PREPARATION OF DIAMOND-COATED MICRODRILL BY CHEMICAL VAPOR DEPOSITION

化学气相沉积法制备金刚石涂层微钻

• 批准号: 09450288
• 负责人: MOROOKA Shigeharu
• 金额: $ 2.43万
• 依托单位: KYUSHU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09450288/
• 关键词: diamond thin film; chemical vapor deposition; hot-filamnt; drill.; boring; methane; ultrasonic; 核発生; ダイヤモンド; マイクロドリル; CVD; マイクロ波プラズマ; 結晶析出; コーティング

A diamond film was formed on a WC-Co microdrill with a three-dimensional complex shape by a hot-filament assisted chemical vapor deposition technique using methane and hydrogen. Prior to diamond deposition, the microdrill was dipped into nitric acid and then ultrasonically pretreated using nanoscale diamond particles suspended in water. These pretreatment were effective to improve the adhesion property of diamond film and to enhance the deposition density Diamond deposition was carried out through two steps : the first methane concentration was kept at ca. 6% in hydrogen and the second one was maintained at ca. 1% in hydrogen. The first step was important to form a continuous well-adhering diamond thin film. A diamond-coated microdrill was tested to bore holes through a machinable glass ceramics, and as a result, its boring performance was found to be about 7 times higher than that of uncoated one.

通过使用甲烷和氢的热丝辅助化学蒸气沉积技术，在具有三维复合形状的WC-CO微钻上形成了钻石膜。在钻石沉积之前，将微钻浸入硝酸中，然后使用悬浮在水中的纳米级钻石颗粒进行超声预处理。这些预处理可有效地改善钻石膜的粘附特性，并通过两个步骤进行了沉积密度的钻石沉积：将第一个甲烷浓度保存在CA。 6％的氢和第二个维持在Ca。 1％的氢。第一步对于形成连续贴紧的钻石薄膜很重要。测试了钻石涂层的微钻，可以通过可加工的玻璃陶瓷孔孔，结果发现其无涂层的钻石性能比未涂层的孔高约7倍。

项目成果

齊藤 丈靖: "ダイヤモンド薄膜と半導体化技術の進展" ペテロテック. 20巻7号. 559-565 (1997)

Takeyasu Saito：“金刚石薄膜和半导体技术的进展”Peterotek，第 20 卷，第 7 期，559-565 (1997)。

S.Morooka: "Chemical Modification of Diamond Surfaces" Theories and Applications of Chemical Engineering. Vol.3 No.1. 1233-1236 (1997)

S.Morooka：“金刚石表面的化学改性”化学工程理论与应用。

H.Maeda, T.Saito, K.Kusakabe and S.Morooka: "Synthesis of Highly Oriented Diamond Film and Control of Its Surface Morphology" Hyomen-Gijutu. 48-1. 8-13 (1997)

H.Maeda、T.Saito、K.Kusakabe 和 S.Morooka：“高取向金刚石薄膜的合成及其表面形态的控制”Hyomen-Gijutu。

T.Saito: "Improvement of Diamond Nuclei Orientation by Double-Step Bias Treatment in Microwave Plasma-Assisted Chemical Vapor Deposition Using C_2H_4 and CH_4 as Carbon Source" Diamond and Related Materials. Vol.6. 668-672 (1997)

T.Saito：“使用 C_2H_4 和 CH_4 作为碳源，通过微波等离子体辅助化学气相沉积中的双步偏压处理来改善金刚石核取向”金刚石和相关材料。

前田 英明ら: "高配向ダイヤモンド膜の合成とその表面形態制御" 表面技術. 48・1. 8-13 (1997)

前田秀明等：“高取向金刚石膜的合成及其表面形态的控制”表面技术48・1（1997）。