MRI: Acquisition of an X-ray/Ultraviolet Photoelectron Spectrometer (XPS/UPS)

MRI：获取 X 射线/紫外光电子能谱仪 (XPS/UPS)

• 批准号: 1337374
• 负责人: John Fortner
• 金额: $ 52.1万
• 依托单位: Washington University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2013
• 资助国家: 美国
• 起止时间: 2013-09-01 至 2015-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1337374&HistoricalAwards=false
• 关键词: MRI; Acquisition; ray; Ultraviolet; Photoelectron

1337374FortnerThis proposal requests funding for the acquisition of a X-ray and ultraviolet photoelectron spectrometer (XPS/UPS) for Washington University in St. Louis. The greater St. Louis metropolitan region does not have an XPS/UPS instrument within a 100 mile radius and this proposal therefore fills a critical gap in the advanced analytical needs of the region. The instrument will be housed, supported and staffed in the materials characterization area of the newly formed Institute of Materials Science and Engineering (IMSE) at Washington University. The system configuration requested is designed to facilitate a wide spectrum of research, supporting XPS/UPS needs for five regional universities and three multinational corporations in eastern Missouri and southern Illinois. The VersaProbe II will come equipped with an Al K�� x-ray source to help determine chemical states of surfaces a few nanometers deep. He I and II ultraviolet sources will provide information on the valence band of materials. The system will also be equipped with mapping and imaging capabilities in the XY direction and sputter capabilities which will afford depth analysis in the Z direction. A separate glove box with a portable transfer chamber will allow air or O2 sensitive samples to be prepared and delivered to the load lock of the XPS/UPS system without risking oxidation or degradation.

1337374Fortner此提案要求为圣路易斯华盛顿大学购买 X 射线和紫外光电子能谱仪 (XPS/UPS) 提供资金。圣路易斯大都市区在 100 英里半径内没有 XPS/UPS 仪器，因此该提案填补了该地区先进分析需求的关键空白。该仪器将在华盛顿大学新成立的材料科学与工程研究所 (IMSE) 的材料表征区域内安置、支持和配备人员。所要求的系统配置旨在促进广泛的研究，支持密苏里州东部和伊利诺伊州南部的五所地区大学和三个跨国公司的 XPS/UPS 需求。 VersaProbe II 将配备 Al K�� X 射线源可帮助确定几纳米深表面的化学状态。 He I 和 II 紫外线源将提供有关材料价带的信息。该系统还将配备 XY 方向的绘图和成像功能以及溅射功能，从而提供 Z 方向的深度分析。带有便携式转移室的独立手套箱可以制备空气或 O2 敏感样品并将其传送到 XPS/UPS 系统的装载锁，而不会存在氧化或降解的风险。