Preparation of Amorphous Thin Films with High Elasticity
高弹性非晶薄膜的制备
基本信息
- 批准号:03650623
- 负责人:
- 金额:$ 1.22万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for General Scientific Research (C)
- 财政年份:1991
- 资助国家:日本
- 起止时间:1991 至 1992
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Among various properties of solid materials, elastic properties such as Young's modulus, bulk modulus, shear modulus and Poisson's ratio are of considerable interest from both scientific and technical aspects. It is known that the glasses containing the constituents with high bond strength and/or having high coordinated state of network forming cations could achieve high elastic moduli. However, since it is not easy to make the glasses with high coordinated state of cations by ordinary melting-quenching procedure, other glass making processes such as sputtering, CVD and sol-gel methods have to be explored. In this project, radio-frequency sputtering method was applied to make amorphous thin films in the systems Al_203-AlN and Al_2O_3-TiO_2. The elastic moduli commonly increase as nitrogen is introduced into a glass. However, in the Al_2O_3-AlN system, the elastic moduli decreased as AlN was added to amorphous Al_2O_3. This result can be successful to be explained by decrease of the higher coordinated aluminum ions. On the other hand, the high coordinated state of cations could be achieved in rf-sputtered amorphous films in the system Al_2O_3-TiO_2, and their elastic moduli were measured. The amorphous film of 16Al_2O_3.84TiO_2 showed the maximum value of Young's modulus, 175GPa, in this system, which is higher than any other glass ever known.
在固体材料的各种特性中,诸如Young的模量,散装模量,剪切模量和Poisson的比例等弹性特性都引起了科学和技术方面的极大兴趣。众所周知,含有高键强度和/或具有高配位网络形成阳离子状态的成分的玻璃可以实现高弹性模量。但是,由于通过普通熔化程序制作具有高配位阳离子的眼镜并不容易,因此必须探索其他玻璃制作过程,例如溅射,CVD和SOL-GEL方法。在此项目中,应用射频溅射方法用于在系统AL_203-ALN和Al_2O_3-TIO_2中制作无定形薄膜。弹性模量通常会随着氮引入玻璃而增加。但是,在AL_2O_3-ALN系统中,弹性模量随着ALN的添加到无定形的Al_2O_3时降低。通过较高协调的铝离子减少,可以成功解释该结果。另一方面,在系统AL_2O_3-TIO_2中的RF输出的无定形膜中可以实现高配位阳离子状态,并测量其弹性模量。在该系统中,16AL_2O_3.84TIO_2的无定形膜显示了Young的模量175GPA的最大值,该模量比任何其他已知的玻璃都高。
项目成果
期刊论文数量(11)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
花田 禎一: "Amorphous Al_2O_3-Tio_2 film with high Young´s modulus" Chemistry Express. 7. 589-592 (1992)
Teiichi Hanada:“具有高杨氏模量的非晶 Al_2O_3-Tio_2 薄膜”《化学快报》7. 589-592 (1992)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
花田 禎一: "Elastic moduli of rf-sputtered amorphous films in the system Al_2O_3-TiO_2" J.Non-Cryst.Solids. 152. 188-194 (1993)
Teiichi Hanada:“Al_2O_3-TiO_2 系统中射频溅射非晶薄膜的弹性模量”J.Non-Cryst.Solids 152. 188-194 (1993)
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
T.Hanada, M.Kobayashi, S.Tanabe and N.Soga: "Measurement of Elastic Modulus of Amorphous AlPO_4 Thin Film at Elevated Temperature" Proceedings of the 34th Japan Congress on Materials Research. 131-135 (1991)
T.Hanada、M.Kobayashi、S.Tanabe 和 N.Soga:“高温下非晶 AlPO_4 薄膜弹性模量的测量”第 34 届日本材料研究大会论文集。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
花田 禎一: "Preparation and physical properties of rf-sputtered amorphous films in the Al_2O_3-AlN system" Journal of Non-Crystalline Solids. 135. 227-235 (1991)
