The Fabrication of Multicomponent Oxide Films by Computer- Controlled Dual Ion Beam Sputter Deposition

计算机控制双离子束溅射沉积多组分氧化膜

• 批准号: 8807367
• 负责人: Angus Kingon
• 金额: $ 44.84万
• 依托单位: North Carolina State University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1989
• 资助国家: 美国
• 起止时间: 1989-02-15 至 1992-10-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8807367&HistoricalAwards=false
• 关键词: Fabrication; Multicomponent; Oxide; Films; Computer

The objective of this proposed research is to investigate the deposition of superconducting and ferroelectric thin films via computer controlled dual ion beam sputter deposition. This new and evolving technology should allow deposition of high quality, multi-component oxide (not limited to oxides) films with carefully controlled stoichiometries, with homogeneous or modulated/superlattice structures, and under conditions (e.g., low temperatures) compatible with integrated device processing. Detailed characterization of the structure, chemistry, and electrical properties of the films will be done.

本研究的目的是研究通过计算机控制的双离子束溅射沉积来沉积超导和铁电薄膜。 这种不断发展的新技术应该能够沉积高质量、多组分氧化物（不限于氧化物）薄膜，其化学计量精心控制，具有均匀或调制/超晶格结构，并且在与集成器件处理兼容的条件（例如低温）下。 将对薄膜的结构、化学和电性能进行详细表征。