing. 241-244 (1995)

A. Takahashi：“ECR 等离子体中离子能量的控制”Proc。

中川行人: "ECRプラズマ源の特性評価とドライエッチングへの応用" 電気学会プラズマ研究会資料. EP-93-68. 29-38 (1993)

中川幸人：《ECR等离子体源的特性评价及其在干法蚀刻中的应用》日本电气工程师学会等离子体研究组资料EP-93-38（1993）。

N. Sato: "Uniform plasma produced by a plane slotted antenna with magnets for electron cyclotron resonance" Applied Physics Letters. 62. 1469-1471 (1993)

N. Sato：“带有用于电子回旋共振的磁体的平面开缝天线产生的均匀等离子体”《应用物理快报》。

S. Iizuka: "Plasma density increase in uniform ECR plasma of large diameter" Proc. 10th Symp. on Plasma Processing. 121-124 (1993)

S. Iizuka：“大直径均匀 ECR 等离子体中的等离子体密度增加”Proc。