Development of the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD

利用大气等离子体CVD制备EEM超细颗粒装置的开发

• 批准号: 06555038
• 负责人: MORI Yuzo
• 金额: $ 4.48万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research (B)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-06555038/
• 关键词: EEM; atmospheric plasma; ultra-fine particle; SiH_4; plasma CVD; 微細粉末

This study aims at making ultra-fine particles for EEM (Elastic Emission Machining). EEM is one of the most precision machining method, utilizing chemical reaction in solid phase between the particle surface and the work surface. So that chemical properties and reactivities of each surface atoms is very important. And it is neccesary to select the optimum combination of the particle and the work to achieve efficient machining properties.To protect atmospheric plasma from arc discharge, the electrode surface was coated with ceramics. And the appratus for making the ultra-fine particles for EEM utilizing atmospheric plasma CVD was realized. Using the appratus, it was found that ultra-fine particles (about 50nm in diameter) of Si was made from SiH_4, and that SiH_4 was decomposed more efficiently by using He than Ar as carrier gas. It was also found that to collect the ultra-fine particles just after the plasma region dispersively directly to the pure water (the atmospheric pressure's merit), the collection efficency of the ultra-fine particles was up to nearly 100%.

本研究旨在制造用于 EEM（弹性发射加工）的超细颗粒。 EEM是最精密的加工方法之一，利用颗粒表面和工作表面之间的固相化学反应。因此每个表面原子的化学性质和反应活性非常重要。为了实现高效的加工性能，必须选择颗粒和工件的最佳组合。为了保护大气等离子体免受电弧放电的影响，电极表面涂有陶瓷。并实现了利用大气等离子体CVD制备EEM用超细颗粒的装置。使用该装置发现SiH_4形成超细Si颗粒(直径约50nm)，并且使用He作为载气比使用Ar作为载气更有效地分解SiH_4。还发现，将等离子体区域后的超细颗粒直接分散到纯水中（大气压的优点）进行收集，超细颗粒的收集效率高达近100%。