Creation of Perfect Surfaces

创造完美表面

基本信息

批准号：
08CE2004
负责人：
MORI Yuzo
金额：
$ 1085.44万
依托单位：
Osaka University
依托单位国家：
日本
项目类别：
Grant-in-Aid for COE Research
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 2002
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08CE2004/
关键词：
Perfect surfaces Ultra precision machining Plasma CVM EEM Atmospheric pressure plasma CVD Electrochemical machining in ultrapure water First-principles molecular dynamics simulation Ultra clean technology 超純粋電解加工第一原理分子動力学シュミレーション STM

项目摘要

"Perfect surfaces"are required in various areas of advanced technology and basic science. The objectives of the present research are to establish new ultra precision machining technology that can be used to create "perfect surfaces" with roughness less than 0.5nm PV and figure accuracy higher than 0.01μm PV for arbitrary shape, and to systematize the technology of ultra precision machining as a new paradigm of natural science.We have constructed Ultra Clean Room with the world's top performance and conducted researches in the following fields ; 1) development of new machining process ; 2) evaluation of machined surfaces and development of new-surface evaluation techniques ; 3) development of measurement and control technology for machining process ; and 4) theoretical study of machining mechanism.In the field 1), we have developed numerically controlled plasma chemical vaporization machining NC-PCVM) system, elastic emission machining (EEM) system, atmospheric pressure plasma chemical … More vapor deposition (AP-PCVD) process at high deposition rates, and hydroxyl electrochemical machining (HECM) process using pure water only. Ultra precision X-ray mirrors, ultra thin SOI wafers, Si thin film solar cells, and HECM damascene process are highlighted as several of numerous outcomes. An ultra precision measuring sytem of figure accuracy and an evaluation system for ultra precisely machined surfaces have been developed in 2), and a diagnostic system for atmospheric pressure plasma in 3). Based on calculated results by the originally developed first-principles methods, we have proposed HECM and clarified its machining mechanism in 4).In summary, we have achieved to create a "perfect surface" with the roughness of three atomic layers (in 0.1μm x 0.1μm area) and the figure accuracy of 1nm PV. Cooperating with outer institutes that need perfect surfaces, we have produced a scanning X-ray microscope system and ultra thin SOI devices. These achievements well surpassed the objectives at the beginning. Less

先进技术和基础科学的各个领域都需要“完美表面”，本研究的目标是建立新的超精密加工技术，可用于创建粗糙度低于0.5nm PV和形状精度的“完美表面”。任意形状的PV值均高于0.01μm，并将超精密加工技术系统化，成为自然科学的新范式。我们建造了具有世界顶尖性能的超洁净室，并在以下领域进行了研究； 1）新加工工艺的开发；2）加工表面的评估和新表面评估技术的开发；3）加工过程测量和控制技术的开发；4）加工机理的理论研究。我们开发了数控等离子体化学汽化加工（NC-PCVM）系统、弹性发射加工（EEM）系统、高沉积速率的常压等离子体化学气相沉积（AP-PCVD）工艺以及羟基仅使用纯水的超精密 X 射线镜、超薄 SOI 晶圆、硅薄膜太阳能电池和 HECM 镶嵌工艺是形状精度和超精密测量系统中的几个。 2) 中开发了超精密加工表面的评估系统，3) 中开发了大气压等离子体诊断系统。基于最初开发的第一原理方法的计算结果，我们提出了 HECM 和4）阐明了其加工机理。综上所述，我们与外部机构合作，实现了三原子层粗糙度（0.1μm x 0.1μm区域）和1nm PV的图形精度的“完美表面”。由于需要完美的表面，我们生产了扫描X射线显微镜系统和超薄SOI器件，这些成就远远超出了最初的目标。