The mechanism for the 1.54 mum luminescence of erbiumdoped porous silicon and the method of attaining a high efficiency.
掺铒多孔硅1.54μm发光机理及获得高效率的方法。
基本信息
- 批准号:07455135
- 负责人:
- 金额:$ 4.16万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (B)
- 财政年份:1995
- 资助国家:日本
- 起止时间:1995 至 1997
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In the 1997 research year, Er, Yb, Nd as well as Ho were chosen as rare earth elements and were incorporated into porous silicon (PS) as well as crystalline silicon (c-Si) hosts.The 1.54 mum luminescence due to the 4f electron transition from Er-dope PS showed formerly a width of about 10nm. In this research period, we introduced a hydrogen plasma annealing at -1000゚C after Er incorporation and obtained spectra composed of sharp peaks whose full-width-at-half-maximu (FWHM) is less than 1nm. We explained that silicon oxide and amorphous silicon regions were etched off by the hydrogen plasma treatment and that the remained Er-doped silicon nanocrystals showed sharp peaks.These sharp luminescence peaks exibited a small thermal quenching. This was due to the increased bandgap of silicon nanocrystals : (Presented in the MRS 1997 Fall Meeting, and submitted to J.Apple.Phys.)We studied the Yb - 1.0 mum luminescenece from Yb doped PS as a function of host PS treatment processes. Pre-oxidation of PS resulted in the one-order increase in the Yb luminescence intensty. Measurements of the decay times of PS and Yb luminescence showed that the passivation of the dangling bonds of PS with oxygen reduced the nonradaitive recombination centers, which led to an increse in the enrgy transfer efficiency from PS to Yb. (presented in J.Appl.Phys.)We measured the decay time of Nd doped PS,and obtained the decay times of 200-300 mus for the 0.93 mum and 1.06 mum luminescence peaks. In colaboration with Dr.A.Polman of FOM institue in Amsterdam, Ho ions were inplanted into c-Si, and the luminescence at - 1.2 mum due to the 4f-electron transition was observed for the first time.
在1997年的研究年度,ER,YB INE硅(C -SI)宿主。由于来自ER -DOPE PS的4F电子过渡而导致的1.54 MUM发光以前显示出大约10nm的宽度。光谱由尖锐的峰组成,其全宽度峰(FWHM)较少1nm,我们解释说,用氢等离子体treas蚀刻了氢等离子体的硅质硅硅含量的硅质含量,尖锐的发光峰降低了一个小的热淬火。 YB发光的强化,氧气与氧气的悬空减少了非放射性重组中心,从而导致ANN在从PS到YB的ENRGY转移中的ANN增量。首次观察到与阿姆斯特丹FOM的Polman博士进行的发光峰首次观察到c-Si的峰值。
项目成果
期刊论文数量(20)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
木村忠正: "Luminescence of rare earth doped porous silicon" Rare Earth doped Semiconductors II,Materials Research Society Symposium Proceedings. 422. 149-154 (1997)
Tadamasa Kimura:“稀土掺杂多孔硅的发光”稀土掺杂半导体 II,材料研究学会研讨会论文集 422. 149-154 (1997)。
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Tadamasa Kimura, Y.Nishida, T.Dejima, R.Saito, and H.Isshiki: "Time decay characteristcis of the Yb^<3+> -related 0.98 mum emissions in porous silicon" Proceedings of the MRS '97 Fall Meeting (December 1-5,1997, Boston, MA) : Materials and Devices for Sil
Tadamasa Kimura、Y.Nishida、T.Dejima、R.Saito 和 H.Isshiki:“多孔硅中 Yb^<3 > 相关 0.98 mum 发射的时间衰减特性” MRS 97 秋季会议记录(12 月)
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T.Kimura, I.Hosokawa, Y.Nishida, T.Dejima, R.Saito and T.Ikoma: "Luminescence of rare earth doped porous silicon" Materials Research Society Symposium Proceedings vol.422, Rare Earth Doped Semiconductors II,ed.by S.Coffa, A.Polman, and R.N.Schwartz, San F
T.Kimura、I.Hosokawa、Y.Nishida、T.Dejima、R.Saito 和 T.Ikoma:“稀土掺杂多孔硅的发光”材料研究学会研讨会论文集第 422 卷,稀土掺杂半导体 II,编辑。
