Developmental Study of Highly-Uniform Large-Diameter ECR Plasma Reactor

高均匀大直径ECR等离子体反应器的研制

• 批准号: 04555004
• 负责人: YASAKA Yasuyoshi
• 金额: $ 4.61万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research (B)
• 财政年份: 1992
• 资助国家: 日本
• 起止时间: 1992 至 1993
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-04555004/
• 关键词: Plasma process; ECR plasma; Large diameter; Microwave; Multi-cusp field

The purpose of this research is to develop a large diameter electron cyclotron resonance (ECR) plasma source for high-speed processing of 12 inch wafers. We have constructed a multi-annular (MA) antenna which consists of a concentric array of annular slits for microwave irradiation and of permanent magnets for multi-ring cusp magnetic field. The microwave at 2.45 GHz is fed via coaxial line and is distributed into the annular slits to encounter the ECR layr located 5 mm beyond the exit of the slits. Charged particles drift in azimuthal direction in the multi-ring cusp field. This leads to azimuthally symmetric plasma production. The microwave propagates from the slit to the ECR layr from high magnetic field side as R-waves. It is noted that the plasma is not produced inside the slits because the loss rate of charged particles is large due to proximity of slit walls.The plasma source using this MA antenna has produced a plasma of 30 cm in diameter with density n = 2*10^<11>cm^<-3> for Ar gas pressure 5*10^<-4> Torr. We measured plasma parameters by changing the number of the slits to find that the uniformity of the plasma is best for one slit at the outermost location. The uniformity is *10% for 30 cm diameter plasma with n = (8-10)*10^<10>cm^<-3> at 10 cm from the MA antenna. This result is consistent with a numerical calculation of the equation of continuity assuming an initial source profile determined by the slits.The MA antenna has been improved to AMA (adjustable MA) antenna, which has two annular slits at r =140 and 90 mm. Each slit is driven by a magnetron independently. This means that the radial profile of microwave power input is adjustable by simply changing the outputs of two magnetrons. By using AMA antenna, we have achieved plasma production with higher density, higher uniformity at shorter distance from the antenna.

这项研究的目的是开发大型电子回旋共振（ECR）血浆来源，用于高速处理12英寸晶片。我们已经构建了一个多隔离（MA）天线，该天线由用于微波辐照的环形缝隙和多环尖尖磁场的永久磁体组成。 2.45 GHz的微波炉通过同轴线喂食，并分布到环形缝隙中，以遇到缝隙出口以外的5 mm的ECR Layr。带电的颗粒在多环尖端的方位角方向上漂移。这导致方位角对称血浆产生。微波炉从高磁场侧作为R波从狭缝传播到ECR Layr。值得注意的是，由于缝隙壁的靠近，带电颗粒的损耗较大，因此血浆未产生。使用该MA天线的血浆源产生的血浆直径为30 cm，密度为n = 2*** 10^<11> CM^<-3>对于AR气压5*10^<-4> Torr。我们通过更改缝隙的数量来测量血浆参数，以发现血浆的均匀性最适合在最外部的位置一个缝隙。对于30 cm的血浆，均匀性为 *10％，n =（8-10） *10^<10> cm^<-3>在距MA天线10 cm时。该结果与假设由缝隙确定的初始源曲线对连续性方程的数值计算一致。MA天线已改进到AMA（可调节的MA）天线，该天线在r = 140和90 mm时具有两个环形缝隙。每个缝隙由磁控管独立驱动。这意味着微波功率输入的径向曲线可以通过简单地更改两个磁控负数的输出来调节。通过使用AMA天线，我们已经实现了血浆的产生，并具有较高的密度，距天线较短的均匀性较高。

项目成果

Y.Ushigusa: "Generation and Uniformity of a Large Diameter Plasma by Using Permanent Magnets" Proc.10th Symp.on Plasma Processing. 125-128 (1993)

Y.Ushigusa：“使用永磁体的大直径等离子体的生成和均匀性”Proc.10th Symp.on 等离子体处理。

Y.Ushigusa: "Large Diameter ECR Plasma Produced by Using Multi-Annular Antenna" Proc.2nd Int'l.Conf.on Reactive Plasmas. 537-540 (1994)

Y.Ushigusa：“使用多环天线产生的大直径 ECR 等离子体”Proc.2nd Intl.Conf.on Reactive Plasmas。

Y.Hara: "Two-Dimensional Simulation of ECR Plasma with Finite Electron Temperature" Proc.2nd Int'l.Conf.on Reactive Plasmas. 725-728 (1994)

Y.Hara：“具有有限电子温度的 ECR 等离子体的二维模拟”Proc.2nd Intl.Conf.on Reactive Plasmas。

Y.Yasaka: "Production and Pulse Control of ECR Plasmas for Processing" Proc.Joint Symp.of Elec.Assoc.in Kansai Block. S29 (1992)

Y.Yasaka：“用于加工的 ECR 等离子体的生产和脉冲控制”Proc.Joint Symp.of Elec.Assoc.in Kansai Block。

Y.Hara: "Two-Dimensional Simulation of ECR plasma with Finite Electron Temperature" Proc.2nd Int'l.Conf.on Reactive Plasmas. 725-728

Y.Hara：“有限电子温度下 ECR 等离子体的二维模拟”Proc.2nd Intl.Conf.on Reactive Plasmas。