Chemical Modification of Surface of Polymer Thin Film Using Photochemical Reaction and Its Application

光化学反应聚合物薄膜表面化学改性及其应用

• 批准号: 06805084
• 负责人: SHIRAI Masamitsu
• 金额: $ 1.22万
• 依托单位: University of Osaka Prefecture
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06805084/
• 关键词: Photoresist; Photosensitive Polymer; Surface Modification; Photoacid generator; Surface imaging; 光反応性高分子; ポリシロキサン

This work was done to obtain basic concept for the surface imaging system based on the polysiloxane formation at the irradiated polymer surface using chemical vapor deposition (CVD) and liquid phase deposition (LPD) methods.Polymers which generate acids on irradiation at 254 nm were used. To control the thickness of polysiloxane-base polymer composite layr at the irradiated surface by CVD method, two methods were investigated : (1) incorporation of UV absorbing units into the polymer chain to reduce the light penetrating depth, (2) incorporation of functional units that induce the photoinduced acid-catalyzed crosslinking, reducing the diffusion rate of alkoxysilane molecules into films. LPD method for the polysiloxane formation at the irradiated polymer surface containing photoacid generating units was studied and LPD method was compared with CVD method. Removal of Si element from the irradiated areas of polymethacrylates containing pendant silyl ether or silyl ester units was studied. This system was expected to be useful as a positive-type photoresist that could be developed by oxygen plasma etching.

这项工作是为了获得表面成像系统的基本概念，该系统基于使用化学气相沉积 (CVD) 和液相沉积 (LPD) 方法在辐照聚合物表面形成聚硅氧烷。使用了在 254 nm 辐照下产生酸的聚合物。为了通过CVD方法控制聚硅氧烷基聚合物复合层在照射表面的厚度，研究了两种方法：（1）将紫外线吸收单元引入到聚合物链中以减少光穿透深度，（2）引入功能单元诱导光诱导酸催化交联，降低烷氧基硅烷分子进入薄膜的扩散速率。研究了在含有光致产酸单元的受辐照聚合物表面形成聚硅氧烷的LPD方法，并将LPD方法与CVD方法进行了比较。研究了含有侧链甲硅烷基醚或甲硅烷基酯单元的聚甲基丙烯酸酯的辐照区域中硅元素的去除。该系统预计可用作可通过氧等离子体蚀刻开发的正型光致抗蚀剂。

项目成果

白井正充: "露光ポリマーフィルム表面での水の収着" ジャスコレポート. 36. 17-20 (1994)

Masamitsu Shirai：“暴露的聚合物薄膜表面的水吸附”Jusco 报告。36. 17-20 (1994)。

Masamitsu SHIRAI: ""Polysiloxane Formation at the Irradiated Polymer Surface : A Liquid-Phase Deposition Method"" J.Photopolym.Sci.Technol. 8. 141-144 (1995)

Masamitsu SHIRAI：“在辐照聚合物表面形成聚硅氧烷：液相沉积方法”J.Photopolym.Sci.Technol。

白井正充: "Thickness Changes During Polysiloxane Formation At Ivradiated Surfaceof Films Bearing Photoacid Generating Units" J.Photopolym.Sci.Technol.7. 41-44 (1994)

Masamitsu Shirai：“带有光致产酸装置的薄膜的辐照表面聚硅氧烷形成过程中的厚度变化”J.Photopolym.Sci.Technol.7 (1994)。

Masamitsu SHIRAI: ""Photochemically Induced Acid-Catalyzed Desilylation of Polymer Films"" Chem.Mater. 7. 642-648 (1995)

Masamitsu SHIRAI：““聚合物薄膜的光化学诱导酸催化脱甲硅烷基化””Chem.Mater。

Masamitsu Shirai: "Thickness Changes During Polysiloxane Formation at the Irradiated Surface of Films Bearing Photoacid........" J.Photopolym.Sci.Technol.7. 41-44 (1994)

Masamitsu Shirai：“承载光酸的薄膜在辐照表面形成聚硅氧烷期间的厚度变化......”J.Photopolym.Sci.Technol.7。