Synthesis of Photoacid-and Photobase-Generating Polymers and Its Applications

光产酸、光产碱聚合物的合成及其应用

基本信息

批准号：
11650912
负责人：
SHIRAI Masamitsu
金额：
$ 0.58万
依托单位：
Osaka Prefecture University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2000
项目状态：
已结题

项目摘要

Polymers having photoacid generating units and/or photobase generating units were synthesized. These polymers were applied to highly sensitive photocrosslinking materials, thermally decomposable photocrosslinking materials and surface modification photoresist materials. (1) Polymers bearing both benzanthonilideneimino p-styrenesulfonate units and epoxy units were found to be used as photocrosslinkable polymers which are sensitive to 366nm light. (2) Novel polymers which have both epoxy units bound to polymer chains with tertiary esters of carboxylic acids and photoacid generating units were prepared. They became insoluble in solvents on UV irradiation but the insolubilized polymers became soluble in solvents on heating at a given temperature. These photocrosslinkable polymers were shown to be significant for the short time use. (3) Polymers composed of O-acryloyl naphthophenone oxime and cyclohexyl p-styrenesulfonate were synthesized. It was shown that the polymers could be used as positive surface modification resist. Positive images were obtained when the polymer film was irradiated at 193nm, baked at a given temperature, exposed to the vapor of alkoxysilanes and etched with oxygen plasma. (4) Polymers having both photobase generating units by 193nm irradiation and photoacid generating units by 254nm irradiation were prepared. The polymers were used as surface modification resist using a double-exposure-technique. Positive images were obtained when the polymer films were irradiated at 193nm with a mask, irradiated at 254nm without a mask, exposed to the vapor of alkoxysilanes and etched with oxygen plasma. (5) New polymers containing esters of p-styrenesulfonic acid and aliphatic oxines or N-hydroxy imides were prepared and radically polymerized. These polymers generated sulfonic acids on irradiation at 146nm.

合成具有光酸产生单元和/或光碱产生单元的聚合物。这些聚合物应用于高灵敏光交联材料、热分解光交联材料和表面改性光刻胶材料。 (1) 含有苯并甲亚基亚氨基对苯乙烯磺酸盐单元和环氧单元的聚合物被发现可用作对 366nm 光敏感的可光交联聚合物。 (2)制备了具有通过羧酸叔酯与聚合物链结合的环氧单元和光致产酸单元的新型聚合物。它们在紫外线照射下变得不溶于溶剂，但不溶解的聚合物在给定温度下加热时变得可溶于溶剂。这些可光交联聚合物被证明对于短时间使用具有重要意义。 (3)合成了邻丙烯酰基萘酮肟与对苯乙烯磺酸环己酯组成的聚合物。结果表明，该聚合物可用作正性表面改性抗蚀剂。当聚合物薄膜在193nm处照射、在给定温度下烘烤、暴露于烷氧基硅烷蒸气并用氧等离子体蚀刻时获得正图像。 (4)制备同时具有193nm照射下的光碱产生单元和254nm照射下的光酸产生单元的聚合物。使用双重曝光技术将聚合物用作表面改性抗蚀剂。当聚合物薄膜用掩模在193nm处照射、在没有掩模的情况下在254nm处照射、暴露于烷氧基硅烷蒸气并用氧等离子体蚀刻时获得正图像。 (5)制备并自由基聚合含有对苯乙烯磺酸与脂肪族环氧化合物或N-羟基酰亚胺的酯的新型聚合物。这些聚合物在 146 nm 的照射下产生磺酸。