MRI:Acquisition of X-ray for Photoelectron Spectrometer

MRI：采集 X 射线用于光电子能谱仪

• 批准号: 0923510
• 负责人: Julia Fulghum
• 金额: $ 32.2万
• 依托单位: University of New Mexico
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-09-15 至 2012-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0923510&HistoricalAwards=false
• 关键词: MRI; Acquisition; ray; Photoelectron; Spectrometer

0923510FulghumThis proposal solicits funding to obtain an X-ray Photoelectron Spectrometer (XPS) for a Surface Characterization Facility associated with the Center for Emerging Energy Technologies (CEET) at the University of New Mexico (UNM). X-ray photoelectron spectroscopy (XPS) is one of the only surface-specific spectroscopic techniques that provides readily interpretable, quantitative chemical information. Advances in instrumentation in the last decade mean that high spatial and energy resolution data can be acquired for the analysis of heterogeneous samples, including biointerfaces, complex composite materials, nanostructured materials, ceramics, and catalysts. A spatial resolution of several microns is possible in XPS images, while angle-resolved XPS (ARXPS) can be used for non-destructive depth profiling of the top ~ 8 nm of the sample. The applicants propose to replace the current XPS, a 12 year-old Kratos AXIS Ultra with a Kratos AXIS Ultra DLD. The current UNM Surface Characterization facility is the only XPS facility at an educational institution in the state of New Mexico, and is available to faculty throughout the state. Replacing this instrument thus impacts a wide range of research projects. The PI has over twenty years of experience with XPS and the development of methods for the analysis of complex samples, and the current facility manager will be supervising the establishment of the new Surface Characterization Facility.

0923510Fulghum 该提案筹集资金，为新墨西哥大学 (UNM) 新兴能源技术中心 (CEET) 相关的表面表征设施购买 X 射线光电子能谱仪 (XPS)。 X 射线光电子能谱 (XPS) 是唯一可提供易于解释的定量化学信息的表面特定光谱技术之一。过去十年仪器仪表的进步意味着可以获得高空间和能量分辨率数据来分析异质样品，包括生物界面、复杂复合材料、纳米结构材料、陶瓷和催化剂。 XPS 图像的空间分辨率可以达到几微米，而角度分辨 XPS (ARXPS) 可用于对样品顶部约 8 nm 进行无损深度分析。申请人提议用 Kratos AXIS Ultra DLD 替换当前的 XPS（已使用 12 年的 Kratos AXIS Ultra）。目前的新墨西哥大学表面表征设施是新墨西哥州教育机构中唯一的 XPS 设施，可供全州教师使用。因此，更换该仪器会影响广泛的研究项目。该 PI 在 XPS 和复杂样品分析方法开发方面拥有二十多年的经验，现任设施经理将监督新表面表征设施的建立。