Removal of Fine Particles from Surfaces by Consecutive Pulse Air Jets

通过连续脉冲空气喷射去除表面细颗粒

• 批准号: 05452301
• 负责人: EMI Hitoshi
• 金额: $ 2.5万
• 依托单位: Kanazawa University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1993
• 资助国家: 日本
• 起止时间: 1993 至 1994
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-05452301/
• 关键词: Dry surface cleaning; Particle removal; Pulse air jet; ウエハ; エアジェット

The present work is aimed at developing dry surface cleaning method with consecutive pulse air jet. The performance of air jet cleaning method was studied for various flat surfaces and particle materials. Major conclusion obtained by this work are ;1.Deposition process has little effect on the removal efficiency of particles from wafer.2.The ratio of drag force on particle to van der Waals force, F^*, is the key parameter to determine the removal efficiency of spherical particles from smooth flat surfaces.3.Electrostatic force between charged particles and surface does not affect removal efficiency because it is negligible compared to van der Waals force.4.Removal efficiency of spherical particle from rough surface depends on surface roughness relative to particle size.5.Since irregularity in particle shape affects both separation distance and contact area, the effect of particle shape on removal efficiency is not trivial. However, the influence of particle shape on removal efficiency becomes more significant as particle size decreases.

目前的工作旨在使用连续的脉冲空气射流开发干地面清洁方法。研究了空气清洁方法的性能，以用于各种平面和粒子材料。这项工作获得的主要结论是：1。沉积过程对颗粒从晶片中的去除效率几乎没有影响。2。拖力对粒子与范德华力与范德华力的比率F^*是确定球形颗粒从光滑平面表面中的去除效率的去除效率的关键参数。来自粗糙表面的球形粒子的粒子相对于粒径的表面粗糙度。5。由于粒子形状的不规则性会影响分离距离和接触面积，因此粒子形状对去除效率的影响并非微不足道。但是，随着粒径的降低，粒子形状对去除效率的影响变得更加显着。

项目成果

Otani,Y.et al.: "Removal of Fine Particles from Smooth Flat Surfaces by Consecutive Pulse Air Jets." Aerosol Science and Technology. (発表予定). (1995)

Otani, Y. 等人：“通过连续脉冲气溶胶科学与技术去除光滑平面上的细颗粒”（即将发表）。

大谷吉生: "パルスエアジェットによるウエハ表面からの微粒子の除去" 化学工学論文集. 19. 114-119 (1993)

Yoshio Otani：“通过脉冲空气喷射去除晶片表面的细颗粒”《化学工程杂志》19. 114-119 (1993)。

Otani,Y.et al.: "Removal of Fine Particles from Wafer Surface by Pulse Air Jets" KONA Power and Particle. No.12. 155-160 (1994)

Otani,Y.et al.：“通过脉冲空气喷射从晶圆表面去除细颗粒”KONA Power and Particle。

Otani,Y.et al.: "Removal of Fine Particles from Smooth Flat Surfaces by Consecutive Pulse Air Jets" Aerosol Science and Technology. (発表予定). (1995)

Otani, Y. 等人：“通过连续脉冲空气喷射去除光滑平坦表面上的细颗粒”，气溶胶科学与技术（即将发表）。

大谷吉生: "月刊Semiconductor World" (株)プレスジャーナル, 5 (1993)

大谷义夫：《半导体世界月刊》新闻杂志有限公司，5（1993）