New sputter deposition capabilities for growth of metal-oxide multilayers

用于金属氧化物多层生长的新溅射沉积能力

• 批准号: RTI-2022-00673
• 负责人: Girt, Erol
• 金额: $ 7.65万
• 依托单位: Simon Fraser University
• 依托单位国家: 加拿大
• 项目类别: Research Tools and Instruments
• 财政年份: 2021
• 资助国家: 加拿大
• 起止时间: 2021-01-01 至 2022-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=743094
• 关键词: New; sputter; deposition; capabilities; growth

Many current technologies are based on the innovative use of materials that display novel electronic, magnetic, electrical, thermal, or optical properties. Material properties can be vastly manipulated by their geometry (low dimensional, thin-films) and structure (multilayers). Entirely new effects can exist at material interfaces (interface phenomena) as a result of their symmetry-breaking, giving rise to new properties not present in the bulk. Therefore, the deposition of high-quality films is vital for both understanding the fundamental properties of new materials/interfaces, and for optimizing their behaviour for device applications. Sputter deposition is arguably one of the most important fabrication techniques for deposition of metal and dielectric films and it has been the primary technique for deposition of metal films studied in our labs. Unfortunately, our sputter system, which has supported our research for the last eleven years, is currently not capable of depositing films due to electrical and mechanical failures. In this proposal, we request upgrades of the sputter system which will create a state-of-the-art tool for deposition of metal materials from up to eight sources in the first chamber and for deposition of oxides and nitrides from up to three sources in the second chamber. The upgrades will simultaneously serve as repairs for the failing components in the system. Additionally, they will expand our research in the direction of metal/oxide/nitride structures making us the only group in Canada (to the best of our knowledge) researching and manufacturing magnetic solid-state memory devices.

许多当前技术基于显示新型电子，磁，电气，热或光学特性的材料的创新使用。材料特性可以通过其几何形状（低维，薄膜）和结构（多层）进行大量操纵。由于它们的对称性破坏，因此在材料界面（接口现象）上可能存在全新的效果，从而产生了整体中不存在的新属性。因此，高质量膜的沉积对于了解新材料/接口的基本特性以及为设备应用优化其行为至关重要。可以说，溅射沉积是用于沉积金属和介电膜的最重要的制造技术之一，它一直是在我们实验室中研究的金属膜沉积的主要技术。不幸的是，我们在过去的11年中支持我们的研究的溅射系统目前由于电气和机械故障而无法沉积膜。 在此提案中，我们要求升级溅射​​系统，该升华系统将创建一种最先进的工具，用于在第一个腔室中从最高八个来源沉积金属材料，并将氧化物和氮化物的沉积从最高到三个来源。第二个房间。升级将同时作为系统中故障组件的维修。此外，他们将向我们的研究扩展我们的研究，使我们成为加拿大唯一研究和制造磁性固态记忆设备的加拿大唯一群体。