DEVELOPMENT OF THERMAL EXPANSION MEASUREMENT SYSTEM FOR CERAMIC THIN FILM

陶瓷薄膜热膨胀测量系统的研制

• 批准号: 07555195
• 负责人: HANADA Teiichi
• 金额: $ 6.27万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1996
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555195/
• 关键词: THERMAL EXPANSION OF THIN FILM; INTERFEROMETER; THERMAL EXPANSION COEFFICIENT; SPUTTERING; AMORPHOUS ALUMINA FILM; 基板上薄膜; 膜中応力; 熱膨張; 薄膜; レーザー干渉計; 熱膨張測定装置; 干渉縞; セラミックス; 基板

Ceramic thin film is expected to be used increasingly in future as optical materials as well as electronic materials. In both uses, there are many opportunities when ceramic thin film is used for at a higher and a lower temperatures or under corrosive atmosphere. Accordingly, in addition to improvement of mechanical properties of the film, matching of the thermal expansion coefficient between a substrate and a film which gives influence to adhesion forces between them and stress distribution in the film becomes an important problem. A aim of this study is the development of the thermal expansion measurement system for the thin film which sticks to a substrate. In order to obtain thermal expansion coefficient of the film, the temperature change of radius of curvature of curve of the film-substrate composite placed in an electric furnace was measured by means of laser interferometer. Availability of the measurement system was examined using sputtered amorphous silica thin film on the silica glass substrate. Furthermore, we reported the value of thermal expansion coefficient of sputtered amorphous alumina film of about 1 mum thickness on silica glass substrate obtained using this newly-constructed measurement system.

陶瓷薄膜预计将来将越来越多地用作光学材料和电子材料。在这两种用途中，当陶瓷薄膜用于较高和较低的温度或腐蚀性氛围时，都有很多机会。因此，除了改善膜的机械性能外，底物和膜之间的热膨胀系数匹配，从而影响它们之间的粘附力和膜中的应力分布成为一个重要问题。这项研究的目的是粘贴在基板上的薄膜的热膨胀测量系统的开发。为了获得膜的热膨胀系数，通过激光干涉仪测量放置在电炉中的膜底物复合曲线曲线半径的温度变化。使用二氧化硅玻璃基板上的溅射的无定形二氧化硅薄膜检查了测量系统的可用性。此外，我们报道了使用这种新构造的测量系统获得的硅胶玻璃基板上约1 MM厚度的溅射无形氧化铝膜的热膨胀系数的值。

项目成果

篠田拓也: "Young's modulus of Rf-Sputtered Amorphous Thin Films in SiO_2-Y_2O_3 System st High Temperature" Thin Solid Films. (印刷中).

Takuy​​a Shinoda：“SiO_2-Y_2O_3 系统高温下射频溅射非晶薄膜的杨氏模量”固体薄膜（正在出版）。

T.Shinoda, S.Tanabe, N.Soga and T.Hanada: "Young's modulus of Rf-Sputtered Amorphous Thin Films in SiO_2-Y_2O_3 System at High Temperature" Thin Solid Films. (in press).

T.Shinoda、S.Tanabe、N.Soga 和 T.Hanada：“高温下 SiO_2-Y_2O_3 体系中射频溅射非晶薄膜的杨氏模量”固体薄膜。