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Tooru Dejima: "Optical activation of erbium doped porous silicon by hydrogen plasma treatment" Proceeding of the MRS '97 Fall Meeting(Materials and Devices for Silicon-Based Optoelectronics). (1998)
Toru Dejima:“通过氢等离子体处理对掺铒多孔硅进行光学活化”MRS 97 秋季会议论文集(硅基光电子材料和器件)。
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T.Dejima, R.Saito, S.Yugo, H.Isshiki, and Tadamasa Kimura: "Optical activation of erbium doped porous silicon by hydrogen plasma treatment" Proceedings of the MRS '97 Fall Meeting (Decmber 1-5,1997, Boston, MA) : Materials and Devices for Silicon-Based Op
T.Dejima、R.Saito、S.Yugo、H.Isshiki 和 Tadamasa Kimura:“通过氢等离子体处理对掺铒多孔硅进行光学活化” MRS 97 秋季会议记录(1997 年 12 月 1 日至 5 日,波士顿
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KIMURA Tadamasa其他文献
Comparative study of Internet use and onlene community between Japan and Korea
日韩互联网使用及在线社区比较研究
- DOI:
- 发表时间:
2007 - 期刊:
- 影响因子:0
- 作者:
HASHIMOTO Yoshiaki;ISHII Kenichi;KIMURA Tadamasa;KIM Sangmi;OGASAWARA Morihiro;KIM Inbae - 通讯作者:
KIM Inbae
Comparison of Internet use, personal communication and social psychology between Japan and Korea
日韩互联网使用、个人交流和社会心理比较
- DOI:
- 发表时间:
2005 - 期刊:
- 影响因子:0
- 作者:
HASHIMOTO Yoshiaki;ISHII Kenichi;KIMURA Tadamasa;KIM Sangmi;ISHIZAKI Masato;Morihiro OGASAWARA;KIM Inbae - 通讯作者:
KIM Inbae
Cyberspace as Socio-psychological Space : Cross-Cultural Comparison among the Japanese, Koreans and Finns
作为社会心理空间的网络空间:日本人、韩国人和芬兰人的跨文化比较
- DOI:
- 发表时间:
2008 - 期刊:
- 影响因子:0
- 作者:
Kazusa;Y.;Sawabe;N;KIMURA Tadamasa - 通讯作者:
KIMURA Tadamasa
Socio-Cultural Differences in the Use of Personal Web Homepage and Electronic Communities among Japanese, Finnish, and Korean Youth
日本、芬兰和韩国青少年使用个人网页和电子社区的社会文化差异
- DOI:
- 发表时间:
2008 - 期刊:
- 影响因子:0
- 作者:
SAITO Yoshitaka;KIMURA Tadamasa - 通讯作者:
KIMURA Tadamasa
Comparison of Internet images on the leading newspapers in Japan, Korea and China
日本、韩国和中国主要报纸的网络图像比较
- DOI:
- 发表时间:
2007 - 期刊:
- 影响因子:0
- 作者:
HASHIMOTO Yoshiaki;ISHII Kenichi;KIMURA Tadamasa;KIM Sangmi;ISHIZAKI Masato;Morihiro OGASAWARA;KIM Inbae - 通讯作者:
KIM Inbae
KIMURA Tadamasa的其他文献
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{{ truncateString('KIMURA Tadamasa', 18)}}的其他基金
Evaluation of energy migration between Er ions in the fluorescence process of ErYSiO silicate crystals.
ErYSiO硅酸盐晶体荧光过程中Er离子之间能量迁移的评价。
- 批准号:
22560003 - 财政年份:2010
- 资助金额:
$ 4.16万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Research on methodological fundamentals of cyber ethnography
网络民族志的方法论基础研究
- 批准号:
19500210 - 财政年份:2007
- 资助金额:
$ 4.16万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Characterization of ErSiO superlattice crystals and development of light emitting devices for silicon photonics
ErSiO超晶格晶体的表征和硅光子学发光器件的开发
- 批准号:
19360005 - 财政年份:2007
- 资助金额:
$ 4.16万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Fabrication of ErSiO self-organized superlattice thin films and evaluation of the 1.54μm optical waveguide amplification characteristics
ErSiO自组织超晶格薄膜的制备及1.54μm光波导放大特性评价
- 批准号:
15360005 - 财政年份:2003
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$ 4.16万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Dynamics of the Er1.54μm emission of Er-dope SiO_2/Si ultrathin multilayer structures
Er掺杂SiO_2/Si超薄多层结构的Er1.54μm发射动力学
- 批准号:
12450008 - 财政年份:2000
- 资助金额:
$ 4.16万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Study on The Emission Mechanism of Rare Earth Ions in Semiconductors and Its Application
半导体中稀土离子发射机理及其应用研究
- 批准号:
01550240 - 财政年份:1989
- 资助金额:
$ 4.16万 - 项目类别:
Grant-in-Aid for General Scientific Research (C)
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