SBIR Phase I: Simulation Model for Two-Photon Absorption Fabricated Microstructures

SBIR 第一阶段：双光子吸收制造微结构的仿真模型

• 批准号: 0512759
• 负责人: Ian White
• 金额: $ 9.76万
• 依托单位: Focal Point Microsystems
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-07-01 至 2005-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0512759&HistoricalAwards=false
• 关键词: SBIR; Phase; Simulation; Model; Two

This Small Business Innovation Research Phase I research project will develop a fabrication simulation tool for theoretical modeling of three-dimensional micro and nanostructures formed by Two-Photon Absorption (TPA) fabrication. This work will focus on development of a theoretical model for prediction of feature size using TPA quantifying exposure time and optical flux with optical beam writing speed and the validation of the model. Once structural geometry control has been validated this simulation tool will form the base of a device and fabrication modeling tool that can expedite optimization of designs using TPA. The tool will enable geometric structuring and ultimately serve as a validation tool for device performance by coupling additional elements appropriate to each application and translating the structural and materials properties into device characteristics (i.e. photonic device performance and mechanical engineering performance models).Integrated Circuit (IC) technology and silicon micromachining has benefited greatly from the incorporation of simulation and modeling tools into the design, development and evaluation of the components, devices, and systems. This has provided a rapid means to deterministically evaluate new wafer components and designs cost effectively, and avoid the expensive, empirical optimization through physical design iterations. TPA technology will allow for the world's first truly 3D maskless, fabrication platform for micro and sub - micron components devices and systems, and much like traditional IC fabrication requires modeling tools that can optimize fabrication performance.

这个小型企业创新研究阶段研究项目将开发一种制造仿真工具，用于由两光吸收（TPA）制造形成的三维微型和纳米结构的理论建模。这项工作将重点放在使用TPA量化曝光时间和光束写入速度和模型验证的理论模型来预测特征大小的理论模型上。一旦验证了结构性几何控制，该仿真工具将形成设备的基础和制造建模工具，该工具可以加快使用TPA来加快设计的优化。该工具将通过将适用于每个应用程序的其他要素耦合，并将结构和材料属性转换为设备特性（即光子设备性能和机械工程性能模型），将其转化为设备性能的验证工具，并将其转换为设备特性。集成电路（IC）技术和硅微机械工具从仿真和模型的设备进行了构造和模型工具，从而使工具和模型的设备合并到设计和模型的设备中，从而受益匪浅。这为确定性评估新的晶圆组件和设计的快速方法有效地进行了有效的成本，并通过物理设计迭代避免了昂贵的经验优化。 TPA技术将允许世界上第一个真正的3D口罩，用于微米和微米组件的设备和系统的制造平台，就像传统的IC制造一样，需要建模工具来优化制造性能。