MRI: Acquisition of an Electron Beam Lithography System for Quantum Engineering and Nanoscience Research, Education and Training

MRI：采购用于量子工程和纳米科学研究、教育和培训的电子束光刻系统

• 批准号: 2215550
• 负责人: Juliet Gopinath
• 金额: $ 137.9万
• 依托单位: University of Colorado at Boulder
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2022
• 资助国家: 美国
• 起止时间: 2022-09-01 至 2025-08-31
• 项目状态: 未结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2215550&HistoricalAwards=false
• 关键词: MRI; Acquisition; Electron; Beam; Lithography

Abstract TitleThe acquisition of a state-of-the-art electron beam lithography system that will enable high resolution patterning of materials and devices.AbstractThe capability of high-resolution patterning a wide range of materials into nanostructures is a fundamental requirement for almost all solid-state materials and device research. This has been instrumental in key technological advancements including high-performance classical and quantum computing, photonic communications, chip-scale optical frequency combs, integrated sensors, energy harvesting, and flexible electronics. Future breakthroughs will lead to long-distance quantum networks, fault-tolerant quantum computers, miniature chip-scale optical clocks, new materials for thermal transport, personalized medicine, and nanosensors for force, position and navigation. The proposed acquisition of a state-of-the-art electron beam lithography (EBL) system at University of Colorado Boulder will provide the required nanofabrication capabilities. It will greatly enhance scientific research and education for a broad array of researchers and students, including under-represented groups, in the Rocky Mountain Region, as well as nationwide. This will help to address the national need for expertise in the semiconductor and quantum industries. The EBL’s unique capabilities have attracted over 64 research programs, with strong interest in an electron beam lithography system at University of Colorado Boulder. The system will provide the region’s only state-of-the-art 100 kV electron beam writer in an open access shared user facility. The goal of the project is the acquisition of a state-of-the-art electron beam lithography system at the University of Colorado Boulder that will enable nanofabrication capabilities in terms of high pattern resolution, large field of view, low stitching/overlay errors and features with low side-wall roughness. Research on solid-state nano-scale devices requires the ability to produce complex, high-quality patterns on functional materials. For further progress, fabrication techniques that yield nanometer-scale resolution, low roughness, and high quality devices are critical. Electron beam lithography, with its wide applicability to a vast array of materials, nanometer-scale resolution, and ability to produce high quality devices is well-suited to the next generation of devices that will form the backbone of nano-, photonic, quantum and electronic technology. The system will spark a wide array of nanoscience and quantum engineering research, transforming materials and device research in the Rocky Mountain region and on a national scale. The proposed EBL system will greatly enhance regional and national research and collaboration in the areas of quantum technologies, photonics, sensing and metrology, bioengineering, and energy, providing fabrication capabilities currently unavailable to most researchers and students in the Rocky Mountain Region. It will be a cornerstone for the research at the University of Colorado Boulder, as well as for the broader research community and industry in the Rocky Mountain Region and across the United States.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

摘要标题获得最先进的电子束光刻系统，该系统将实现材料和器件的高分辨率图案化。摘要将各种材料高分辨率图案化为纳米结构的能力是几乎所有固体材料的基本要求。这对关键技术进步发挥了重要作用，包括高性能经典和量子计算、光子通信、芯片级光学频率梳、集成传感器、能量收集和柔性电子产品。长距离量子网络、容错量子计算机、微型芯片级光学时钟、热传输新材料、个性化医疗以及用于力、位置和导航的纳米传感器。科罗拉多大学博尔德分校的光束光刻 (EBL) 系统将提供所需的纳米加工能力，它将极大地增强广大研究人员和学生的科学研究和教育，包括落基山脉地区以及代表性不足的群体。这将有助于满足国家对半导体和量子行业专业知识的需求，EBL 的独特能力吸引了超过 64 个研究项目，科罗拉多大学博尔德分校的电子束光刻系统将提供该系统。该项目的目标是在科罗拉多大学博尔德分校购买最先进的电子束光刻系统。这将实现高图案分辨率、大视场、低拼接/重叠误差和低侧壁粗糙度特征方面的纳米制造能力。固态纳米级器件的研究需要能够生产复杂的、高质量的产品。为了进一步发展功能材料上的图案，产生纳米级分辨率、低粗糙度和高质量器件的电子束光刻技术至关重要，因为它具有广泛的材料适用性、纳米级分辨率和能力。产生高高质量的设备非常适合下一代设备，这些设备将成为纳米、光子、量子和电子技术的支柱，该系统将引发广泛的纳米科学和量子工程研究，以及洛基的材料和设备研究。拟议的 EBL 系统将极大地促进量子技术、光子学、传感和计量、生物工程和能源领域的区域和国家研究与合作，提供目前大多数研究人员和学生无法获得的制造能力。落基山脉地区。这将成为科罗拉多大学博尔德分校以及落基山区和美国各地更广泛的研究界和行业的研究的基石。该奖项是 NSF 的法定使命，并被认为值得通过以下方式获得支持：使用基金会的智力价值和更广泛的影响审查标准进行评估。