部分相干分数域滤波及提高光刻分辨力新方法研究

Resolution enhancement techniques on optical lithography include the optimized methods in illuminition, reticle, imaging, photoresist and wafer process. It is a key technique to improve sub-halfmicron lithography pattern quality. In this project, our purpose is to reduce proximity effects on photolithography and improve resist pattern quality using wavefront engineering techniques. We develop the study of theory, experiment and new method to improve optical lithography resolution based on fractional Fourier optics and partial coherent light imaging theory. A new and effective spatial filtering theory and method on fractional Fourier domain in optical lithography system is provided so that the potential of spatial filering technique for improving optical lithography resolution and focus depth can be well exerted. It will help to the emerging wavefront engineering approache development and play an important role to improve resolution of micro-nano lithography.

深入研究部分相干照明分数域滤波理论及其提高光刻分辩力、焦深和像质的原理和方法，探讨分数域滤波器优化设计迭代算法，在亚微米1线光刻机上经分数域滤波获得亚半微米优质饪掏夹巍８梅椒赏黄拼晨沼蚝推涤蚵瞬ɡ砺酆褪笛樯系南拗疲⒄股钛俏⒚准澳擅坠饪烫峁┮惶跣峦揪丁６苑⒄狗质盗⒁豆庋Ш筒ㄇ肮こ萄в兄匾庖宀⒂泄憷τ们熬啊

内容获取失败，请点击重试