Synthesis of Photoacid-and Photobase-Generating Polymers and Its Applications

光产酸、光产碱聚合物的合成及其应用

基本信息

  • 批准号:
    11650912
  • 负责人:
  • 金额:
    $ 0.58万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
  • 财政年份:
    1999
  • 资助国家:
    日本
  • 起止时间:
    1999 至 2000
  • 项目状态:
    已结题

项目摘要

Polymers having photoacid generating units and/or photobase generating units were synthesized. These polymers were applied to highly sensitive photocrosslinking materials, thermally decomposable photocrosslinking materials and surface modification photoresist materials. (1) Polymers bearing both benzanthonilideneimino p-styrenesulfonate units and epoxy units were found to be used as photocrosslinkable polymers which are sensitive to 366nm light. (2) Novel polymers which have both epoxy units bound to polymer chains with tertiary esters of carboxylic acids and photoacid generating units were prepared. They became insoluble in solvents on UV irradiation but the insolubilized polymers became soluble in solvents on heating at a given temperature. These photocrosslinkable polymers were shown to be significant for the short time use. (3) Polymers composed of O-acryloyl naphthophenone oxime and cyclohexyl p-styrenesulfonate were synthesized. It was shown that the polymers could be used as positive surface modification resist. Positive images were obtained when the polymer film was irradiated at 193nm, baked at a given temperature, exposed to the vapor of alkoxysilanes and etched with oxygen plasma. (4) Polymers having both photobase generating units by 193nm irradiation and photoacid generating units by 254nm irradiation were prepared. The polymers were used as surface modification resist using a double-exposure-technique. Positive images were obtained when the polymer films were irradiated at 193nm with a mask, irradiated at 254nm without a mask, exposed to the vapor of alkoxysilanes and etched with oxygen plasma. (5) New polymers containing esters of p-styrenesulfonic acid and aliphatic oxines or N-hydroxy imides were prepared and radically polymerized. These polymers generated sulfonic acids on irradiation at 146nm.
合成了具有光酸产生单元和/或光酶产生单元的聚合物。将这些聚合物应用于高度敏感的光链链接材料,热分解的光叠链接材料和表面修饰的光丝天材料。 (1)携带苯甲酰基尼尼尼尼尼尼替尼硫酸盐单元和环氧单元的聚合物被用作对366nm光敏感的光蛋白链接聚合物。 (2)准备与聚合物链结合的新型聚合物,并与羧酸的三级酯和光酸产生单位结合。它们在紫外线辐射方面不溶于溶剂,但不溶液化的聚合物在给定温度下溶于溶剂上。这些光叠链链接聚合物在短时间内被证明很重要。 (3)合成了由O-丙烯酰萘酮氧电和环己基P-苯甲酸甲酯组成的聚合物。结果表明,聚合物可以用作阳性表面修饰抗性。当在193nm处辐照聚合物膜,在给定温度下烘烤,暴露于烷氧基烷蒸气并用氧血浆蚀刻时,获得了正图像。 (4)在193nm辐射之前,都有两个光酶产生单位的聚合物,并在254nm辐照的情况下进行了光酸产生单位。使用双曝光技术将聚合物用作抗性抗性。当聚合物膜在193nm的掩膜上辐照,并在254nm的情况下辐照,而无需掩模,暴露于烷氧基硅烷的蒸气并用氧血浆蚀刻时,获得了正图像。 (5)制备了含有p-苯甲酸酸酯和脂肪族氧或氮氧化物的酯的新聚合物,并制备了N-羟基酰亚胺。这些聚合物在146nm的辐射时会产生磺酸。

项目成果

期刊论文数量(8)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Masamitsu Shirai 他: "Photoacid and Photobase Generation in Photoresists"Trends Photochem. Photobiol.. 5. 169-185 (1999)
Masamitsu Shirai 等人:“光致抗蚀剂中的光酸和光碱生成”Trends Photobiol.. 5. 169-185 (1999)
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    0
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Masamitsu Shirai, et al.: "Highly Sensitive Positive Surface Modification Resists"Microelectronic Eng.. 53. 475-478 (2000)
Masamitsu Shirai 等:“高灵敏度正表面改性抗蚀剂”微电子工程 53. 475-478 (2000)
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Masamitsu Shirai 他: "Highly Sensitive Positive Surface Modification Resists"Microelectronic Eng.. (印刷中).
Masamitsu Shirai 等人:“高灵敏度正表面改性抗蚀剂”微电子工程(正在出版)。
  • DOI:
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    0
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Masamitsu Shirai: "Sulfonic Acid Generating Polymers for 146nm Irradiation""J.Photopolym.Sci.Technol.. 12・5. 721-724 (1999)
白井正光:“146nm照射下的磺酸生成聚合物””J.Photopolym.Sci.Technol.. 12・5. 721-724 (1999)
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  • 影响因子:
    0
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  • 通讯作者:
Masamitsu Shirai: "Photoacid and Photobase Generation in Photoresist"Trends in Photochem.Photobiol.. 5. 169-185 (1999)
Masamitsu Shirai:“光刻胶中的光酸和光碱生成”Trends in Photochem.Photobiol.. 5. 169-185 (1999)
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SHIRAI Masamitsu其他文献

SHIRAI Masamitsu的其他文献

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{{ truncateString('SHIRAI Masamitsu', 18)}}的其他基金

Development of De-molding Agent-Free Resin Mold for UV Nanoimprint
UV纳米压印无脱模剂树脂模具的研制
  • 批准号:
    23655218
  • 财政年份:
    2011
  • 资助金额:
    $ 0.58万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
UV Curable Resins with Degradable Property and Their Application for Sacrificial Materials
可降解紫外光固化树脂及其在牺牲材料中的应用
  • 批准号:
    21350128
  • 财政年份:
    2009
  • 资助金额:
    $ 0.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Studies on Environmentally Friendly Photocrosslinkable Polymers
环境友好型光交联聚合物的研究
  • 批准号:
    13450382
  • 财政年份:
    2001
  • 资助金额:
    $ 0.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Chemical Modification of Surface of Polymer Thin Film Using Photochemical Reaction and Its Application
光化学反应聚合物薄膜表面化学改性及其应用
  • 批准号:
    06805084
  • 财政年份:
    1994
  • 资助金额:
    $ 0.58万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
Synthesis of Photodimerizable Poly(crown ether)s and Their Application
光二聚聚冠醚的合成及其应用
  • 批准号:
    61550683
  • 财政年份:
    1986
  • 资助金额:
    $ 0.58万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)

相似海外基金

Photoinduced Dedoping of Conducting Polymers: Patterning and Device Application
导电聚合物的光致去掺杂:图案化和器件应用
  • 批准号:
    15K17927
  • 财政年份:
    2015
  • 资助金额:
    $ 0.58万
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    Grant-in-Aid for Young Scientists (B)
Development of Photobase Generators for Tertiary Amines and Its Application to Curing Systems
叔胺光产碱剂的研制及其在固化体系中的应用
  • 批准号:
    15550168
  • 财政年份:
    2003
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    $ 0.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Studies on Environmentally Friendly Photocrosslinkable Polymers
环境友好型光交联聚合物的研究
  • 批准号:
    13450382
  • 财政年份:
    2001
  • 资助金额:
    $ 0.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Design and Applications of Novel Photo-crosslinking Systems by the Use of Photobase Generators
利用光碱发生器的新型光交联系统的设计与应用
  • 批准号:
    10650870
  • 财政年份:
    1998
  • 资助金额:
    $ 0.58万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
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