Development of Simultaneous Removal System for Trace Gaseous and Particulate Contaminants by UV/Photoelectron Method

紫外/光电子法同时去除痕量气态和颗粒污染物系统的开发

• 批准号: 09555229
• 负责人: EMI Hitoshi
• 金额: $ 8.26万
• 依托单位: Kanazawa University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09555229/
• 关键词: UV; photoelectron method; Ion-induced nucleation; Simultaneous removal; Volatile organic compound (VOC); Subatmospheric pressure; Photocatalysis; 減圧場 光触媒

This research aims at developing a stocker built-in simultaneous removal system for organic gaseous and particulate contaminants by UV/photoelectron method under both normal and reduced pressures. In the first year, we conducted experiments on removal of gaseous and particulate matter under atmospheric pressure, and then obtained the result that the removal device has steadily high removal efficiency for them. In the second year, we modified the setup so that it can operate under subatmospheric pressure (until 20 torr) and performed experiments similar to the normal pressure conditions. As a result, it was shown that i) particle removal efficiency increased rapidly under 100 torr, ii) the numerical calculation of convective-diffusive equation for particles accounting for their charging efficiency can estimate their removal efficiency at each pressure, iii) the emission of UV/photoelectrons can suppress increase in contact angle of droplets on wafer set in the stocker, which is an index of its organic contamination, iv) the simultaneous usage of UV/photoelectron emitter and UV-irradiated titania can achieve extremely high efficiency for gaseous contaminants at both normal and reduced pressures.

这项研究旨在在正常压力和减轻压力下，通过紫外/光电子法开发一种储藏器内置的同时清除系统，以通过紫外线/光电子方法来开发有机气态和颗粒物污染物。在第一年，我们在大气压力下进行了气态和颗粒物的去除，然后获得了去除装置的稳定去除效率的结果。在第二年，我们修改了设置，以便它可以在亚光圈压力下（直到20个TORR）进行操作，并进行了类似于正常压力条件的实验。结果，结果表明，i）粒子的去除效率在100托尔下迅速提高，ii）粒子的对流 - 放射方程的数值计算，这些方程的粒子计算其充电效率可以估计它们在每种压力下的去除效率，iii）。紫外线/光电子可以抑制储藏室中晶圆片的接触角增加，这是其有机污染的索引，iv）同时使用UV/Pothelectron Emitter和UV-Irradiated Titania，可以实现极高的高效效率。在正常和减轻压力下。

项目成果

T.O.Kim,T.Ishida,M.Adachi,K.Okuyama,and J.H.Seinfeld: "Nanometer-Sized Particle Formation from NH_3/SO_2/H_2O/Air Mixtures by Ionizing Irradiation." Aerosol Sci.Technol.Vol.29 No.2. 111-125 (1998)

T.O.Kim、T.Ishida、M.Adachi、K.Okuyama 和 J.H.Seinfeld：“通过电离辐射从 NH_3/SO_2/H_2O/空气混合物中形成纳米颗粒。”

M.Shimada, K.Okuyama, M.Adachi and T.Fujii: "Aerosol Particle Removal at Reduced Pressure by an Electrical Precipitator Using UV/Photoelectron Method" Journal of Aerosol Science. Vol.29(S1). S1237-S1238 (1998)

M.Shimada、K.Okuyama、M.Adachi 和 T.Fujii：“使用紫外线/光电子方法通过电除尘器在减压下去除气溶胶颗粒”气溶胶科学杂志。

N.Namiki, Y.Otani, H.Emi, F.Yoshikawa and N.Ohigashi: "Removal of Indoor Volatile Organic Contaminants by UV-Irradiated Titania-Coated Honeycombs-Improvement of Photocatalytic Reactivity with Airborne Cations (in Japanese)" Kukiseijo. Vol.36(4). 267-273 (

N.Namiki、Y.Otani、H.Emi、F.Yoshikawa 和 N.Ohigashi：“通过紫外线照射的二氧化钛涂层蜂窝去除室内挥发性有机污染物 - 提高空气中阳离子的光催化反应性（日语）”Kukiseijo。

K.Okuyama,M.Shimada,A.Okita,Y.Otani and S.J.Cho: "Performance Evaluation of Cluster-DMA with Integrated Electrometer and Its Application to Ion Mobility Measurements" J.Aerosol Research,Japan. Vol.13(2). 83-93 (1998)

K.Okuyama、M.Shimada、A.Okita、Y.Otani 和 S.J.Cho：“使用集成静电计进行 Cluster-DMA 的性能评估及其在离子淌度测量中的应用”J.Aerosol Research，日本。

M.Shimada,K.Okuyama,Y.Inoue,M.Adachi and T.Fujii: "Removal of Aiborne Particles by a Device Using UV/Photoelectron Method under Reduced Pressure Conditions." Journal of Aerosol Science. Vol.30(3). 341-353 (1999)

M.Shimada、K.Okuyama、Y.Inoue、M.Adachi 和 T.Fujii：“在减压条件下使用 UV/光电子方法去除空气中的颗粒。”