Deep x-ray lithography for high aspect ratio applications

适用于高深宽比应用的深度 X 射线光刻

• 批准号: 327243-2009
• 负责人: Achenbach, Sven
• 金额: $ 2.77万
• 依托单位: University of Saskatchewan
• 依托单位国家: 加拿大
• 项目类别: Discovery Grants Program - Individual
• 财政年份: 2015
• 资助国家: 加拿大
• 起止时间: 2015-01-01 至 2016-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=571959
• 关键词: Deep; ray; lithography; aspect; ratio

Our technologically driven world constantly demands improved performance in all classes of devices ranging from cellular phones to automotive sensors and from medical implants to hard disk read/write heads. This generally requires reduced geometric dimensions, and micro- and nanotechnology are therefore more and more often replacing conventional fabrication technologies. One fabrication approach delivering outstanding structure quality, and therefore device performance, is deep X-ray lithography (XRL) and the LIGA process. These techniques will finally be available in Canada as SyLMAND, the Synchrotron Laboratory for Micro and Nano Devices at the Canadian Light Source in Saskatoon, gets operational. XRL technologies allow for a broad range of applications, but still require significant research efforts to fully exploit the potential. Dr. Sven Achenbach therefore designed SyLMAND to become a unique research facility. His research will partly focus on XRL mask fabrication. Its quality limits the final results of the microstructures, and therefore needs to get optimized. Key issues include minimum micro feature resolution and maximum overall mask size. Better resolution allows for smaller, more advanced devices and better tolerances in larger components. Larger mask areas enable more devices to be processed at a time, or more complicated, distributed structures. At the same time, the technology must enable reliable and cost-effective mask fabrication, both of which impose major challenges. SyLMAND offers unique capabilities to develop and apply advanced masks. To effectively apply micro technology, individual micro components fabricated with an optimized mask need to get integrated into more complex micro systems. This is particularly complicated in XRL, and related research is an additional thrust. Results from the mask technology and systems integration areas will get merged to collaboratively develop next-generation wireless devices which are required, for instance, in cellular phones and wireless LANs.

我们技术驱动的世界不断地要求在从蜂窝电话到汽车传感器以及从医疗植入物到硬盘读/写头的所有类别设备的性能提高。因此，这通常需要减小的几何维度，因此微技术和纳米技术越来越多地取代常规制造技术。一种提供出色的结构质量以及因此设备性能的制造方法是深X射线光刻（XRL）和LIGA工艺。这些技术最终将在加拿大以Sylmand的形式提供，这是萨斯卡通加拿大光源的微型和纳米设备的同步实验室，可以运行。 XRL技术允许广泛应用，但仍需要进行大量研究工作以充分利用潜力。因此，Sven Achenbach博士设计了Sylmand，以成为一个独特的研究机构。他的研究将部分关注XRL面具制造。它的质量限制了微观结构的最终结果，因此需要优化。关键问题包括最小的微功能分辨率和最大总体面罩大小。更好的分辨率允许更小，更先进的设备和较大组件的公差更好。较大的掩模区域使一次可以处理更多的设备，或者更复杂的分布式结构。同时，该技术必须实现可靠且具有成本效益的面具制造，这两者都构成了重大挑战。 Sylmand提供了开发和施加高级口罩的独特功能。 为了有效地应用微技术，用优化面膜制造的单个微分组件需要集成到更复杂的微型系统中。这在XRL中尤其复杂，相关研究是另一种推力。 蒙版技术和系统集成区域的结果将合并，以共同开发下一代无线设备，例如在蜂窝电话和无线LAN中所需的。