Collaborative Research: Photoassisted CVD for Low Temperature Area Selective Deposition

合作研究：用于低温区域选择性沉积的光辅助 CVD

• 批准号: 2216070
• 负责人: Lisa McElwee-White
• 金额: $ 41.34万
• 依托单位: University of Florida
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2022
• 资助国家: 美国
• 起止时间: 2022-09-01 至 2025-08-31
• 项目状态: 未结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2216070&HistoricalAwards=false
• 关键词: Collaborative; Research; Photoassisted; CVD; Low

Non-technical AbstractWith support from the Ceramics and the Solid State and Materials Chemistry programs in the Division of Materials Research, Professor Amy Walker of the University of Texas at Dallas and Professor Lisa McElwee-White of the University of Florida are developing light driven chemical synthesis methods to prepare patterns of metal on surfaces that are too heat sensitive to withstand conventional methods for deposition of metals. This process, called photoassisted chemical vapor deposition (PACVD), enables area-selective deposition of materials during the manufacture of electronic devices. Professors Walker and McElwee-White are growing metal films with high precision using a new approach: PACVD on regularly arranged regions of molecules called self-assembled monolayers, in which the ends of the molecules can be chosen for specific chemical reactions. By arranging regions of reactive ends and non-reactive ends, the placement of the metal on the surface can be controlled. The novel low-temperature deposition technique for metallic films could in the future enable the formation of layered heterostructured materials with interconnects on glassy or ceramic materials without damaging a carefully tailored microstructure. Thereby advances could lead to improvements in manufacturing for technologies ranging from sensors to energy harvesting equipment. Other fields, like integrating organic electronics onto cloth or plastic supports could benefit from insights gained from this project as well. Graduate and undergraduate students working on this interdisciplinary project learn technical and collaborative skills valuable in both academia and industry, preparing them for a variety of careers. To communicate the excitement of science to the general public, the PIs generate a series of 90-second “Tiny Tech” radio modules and podcasts that feature real world applications of materials and chemistry-based nanoscience.Technical AbstractThe goal of the proposed work is to develop a new class of area selective deposition (ASD) methods in which low temperature photoassisted chemical vapor deposition (PACVD) processes are employed for the selective deposition of metals onto functionalized thermally sensitive materials. The continued downscaling of device structures has led to significant challenges for conventional top-down lithographic approaches. In contrast, ASD leads to the deposition of materials only in a desired area – the target “growth” surface – without as many complex lithography steps. The development of reliable low temperature ASD of metallic thin films as part of heterostructures involving glassy materials or tailored ceramic substrates, as well as on organic materials, is therefore critical to many technologies including energy harvesting, sensing, magnetoelectronics and organic electronics. The proposed approach to ASD relies on mechanism-based design of precursors that upon photolysis, generate intermediates that react with specific functional groups on the growth surface, nucleating the metal deposit. The non-growth surface will be functionalized with groups that are unreactive (or less reactive) with the intermediates, resulting in ASD. In these studies, self-assembled monolayers (SAMs) will be used for both growth and non-growth surfaces. SAMs have highly organized structures with a uniform density of terminal functional groups and can be easily patterned enabling quantitative investigation of the precursor-molecule interactions and deposition selectivity.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

德克萨斯大学达拉斯大学的艾米·沃克（Amy Walker）教授和佛罗里达大学的Lisa McElwee教授的艾米·沃克（Amy Walker）教授正在开发光驱动的化学合成方法，以使高敏感的金属上的金属在公约中启用常规方法，从而，材料研究司的非技术摘要与材料研究部的固态和材料化学计划的支持。这个过程称为光助焊剂化学蒸气沉积（PACVD），可以在电子设备制造过程中对材料进行区域选择性沉积。 Walker和McElwee-White教授使用一种新方法生长具有高精度的金属膜：PACVD在定期布置的分子区域，称为自组装单层，其中可以选择分子的末端进行特定的化学反应。通过排列反应性末端和非反应性末端的区域，可以控制金属在表面上的位置。金属薄膜的新型低温沉积技术将来可能会在玻璃状或陶瓷材料上互连的分层异质化材料形成，而不会损害精心量身定制的微观结构。因此，进步可能会导致从传感器到能源收集设备的技术的制造业改进。其他领域，例如将有机电子设备集成到布或塑料支架上，也可以从该项目中获得的见解中受益。从事这个跨学科项目的研究生和本科生学习在学术界和行业中都很有价值的技术和协作技能，为各种职业做好了准备。 To communicate the excitement of science to the general public, the PIs generate a series of 90-second “Tiny Tech” radio modules and podcasts that feature real world applications of materials and chemistry-based nanoscience.Technical AbstractThe goal of the proposed work is to develop a new class of area selective deposition (ASD) methods in which low temperature photoassisted chemical vapor deposition (PACVD) processes are employed for the selective deposition金属上功能化的热敏感材料。设备结构的持续缩减导致了常规的自上而下的光刻方法面临重大挑战。相反，ASD仅在所需区域（目标“生长”表面）导致材料的沉积，而没有许多复杂的光刻步骤。因此，作为异质结构涉及玻璃材料或量身定制的陶瓷底物以及有机材料的异质结构的一部分的可靠低温ASD的发展对于许多技术至关重要，这对于许多技术至关重要，包括能量收集，传感，磁电机和有机电子学。提出的ASD方法依赖于基于机制的前体设计，这些设计是在光解时产生与生长表面上特定官能团反应的中间体，从而将金属沉积物成核。非生长表面将通过与中间体无反应（或较少反应性）的组功能化，从而导致ASD。在这些研究中，自组装的单层（SAM）将用于生长和非生长表面。 SAM具有高度组织的结构，其终端官能团的密度均匀，并且很容易被模式化，从而实现了前体 - 分子相互作用和沉积选择性的定量投资。该奖项反映了NSF的法定任务，并被认为是通过基金会的智力优点和更广泛影响的评估来通过评估来支持的珍贵。