Teiichi Hanada:“Al_2O_3-AlN 系统中射频溅射非晶薄膜的制备和物理性质”非晶固体杂志 135. 227-235 (1991)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
花田 禎一: "Preparation and physical properties of rfーsputtered amorphous films in the Al_2O_3ーAlN system" Journal of NonーCrystalline Solids. 135. 227-235 (1991)
Teiichi Hanada:“Al_2O_3-AlN 系统中射频溅射非晶薄膜的制备和物理性质”非晶固体杂志 135. 227-235 (1991)。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
数据更新时间:{{ journalArticles.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ monograph.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ sciAawards.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ conferencePapers.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ patent.updateTime }}
HANADA Teiichi其他文献
HANADA Teiichi的其他文献
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
{{ truncateString('HANADA Teiichi', 18)}}的其他基金
Design of high gain optical Amplifier materials by control of 4f erectronic transition probability of rare earth doped glasses
控制稀土掺杂玻璃4f电子跃迁概率的高增益光放大器材料设计
- 批准号:
08650989 - 财政年份:1996
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
DEVELOPMENT OF THERMAL EXPANSION MEASUREMENT SYSTEM FOR CERAMIC THIN FILM
陶瓷薄膜热膨胀测量系统的研制
- 批准号:
07555195 - 财政年份:1995
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Development of the System for Measuring Elastic Modulus of Ceramics Thin Films under the Various Atmospheres
各种气氛下陶瓷薄膜弹性模量测量系统的研制
- 批准号:
63850166 - 财政年份:1988
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research
Behavior of Sputtered Species and Formation of Amorphous Films
溅射物质的行为和非晶态薄膜的形成
- 批准号:
62470063 - 财政年份:1987
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)
相似国自然基金
基于功率编码的射频微波数字功率转换研究
- 批准号:61871075
- 批准年份:2018
- 资助金额:63.0 万元
- 项目类别:面上项目
基于压缩感知的大规模MIMO信道估计研究
- 批准号:61771101
- 批准年份:2017
- 资助金额:67.0 万元
- 项目类别:面上项目
用于同时同频全双工MIMO无线通信系统的同频自干扰抵消技术的研究
- 批准号:61401093
- 批准年份:2014
- 资助金额:27.0 万元
- 项目类别:青年科学基金项目
基于新型人工电磁媒质的高效无线能量传输与收集系统研究
- 批准号:51477126
- 批准年份:2014
- 资助金额:85.0 万元
- 项目类别:面上项目
相似海外基金
Electromagnetical coupling of AlCeN films grown by RF magnetron sputtering
射频磁控溅射生长 AlCeN 薄膜的电磁耦合
- 批准号:
18K19037 - 财政年份:2018
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Challenging Research (Exploratory)
Multi-target ultra-high-vacuum (UHV) RF Sputtering System
多靶超高真空(UHV)射频溅射系统
- 批准号:
282221095 - 财政年份:2015
- 资助金额:
$ 1.22万 - 项目类别:
Major Research Instrumentation
MRI: Acquisition of a DC/RF Sputtering System to Support Multi-disciplinary Research on Medical Sensors and Micro-generators in WBAN
MRI:采购 DC/RF 溅射系统以支持 WBAN 中医疗传感器和微型发电机的多学科研究
- 批准号:
1337965 - 财政年份:2013
- 资助金额:
$ 1.22万 - 项目类别:
Standard Grant
SBIR Phase II: Closed-Field Magnetron Sputtering with RF Plasma Enhancement for Deposition of Thin Films on Large-Area Flexible Substrates for Photovoltaics Applications
SBIR 第二阶段:采用射频等离子体增强的闭场磁控溅射技术,用于在光伏应用的大面积柔性基板上沉积薄膜
- 批准号:
0923843 - 财政年份:2009
- 资助金额:
$ 1.22万 - 项目类别:
Standard Grant
SBIR PHASE I: Closed-Field Magnetron Sputtering with RF Plasma Enhancement for Large Flat Panel Displays
SBIR 第一阶段:用于大型平板显示器的闭场磁控溅射和射频等离子体增强
- 批准号:
0740261 - 财政年份:2008
- 资助金额:
$ 1.22万 - 项目类别:
Standard Grant