Fabrication of Nanometer Structure and Its Application

纳米结构的制备及其应用

基本信息

批准号：
06044139
负责人：
TAKAI Mikio
金额：
$ 6.91万
依托单位：
OSAKA UNIVERSITY (1995)Tokyo National Museum (1994)
依托单位国家：
日本
项目类别：
Grant-in-Aid for Overseas Scientific Survey.
财政年份：
1994
资助国家：
日本
起止时间：
1994 至 1995
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-06044139/
关键词：
Localized electrytic reaction Nanometer process STM tip Ion scattering Porous Si emitter Nano-structure Beam process Field evaporation Pakistan Hazara Shinkiari stupa Buddhist monument

项目摘要

Fabrication of nanometer structure and its application have been investigated by a joint research between Osaka University and Fraunhofer Institut fuer Feskoerpertechnologie under the International Scientific Research Program of the Ministry of Education, Science, Sport and Culture.Localized electrolytic reaction by a scanning tunneling microscope (STM) tip, dipped in a solution, induced a localized metal deposition with a size of several hundred nanometers, while a metal-covered STM tip could realize a controlled deposition with a size of nanometer by field evaporation. Metal species could be controlled by a precise adjustment of applied pulsed-bias between the tip and a target sample, which would determine the electric field for field evaporation on the STM tip. This technique would facilitate to fabricate metal electrode structures of quantum electron devices such as single electron transistors. Nano-scale interdigital metal structures would also provide a new sensing application.Medium energy ion scattering with and without focused ion beams has been applied to modified surface nano-structures in order to characterize the atomic positions of ad-atoms. The results were compared with those investigated by STM to exactly locate ad-atoms on crystalline surface.A silicon (Si) nanometer structure by anodization, porous Si, has been applied to electron emitter tips of field emission arrays (FEAs). FEAs with nano-structure emission tips showed enhanced emission by an order of magnitude over FEAs with conventional single crystalline Si emitter tips. Further application of nano-structures fabricated by the technique developed in this study is in progress.

大阪大学和弗劳恩霍夫研究所在文部科学省国际科学研究计划下的联合研究，对纳米结构的制造及其应用进行了研究。通过扫描隧道显微镜（STM）进行局部电解反应）尖端浸入溶液中，诱导了尺寸为数百纳米的局部金属沉积，而金属覆盖的 STM 尖端可以实现尺寸为通过场蒸发纳米化。可以通过精确调整尖端和目标样品之间施加的脉冲偏压来控制金属种类，这将确定 STM 尖端上场蒸发的电场。该技术将有助于制造量子电子器件（例如单电子晶体管）的金属电极结构。纳米级叉指金属结构也将提供新的传感应用。有或没有聚焦离子束的中能离子散射已被应用于修饰的表面纳米结构，以表征ad原子的原子位置。将结果与STM研究的结果进行比较，以精确定位晶体表面上的ad原子。通过阳极氧化形成的硅（Si）纳米结构，即多孔硅，已应用于场发射阵列（FEA）的电子发射器尖端。具有纳米结构发射尖端的有限元分析显示出比具有传统单晶硅发射尖端的有限元分析增强了一个数量级的发射。通过本研究开发的技术制造的纳米结构的进一步应用正在进行中。