Large-diameter plasma sourcs for plasma processing

用于等离子体处理的大直径等离子体源

• 批准号: 08044118
• 负责人: SATO Noriyoshi
• 金额: $ 0.64万
• 依托单位: Tohoku university
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for international Scientific Research
• 财政年份: 1996
• 资助国家: 日本
• 起止时间: 1996 至 无数据
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08044118/
• 关键词: Large-diameter plasma; Large-area uniform plasma; RF plasma; ECR plasma; Modified magnetron discharge; plasma materials processing; Radical measurment; Light emission spectroscopy

The productions of large-diameter, high density plasma are of crucial importance to establish a wide-area plasma processing. The object of this joint reseach is to develop new plasma sources for producing a large-diameter uniform plasma. The reseach has been proceeded by combining the plasma control techniques developed at Tohoku University for RF and ECR discharges with the diagnostic techniques developed at KAIST and KBSI,Korea, for detecting F-radicals by using a optical probe system. It is also quite important to clarify the relation between the distributions of plasma density and radical density.In order to carry out the experiment at Tohoku University, we produced a 60-cm-diameter MMT (Modifoed Magnetron Type) RF devices, where the conditions for producing a large-diameter plasma are inverstigated. It was found that the length of the RF electrode and the strenth of the magnetic field on the RF electrode are quite essential for the uniform plasma production. Is was also found that … More the production of high density plasma is possible when the RF impedance of a sub-electrode placed at the end of the machine was set at a parallel resonance with the RF frequency. We can produce a plasma of 10^<11>/cm^3 at the RF power of 500 W.Similar experiment was also carried out in a large chamber of 130 cm in diameter by using MMT RF discharge. We confirmed that a quite uniform plasma is prroduced over 120 cm in diameter with a uniformity of 5%.The profiles of F radicals in CF_4 plasmas were also measured in ECR and MMF RF discharge plasmas at Tohoku University in collaboration with the Korean staffs. The optical probe system was build up at the Tohoky University for the measurements. We found that the F radial profiles have a strong dependency on the gas pressuer. In order to confirm the relation between the actual etching profile of poli-silicon and the radical profile, the etching has been preformed under different conditions, and we found that a similar profile of etching with the radical density. Less

大直径，高密度等离子体的生产对于建立广泛的等离子体处理至关重要。该联合提议的目的是开发新的等离子体来源来产生大直径均匀等离子体。通过将在Tohoku University为RF和ECR排放开发的等离子控制技术与在Kaist和KBSI韩国开发的诊断技术相结合，用于通过使用光学探测系统来检测F-RADADICALES。阐明血浆密度和根部密度的分布之间的关系也很重要。在Tohoku University进行实验的情况下，我们生产了60厘米直径的MMT（Modifoed Magnetron型）RF设备，在该设备中，产生大分子等质量的条件是倒置的。发现RF电极的长度和RF电极上的磁场的弦对于均匀的血浆产生至关重要。还发现……当将放置在机器末端的子电极的RF阻抗设置为与RF频率的平行共振时，高密度等离子体的产生更多。我们可以在500 W的RF功率下产生10^<11>/cm^3的等离子体。同样的实验也通过使用MMT RF放电在直径为130 cm的大室中进行。我们证实，相当均匀的血浆直径超过120厘米，均匀性为5％。还测量了CF_4等离子体中F辐射的特征在ECR和MMF RF放电等离子体的Tohoku大学与韩国员工合作。光学探测系统是在Tohoky University建立的，用于测量。我们发现F径向轮廓对气体压力具有很强的依赖性。为了确认poli-silicon的实际蚀刻曲线与根部曲线之间的关系，蚀刻已在不同的条件下预先形成，我们发现与自由基密度相似的蚀刻曲线相似。较少的

项目成果

Yunlong Li: "Control of Plasma structure in modified magnetron-typed radio-frequency discharge" 1996 Int. Cont. on Plasma Physics. (in press). (1997)

李云龙：“改进磁控管型射频放电中等离子体结构的控制”1996 Int。

Jung-Hyung Kim: "The deposition of SiOF film with low dielectric constant in a helicon plasma" Applied Physics Letters. 68. 1507-1509 (1996)

Jung-Hyung Kim：“在螺旋等离子体中沉积低介电常数的 SiOF 薄膜”《应用物理快报》。

佐藤徳芳: "プロセス用大口径プラズマの生成と制御" 電子情報通信学会技術研究報告. 96. 43-50 (1996)

Noriyoshi Sato：“加工用大直径等离子体的产生和控制”IEICE 技术研究报告。 96. 43-50 (1996)。

Jung-Hyung Kim: "The deposition of SiOF film with low dielectric constant in a Helicon plasma" Appl. Phys. Lett.68. 1507-1509 (1996)

Jung-Hyung Kim：“在 Helicon 等离子体中沉积低介电常数的 SiOF 薄膜”Appl。

佐藤徳芳: "成膜用プラズマの制御" 第6回ファインプロセステクノロジー・ジャパン '96セミナー. R5. 4-8 (1996)

Noriyoshi Sato：“薄膜沉积的等离子体控制”第 6 届日本精细加工技术研讨会 R5 4-8 (1996)。