Studies on Environmentally Friendly Photocrosslinkable Polymers

环境友好型光交联聚合物的研究

• 批准号: 13450382
• 负责人: SHIRAI Masamitsu
• 金额: $ 9.22万
• 依托单位: Osaka Prefecture University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-13450382/
• 关键词: Photoacid Generator; Photobase Generator; Photocrossliking; Thermal degradation; Redissolution; Epoxy resin; Photocuring; Rework; 感光性高分子; エポキシ; フォトレジスト; 光架橋高分子; 高分子の熱分解; ネガ型フォトレジスト

1)New photoacid generators which are sensitive to 366nm light were synthesized from sulfonic acid anhydride and oximes or N-hydroxyimide and characterized. In the molecular design fluorenone or thioxantone derivatives were used as chromophores for 36nm light. The photoacid generators obtained were thermally stable and highly photosensitive to 366nm light.2)We have synthesized a novel crosslinker which has three epoxy moieties and thermally degradable carboxylic acid ester moieties in a molecule. On irradiation at 254nm, the thin films obtained from the mixture of the triepoxy crosslinker, polyvinylphenol and photoacid generator became insoluble in solvents due to the formation of networks. The crosslinked materials became soluble in solvent when baked at relatively higher temperatures (-160 ℃). It was found that this system could be applied for 366nm or 436nm light if the photoacid generators were properly selected. We have also synthesized a novel monomer which has an epoxy moiety and thermally degradable sulfonic acid ester moieties in a molecule. The polymer was obtained by the polymerization of the monomer. On irradiation at 254nm, the thin films obtained from the polymer and photoacid generator became insoluble in solvents due to the formation of networks. The crosslinked materials became soluble in water when baked at relatively higher temperatures.

1）对366nm光敏感的新光酸发电机是硫酸酸酐，并且在分子设计中进行了氧气。在溶质中，在溶剂中获得了溶剂，因此在溶剂中获得了溶剂，因此在溶剂中获得了HERE环氧酸酯部分发现如果我们还合成了一个具有部分部分的单体和可热降解的硫酸酸性，则可以将系统应用于366nm或436nm的光在254nm的辐射，从聚合物和光酸发生器中获得的薄膜在溶剂中变成了网络的形成。

项目成果

Masamitsu Shirai: "Photocrosslinkable Polymers with Thermally Degradable Properties"Chem.Mater.. 14・1. 334-340 (2002)

白井正光：“具有热降解性能的光交联聚合物”Chem.Mater.14・1（2002）

M.Shirai(分担執筆): "Polymers for Microelectronics and Nanolectronics (ACS Symposium Series 874)"American Chemical Society, Washington DC. 12 (2004)

M. Shirai（贡献者）：“微电子和纳米电子聚合物（ACS 研讨会系列 874）”美国化学会，华盛顿特区 12 (2004)。

M.Shiri他: "Photocrosslinkable Polymers with Thermally Degradable Propcrty"Chem.Mater. 14・1. 334-340 (2002)

M.Shiri 等人：“具有热降解特性的光交联聚合物”Chem.Mater. 334-340 (2002)。

C.Iwashima: "Synthesis of i- and g-Line Sensitive Photoacid Generators and Their Application to Photopolymer Systems"Journal of Photopolymer Science and Technology. 16. 91-96 (2003)

C.Iwashima：“i-和g-线敏感光酸发生器的合成及其在光聚合物系统中的应用”光聚合物科学与技术杂志。

M.Shirai, et al.: "Photo-Cross-Linkable Polymers Having Degradable Properties on Heating"Chem.Mater. 15. 4075-4081 (2003)

M.Shirai 等人：“加热时具有可降解性能的光可交联聚合物”Chem.Mater。