Fabrication of Photonic Crystals by Selective-Area Metalorganic Vapor Phase Epitaxy and Their Application to Devices
选择性区域金属有机气相外延制备光子晶体及其在器件中的应用
基本信息
- 批准号:15206030
- 负责人:
- 金额:$ 32.12万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (A)
- 财政年份:2003
- 资助国家:日本
- 起止时间:2003 至 2005
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
We have established a method to fabricate two-dimensional crystals (2D-PhCs) and 2D-PhC slabs (2D-PhCs) by utilizing selective area metalorganic vapor phase epitaxial (SA-MOVPE) and investigated their optical properties. By doing SA-MOVPE growth on GaAs (111)B or InP(111)B substrates partially covered with periodic array of hexagonal masks, we have fabricated air-hole array of GaAs- and InP-based semiconductors. If the SA-MOVPE is carried out on sacrificial AIGaAs layer, For GaAs-based 2D-PhCs, we have succeeded in the fabrication of air-bridge-type 2D-PhCs and 2D-PhCs with line-defect and point-defect structures. We also have succeeded in the formation of GaAs/AlGaAs quantum wells with periodic air-holes and confirmed their photoluminescence (PL). InP- based 2D-PhCs with period of 400-500nm were also successfully formed after optimization of growth conditions. Emission from InP/InGaAs quantum well structures embedded in 2D-PhC was also fabricated and their optical properties were inve … More stigated PL, demonstrated that this structure is promising for the application of photonic devices operating in the optical-fiber communication wavelength. In addition, GaAs- and InP- based 2D-PhCs constructed from periodic array of hexagonal pillar arrays were also fabricated by SA-MOVPE on (111)B GaAs and (111)A InP substrates, respectively, where array of circular mask opening are defined. In particular, for GaAs-based pillar-type 2D-PhCs, it was found that the light emission from GaAs/AIGaAs quantum wells formed on the top of the pillars is found to dependent on the pitch of the pillar arrays and is enhanced by factor of 10 as compared to the reference planar structure. This phenomenon is qualitatively understood by the enhancement of light-extraction efficiency originating from the formation of photonic bandstructure by the introduction of the periodic structure on the top of high-index slabs. The optical properties 2D-PhCs and 2D-PhCSs, such as photonic bandstructures, dispersion of line-defect waveguides, transmittance and reflectivity, are also investigated theoretically using finite-difference-time-domain method, plane-wave expansion method, and scattering matrix method to understand the optical properties of 2D-PhCs and 2D-PhCSs, including a proposal of modified effective index method applicable to 2D-PhCs with high index contrasts. Less
我们已经建立了通过使用选择器金属有机蒸气相(SA-MOVPE)来制造二维晶体(2D-PHC)和2D-PHC板(2D-PHC),并通过对其光学特性进行了调查。 (111)B或INP(111)基于INP的半导体与周期性空气孔形成了GAAS/ALGAAS量子,并在优化生长条件后确认了REM。在光纤维通信波长中运行的更多stig柱设备。此外,由六边形支柱阵列周期性阵列构建的GAAS和IND 2D的2D-PHC是(111)B GAA和(111)尤其是定义的,对于基于GAA的支柱型2D-PHC,发现GAAS/AIGAAS量子的光发射在支柱顶部。结构。 -Defect波导,透射率和反射率,ARSO使用有限的时间域 - 波扩展方法和散射矩阵方法研究了理论,以了解2D-PHCS和2D-PHCS的光学特性,包括适用于修改的有效索引方法的建议。高指数对比度的2D-PHC。
项目成果
期刊论文数量(106)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Fabrication of semiconductor Kagome lattice structure by selective area metalorganic vapor phase epitaxy
- DOI:10.1063/1.1593823
- 发表时间:2003-07
- 期刊:
- 影响因子:4
- 作者:P. Mohan;F. Nakajima;M. Akabori;J. Motohisa;T. Fukui
- 通讯作者:P. Mohan;F. Nakajima;M. Akabori;J. Motohisa;T. Fukui
