Creation of Perfect Surfaces

创造完美表面

基本信息

批准号：
08CE2004
负责人：
MORI Yuzo
金额：
$ 1085.44万
依托单位：
Osaka University
依托单位国家：
日本
项目类别：
Grant-in-Aid for COE Research
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 2002
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08CE2004/
关键词：
Perfect surfaces Ultra precision machining Plasma CVM EEM Atmospheric pressure plasma CVD Electrochemical machining in ultrapure water First-principles molecular dynamics simulation Ultra clean technology 超純粋電解加工第一原理分子動力学シュミレーション STM

项目摘要

"Perfect surfaces"are required in various areas of advanced technology and basic science. The objectives of the present research are to establish new ultra precision machining technology that can be used to create "perfect surfaces" with roughness less than 0.5nm PV and figure accuracy higher than 0.01μm PV for arbitrary shape, and to systematize the technology of ultra precision machining as a new paradigm of natural science.We have constructed Ultra Clean Room with the world's top performance and conducted researches in the following fields ; 1) development of new machining process ; 2) evaluation of machined surfaces and development of new-surface evaluation techniques ; 3) development of measurement and control technology for machining process ; and 4) theoretical study of machining mechanism.In the field 1), we have developed numerically controlled plasma chemical vaporization machining NC-PCVM) system, elastic emission machining (EEM) system, atmospheric pressure plasma chemical … More vapor deposition (AP-PCVD) process at high deposition rates, and hydroxyl electrochemical machining (HECM) process using pure water only. Ultra precision X-ray mirrors, ultra thin SOI wafers, Si thin film solar cells, and HECM damascene process are highlighted as several of numerous outcomes. An ultra precision measuring sytem of figure accuracy and an evaluation system for ultra precisely machined surfaces have been developed in 2), and a diagnostic system for atmospheric pressure plasma in 3). Based on calculated results by the originally developed first-principles methods, we have proposed HECM and clarified its machining mechanism in 4).In summary, we have achieved to create a "perfect surface" with the roughness of three atomic layers (in 0.1μm x 0.1μm area) and the figure accuracy of 1nm PV. Cooperating with outer institutes that need perfect surfaces, we have produced a scanning X-ray microscope system and ultra thin SOI devices. These achievements well surpassed the objectives at the beginning. Less

在高级技术和基础科学的各个领域都需要“完美的表面”。本研究的目的是建立新的超精确加工技术，可用于创建小于0.5nm PV的“完美表面”，以高于0.01μmPV的数字准确性，并将超精度加工的技术系统化为自然科学的新范式。 1）开发新的加工过程； 2）评估机加工表面和新地下评估技术的开发； 3）开发用于加工过程的测量和控制技术； 4）加工机制的理论研究。在现场1），我们已经开发了单独控制的血浆化学蒸发加工NC-PCVM）系统，弹性发射加工（EEM）系统，大气压力等离子化学…更多的蒸气沉积（AP-PCVD）在高降低速率和Hydroxy Eleptrochemical PertanroChemical Machinentic（Hecm Machinnination（Hecm Machination）的过程中，更多的蒸气（AP-PCVD）过程。超过精确的X射线镜，超薄SOI水域，Si薄膜太阳能电池和Hecm Damascene工艺被突出显示为众多结果。在2）中开发了一个超精确加工表面的图形精度和评估系统的超精度测量系统，以及3）的大气压力等离子体的诊断系统。基于最初开发的第一原理方法计算的结果，我们提出了HECM并阐明了其4）的加工机制。总而言之，我们已经创建了一个“完美的表面”，具有三个原子层的粗糙度（在0.1μmx0.1μm面积）和1NM PV的数字准确度。与需要完美表面的外部机构合作，我们制作了扫描X射线显微镜系统和超薄SOI设备。这些成就一开始就超过了目标。较少的