Exploratory Synthesis and Reactivity of Volatile Transition Metal Complexes and Use as Molecular Precursors

挥发性过渡金属配合物的探索性合成和反应性以及作为分子前体的用途

基本信息

批准号：
1665191
负责人：
Gregory Girolami
金额：
$ 48万
依托单位：
University of Illinois at Urbana-Champaign
依托单位国家：
美国
项目类别：
Continuing Grant
财政年份：
2017
资助国家：
美国
起止时间：
2017-07-01 至 2020-06-30
项目状态：
已结题

来源：
https://www.nsf.gov/awardsearch/showAward?AWD_ID=1665191&HistoricalAwards=false
关键词：
Exploratory Synthesis Reactivity Volatile Transition

项目摘要

The Chemical Synthesis Program of the Chemistry Division of NSF supports the project by Professor Gregory S. Girolami of the University of Illinois at Urbana-Champaign to develop new and better molecular precursors for the chemical vapor deposition (CVD) of thin films. The current work will develop new classes of transition metal compounds, especially as they relate to the use of such molecules as precursors for the deposition of metals and metal oxides on surfaces with deep vertical features. The research will lead to a better understanding of the chemistry of volatile transition metal compounds and how they can be used to uniformly fill such deep features with a focus on better ways to deposit the wires and insulators that are key components of modern-day computer chips. The work will enhance already existing interactions between Professor Girolami?s group and leading companies in microelectronics development. This project will contribute directly to the education and training of B.S. and Ph.D. students, and the results will be disseminated by presentations at international conferences, and by publication in reputable scientific journals. This award will contribute to the education of a diverse group of undergraduate and graduate students, and enable Professor Girolami to write short radio spots highlighting recent scientific advances of interest to the public. A vital national scientific need is the development of new and better molecular precursors for the chemical vapor deposition (CVD) of thin films. The current project is contributing directly to this need by investigating the synthesis of new volatile compounds (especially of the transition metals), investigations of their chemical reactivities, and studies of their volatilities and utilities as thin film precursors. Some of the specific objectives of the current project are the synthesis of new complexes containing hard-soft chelating ligands, and the synthesis of high molecular weight but still highly volatile compounds, which are expected to be useful for the CVD of superconformal thin films. In parallel, investigations of the use of these new compounds for the CVD of thin films will be carried out collaboratively with experts in these techniques. The development of these new molecules will lead to better performing materials and new fabrication methods that will enable the continued miniaturization of integrated circuits. In this way, the Girolami group will contribute to achieving one of the most important "Difficult Challenges" of the International Technology Roadmap for Semiconductors: the rapid introduction of new materials/processes for the chemical vapor deposition (CVD) of thin films. The project lies at the interface of inorganic and materials chemistry, and is well suited for the education of scientists at all levels. Professor Girolami?s group is also well positioned to provide the highest level of education and training for students underrepresented in science. Outreach activities involving the production and broadcast of TinyTech radio spots will also be part of the funded project.

NSF化学司的化学合成计划支持伊利诺伊大学伊利诺伊大学乌尔巴纳·坎佩恩（Urbana-Champaign）的Gregory S. Girolami教授，为薄膜的化学蒸气沉积（CVD）开发了新的，更好的分子前体。当前的工作将开发新类别的过渡金属化合物，尤其是与将这些分子用作用作深度垂直特征表面上的金属和金属氧化物沉积的前体有关的前体。这项研究将使人们更好地理解挥发性过渡金属化合物的化学性质，以及如何使用它们统一地填充如此深的特征，重点是将电线和绝缘子沉积为现代计算机芯片的关键组件的更好方法。这项工作将增强Girolami教授组与微电子开发领域的领先公司之间已经存在的互动。该项目将直接为B.S.的教育和培训做出贡献。和博士学生，结果将通过国际会议上的演讲以及在信誉良好的科学期刊上的出版物来传播。该奖项将有助于对多样化的本科生和研究生的教育，并使Girolami教授能够撰写简短的广播点，强调了最近对公众感兴趣的科学进步。重要的民族科学需求是开发薄膜化学蒸气沉积（CVD）的新分子前体。当前的项目通过研究新的挥发性化合物（尤其是过渡金属）的合成，对其化学反应性的研究以及将其波动性和公用事业作为薄膜前体的研究，直接促成了这种需求。当前项目的某些特定目标是合成包含硬螯合配体的新配合物，以及高分子重量的合成，但仍然高度挥发性化合物，这些化合物预计将对超纯薄膜的CVD有用。同时，将对这些新化合物用于薄膜CVD的使用的研究将与这些技术的专家合作进行。这些新分子的开发将导致更好的性能材料和新的制造方法，从而使综合电路的持续微型化。这样，Girolami集团将有助于实现半导体国际技术路线图最重要的“困难挑战”之一：快速引入薄膜化学蒸气沉积（CVD）的新材料/过程。该项目位于无机和材料化学的界面，非常适合各级科学家的教育。 Girolami教授的小组也有很好的位置，可以为科学领域不足的学生提供最高水平的教育和培训。涉及TinyTech无线电点的生产和广播的外展活动也将成为资助项目的一部分。

项目成果

期刊论文数量（17）

专著数量（0）

科研奖励数量（0）

会议论文数量（0）

专利数量（0）

Chemical vapor deposition of magnetic iron-cobalt alloy thin films: Use of ammonia to stabilize growth from carbonyl precursors

磁性铁钴合金薄膜的化学气相沉积：使用氨来稳定羰基前体的生长

DOI：
10.1116/1.5045671
发表时间：
2018
期刊：
Journal of Vacuum Science & Technology A
影响因子：
2.9
作者：
Zhang, Pengyi;Zhang, Zhejun;Abelson, John R.;Girolami, Gregory S.
通讯作者：
Girolami, Gregory S.

Superconformal coating and filling of deep trenches by chemical vapor deposition with forward-directed fluxes

使用正向通量的化学气相沉积进行超保形涂层和深沟槽填充

DOI：
10.1116/1.5038100
发表时间：
2018
期刊：
Journal of Vacuum Science & Technology A
影响因子：
2.9
作者：
Talukdar, Tushar K.;Wang, Wenjiao B.;Girolami, Gregory S.;Abelson, John R.
通讯作者：
Abelson, John R.

Low temperature chemical vapor deposition of superconducting vanadium nitride thin films

超导氮化钒薄膜的低温化学气相沉积

DOI：
10.1116/1.5088050
发表时间：
2019
期刊：
Journal of Vacuum Science & Technology A
影响因子：
2.9
作者：
Mohimi, Elham;Zhang, Zhejun V.;Mallek, Justin L.;Liu, Sumeng;Trinh, Brian B.;Shetty, Pralav P.;Girolami, Gregory S.;Abelson, John R.
通讯作者：
Abelson, John R.

Enhanced Electrical and Mechanical Properties of Chemically Cross-Linked Carbon-Nanotube-Based Fibers and Their Application in High-Performance Supercapacitors