Growth of GaAs/AlGaAs hexiagonal pillars on GaAs (111)B surfaces by selective-area MOVPE
通过选择性区域 MOVPE 在 GaAs (111)B 表面生长 GaAs/AlGaAs 六角柱
- DOI:
- 发表时间:2004
- 期刊:
- 影响因子:0
- 作者:Ryusuke Yamauchi;Seiichi Hata;Junpei Sakurai;Akira Shimokohbe;Junichi Motohisa
- 通讯作者:Junichi Motohisa
Photoluminescnce from single hexagonal nano-wire grown by selective area MOVPE
选择性区域 MOVPE 生长的单六角形纳米线的光致发光
- DOI:
- 发表时间:2005
- 期刊:
- 影响因子:0
- 作者:山本尊博;Shankar Devasenathipathy;佐藤洋平;菱田公一;S.Hara
- 通讯作者:S.Hara
Selective area MOVPE growth of InP and InGaAs pillar structures for InP-based two-dimensional photonic crystals
用于 InP 基二维光子晶体的 InP 和 InGaAs 柱结构的选择性区域 MOVPE 生长
- DOI:
- 发表时间:2004
- 期刊:
- 影响因子:0
- 作者:Junpei Sakurai;Seiichi Hata;Ryusuke Yamauchi;Akira Shimokohbe;Masaru Inari
- 通讯作者:Masaru Inari
Premila Mohan: "Fabrication of semiconductor Kagome lattice structure by selective area metalorganic vapor phase epitaxy"Applied Physics Letters. 83・4. 689-691 (2003)
Premila Mohan:“通过选择性区域金属有机气相外延制造半导体 Kagome 晶格结构”《应用物理快报》83・4(2003 年)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
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MOTOHISA Junichi其他文献
MOTOHISA Junichi的其他文献
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{{ truncateString('MOTOHISA Junichi', 18)}}的其他基金
Fabrication of nanowire-based light emitting nanodevices
基于纳米线的发光纳米器件的制造
- 批准号:
24360114 - 财政年份:2012
- 资助金额:
$ 32.12万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Exploration of novel materials for photochemical water splitting based on semiconductor nanowires and nanostructures
基于半导体纳米线和纳米结构的光化学分解水新型材料的探索
- 批准号:
24656196 - 财政年份:2012
- 资助金额:
$ 32.12万 - 项目类别:
Grant-in-Aid for Challenging Exploratory Research
Development of Quantum Integrated Hardwares based on Semiconductor Nanowires
基于半导体纳米线的量子集成硬件的开发
- 批准号:
19206031 - 财政年份:2007
- 资助金额:
$ 32.12万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Formation of Photonic Crystals by Selective Area Growth and Their Applications
选择性区域生长光子晶体的形成及其应用
- 批准号:
12450117 - 财政年份:2000
- 资助金额:
$ 32.12万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Fabrication of Ultrasmall Compound Semiconductor Nanostructures with Controlled Interfaces and Characterization of Their Electronic Properties
具有受控界面的超小型化合物半导体纳米结构的制造及其电子特性的表征
- 批准号:
06452208 - 财政年份:1994
- 资助金额:
$ 32.12万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
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使用量子点结构的新功能光交叉连接
- 批准号:
17360169 - 财政年份:2005
- 资助金额:
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Research and development of semiconductor digital all-optical devices and integrated circuits
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Study of Wide Bandwidth All Optical Wavelength Converter using Low Dimensional Quantum Well Structure
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- 批准号:
13650353 - 财政年份:2001
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Formation of Photonic Crystals by Selective Area Growth and Their Applications
选择性区域生长光子晶体的形成及其应用
- 批准号:
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- 资助金额:
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Conventional and selective area LP-MOVPE growth of InGaAsP/InAsP/InP reduced dimensionality structures for optoelectronic device develop- ment
用于光电器件开发的 InGaAsP/InAsP/InP 降维结构的常规和选择性区域 LP-MOVPE 生长
- 批准号:
181291-1995 - 财政年份:1997
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