Pulsed Power Plasma Discharges Used for Materials Processing

用于材料加工的脉冲功率等离子体放电

• 批准号: 9602544
• 负责人: Michael Lieberman
• 金额: $ 1.69万
• 依托单位: University of California-Berkeley
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-02-01 至 1998-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9602544&HistoricalAwards=false
• 关键词: Pulsed; Power; Plasma; Discharges; Used; Pulsed; Power; Plasma; Discharges; Used

9602544 Lieberman This project is a collaboration between the University of California-Berkeley group under the direction of Professor Michael A. Lieberman, and Australian National University group under the direction of Professor Rod Boswell on experiments, analytical modeling, and computer simulations of pulsed power high density plasma discharges used for materials processing, to obtain a better understanding of the dynamics of these discharges and their utility for various processing applications. The U.S. and Australian investigators will develop analytical models and computer simulations of such discharges and will perform experiments on high density pulsed power helicon discharges. High density sources, such as electron cyclotron resonance discharges (ECR's), inductively coupled plasmas (ICP's), and helicons are regarded as powerful tools that can replace conventional capacitively coupled, parallel plate plasma reactors. A major advantage is that much higher manufacturing throughput can be expected because much higher plasma densities than those of parallel plate reactors are obtainable. Another advantage is that aspect ratio-independent anisotropic etch processes are possible because of lower gas pressures. It is also a great advantage that the ion bombarding energy can be controlled independently of the ion flux. High density, low pressure plasma sources utilizing modulated power have been attracting much attention recently. By modulating the power, it is possible to further optimize and control the performance of processing plasmas by changing the pulse frequency and duty ratio.

9602544 Lieberman这个项目是在Michael A. Lieberman教授和澳大利亚国立大学小组的指导下，在Rod Boswell教授的指导下，在Rod Boswell教授的指导下进行了一项合作，分析建模和计算机模拟了脉冲功率高密度放电用于材料处理的脉冲高密度放电，以便将其用于材料处理，以更好地处理这些动力学，并将其用于这些动力学，并将其设置为动态。 美国和澳大利亚研究人员将开发此类排放的分析模型和计算机模拟，并将对高密度脉冲功率Helicon放电进行实验。 高密度源，例如电子回旋共振放电（ECR），电感耦合等离子体（ICP）和直升机被认为是强大的工具，可以替代常规的电容性耦合，平行的平板等离子反应器。 一个主要的优点是，可以预期的制造吞吐量要高得多，因为可以获得比平行板反应器的血浆密度要高得多。 另一个优点是，由于气体压力较低，纵横比不依赖的各向异性蚀刻过程可能是可能的。 可以独立于离子通量控制离子轰击能量也是一个很大的优势。 最近，使用调制功率的高密度，低压等离子体来源最近引起了很多关注。 通过调节功率，可以通过更改脉冲频率和占空比来进一步优化和控制处理等离子体的性能。