MRI: Acquisition of True 3D Laser Lithography System with Sub-Micrometer Resolution

MRI：获得亚微米分辨率的真正 3D 激光光刻系统

• 批准号: 1428694
• 负责人: Marko Loncar
• 金额: $ 44.17万
• 依托单位: Harvard University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2014
• 资助国家: 美国
• 起止时间: 2014-08-15 至 2017-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1428694&HistoricalAwards=false
• 关键词: MRI; Acquisition; True; 3D; Laser

Non-technical: The purpose of this activity is the acquisition of a Nanoscribe 3D laser lithography system (Photonic Professional GT) and its installation in the Center for Nanoscale Systems (CNS) at Harvard University. As the biggest shared facility center of nanotechnology in New England area, CNS is currently supporting more than 1,400 users (both academic and industrial) with research interests ranging from bio-engineering and micro-fluidics to quantum optics and fuel cells. Our diverse research population, working with wide range of materials and structures, has a need for fabrication of three-dimensional structures. Conventional nanofabrication techniques currently available in CNS, however, are planar in nature and are limited to realization of two-dimensional structures only. Nanoscribe 3D overcomes this limitation, and allows for fabrication of complex, hierarchical, structures spanning wide range of length scales, that cannot be realized using conventional nanofabrication techniques. With its appeal to area as diverse as nanoscale optics and electronics, bio-mimetic, microfluidics and tissue engineering, Nanoscribe 3D promotes interdisciplinary collaborations between physicists, chemists, biologists, material scientists and engineers, and enables excellent educational opportunities for a diverse population of students at all levels (undergraduate, graduate and post-graduate).Technical: Current methods for fabrication of 3D structures are based on a sequence of layer-by-layer fabrication using standard planar techniques. This approach is costly, time-consuming, suffers from stringent alignment requirements between successive photolithography steps, and cannot produce arbitrary 3D geometries. Nanoscribe 3D takes advantage of multi-photon absorption processes that occur in the focal spot of tightly focused femto-second laser beam and can realize true 3D structures with ~100nm lateral and ~200nm vertical resolution. For optics research, the tool is used to realize hybrid meso-scale structures that combine bottom-up synthesized nano-materials (nanowires, quantum dots, etc) with top-down defined photonic components, including gratings, cavities, photonic crystals and meta-materials. Of interest to biomimetics research, ability to replicate complex biological structures is crucial, and enables deeper understanding of the functional morphology of these structures, including structural colors. Cell and tissue engineering research benefits from the tool?s ability to realize cm-sized scaffolds with micron-scale detail, as well as other structures. Finally, Nanoscribe 3D allows for efficient fabrication of 3D nanoelectronic arrays that can be used to measure extracellular and intracellular biological signals (e.g. from cardiac and neural cells and tissues).

非技术性：本次活动的目的是购买 Nanoscribe 3D 激光光刻系统 (Photonic Professional GT) 并将其安装在哈佛大学纳米级系统中心 (CNS)。作为新英格兰地区最大的纳米技术共享设施中心，CNS 目前为 1,400 多个用户（学术和工业）提供支持，研究兴趣涵盖生物工程和微流体到量子光学和燃料电池。我们多元化的研究人员使用各种材料和结构，需要制造三维结构。然而，目前中枢神经系统中可用的传统纳米制造技术本质上是平面的，并且仅限于二维结构的实现。 Nanoscribe 3D 克服了这一限制，并允许制造跨越各种长度尺度的复杂、分层结构，这是使用传统纳米制造技术无法实现的。 Nanoscribe 3D 吸引了纳米级光学和电子学、仿生学、微流体学和组织工程等多个领域，促进了物理学家、化学家、生物学家、材料科学家和工程师之间的跨学科合作，并为不同群体的学生提供了良好的教育机会各个级别（本科生、研究生和研究生）。技术：当前的 3D 结构制造方法基于使用标准平面技术的逐层制造序列。这种方法成本高昂、耗时，在连续光刻步骤之间存在严格的对准要求，并且无法生成任意 3D 几何形状。 Nanoscribe 3D 利用紧密聚焦的飞秒激光束焦点中发生的多光子吸收过程，可以实现横向分辨率约为 100 nm、垂直分辨率约为 200 nm 的真正 3D 结构。对于光学研究，该工具用于实现混合介观尺度结构，将自下而上合成的纳米材料（纳米线、量子点等）与自上而下定义的光子组件（包括光栅、腔、光子晶体和元）相结合。材料。对于仿生学研究来说，复制复杂生物结构的能力至关重要，并且可以更深入地了解这些结构的功能形态，包括结构颜色。细胞和组织工程研究受益于该工具能够实现具有微米级细节的厘米大小的支架以及其他结构。最后，Nanoscribe 3D 可以高效制造 3D 纳米电子阵列，可用于测量细胞外和细胞内生物信号（例如来自心脏和神经细胞和组织的信号）。