SBIR Phase I: Simulation Model for Two-Photon Absorption Fabricated Microstructures

SBIR 第一阶段：双光子吸收制造微结构的仿真模型

• 批准号: 0512759
• 负责人: Ian White
• 金额: $ 9.76万
• 依托单位: Focal Point Microsystems
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-07-01 至 2005-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0512759&HistoricalAwards=false
• 关键词: SBIR; Phase; Simulation; Model; Two

This Small Business Innovation Research Phase I research project will develop a fabrication simulation tool for theoretical modeling of three-dimensional micro and nanostructures formed by Two-Photon Absorption (TPA) fabrication. This work will focus on development of a theoretical model for prediction of feature size using TPA quantifying exposure time and optical flux with optical beam writing speed and the validation of the model. Once structural geometry control has been validated this simulation tool will form the base of a device and fabrication modeling tool that can expedite optimization of designs using TPA. The tool will enable geometric structuring and ultimately serve as a validation tool for device performance by coupling additional elements appropriate to each application and translating the structural and materials properties into device characteristics (i.e. photonic device performance and mechanical engineering performance models).Integrated Circuit (IC) technology and silicon micromachining has benefited greatly from the incorporation of simulation and modeling tools into the design, development and evaluation of the components, devices, and systems. This has provided a rapid means to deterministically evaluate new wafer components and designs cost effectively, and avoid the expensive, empirical optimization through physical design iterations. TPA technology will allow for the world's first truly 3D maskless, fabrication platform for micro and sub - micron components devices and systems, and much like traditional IC fabrication requires modeling tools that can optimize fabrication performance.

该小型企业创新研究第一阶段研究项目将开发一种制造模拟工具，用于对双光子吸收（TPA）制造形成的三维微米和纳米结构进行理论建模。这项工作将重点开发一个理论模型，用于使用 TPA 量化曝光时间和光通量以及光束写入速度来预测特征尺寸，并验证模型。一旦结构几何控制得到验证，该仿真工具将构成器件和制造建模工具的基础，可以使用 TPA 加快设计优化。该工具将实现几何结构，并通过耦合适合每个应用的附加元件并将结构和材料属性转化为器件特性（即光子器件性能和机械工程性能模型），最终成为器件性能的验证工具。 集成电路 (IC) ）技术和硅微机械加工极大地受益于将仿真和建模工具纳入组件、设备和系统的设计、开发和评估中。这提供了一种快速方法，可以有效地确定性地评估新的晶圆组件和设计，并避免通过物理设计迭代进行昂贵的经验优化。 TPA 技术将实现世界上第一个真正的 3D 无掩模制造平台，用于微米和亚微米元件设备和系统，就像传统的 IC 制造一样，需要可以优化制造性能的建模工具。