Alternative Chemistries for Barrier Materials in Cu Metallization

铜金属化中阻挡材料的替代化学物质

• 批准号: 0304810
• 负责人: Lisa McElwee-White
• 金额: $ 236.7万
• 依托单位: University of Florida
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-09-01 至 2009-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0304810&HistoricalAwards=false
• 关键词: Alternative; Chemistries; Barrier; Materials; Cu

Lisa McElwee-White, Department of Chemistry, Timothy J. Anderson, Department of Chemical Engineering, David P. Norton, Department of Materials Science and Engineering, all of the University of Florida, in collaboration with Steven W. Johnston, Intel Corporation, Sung Min Cho, Sungkyunkwan University, Korea, and Karin Pruessner, Materials Science and Engineering, University of Florida are funded with an award from the Collaborative Research in Chemistry Program with funds provided by the Division of Chemistry, the Division of Physics, the Division of Molecular, Cellular Biology and the Office of Multidisciplinary Activities. This multifaceted team will investigate newdiffusion barrier materials that are more stable toward copper diffusion than titanium nitride for future generations of integrated circuits. This collaborative project involves preparation of single source precursors for metal-organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) of WNx followed by screening of the precursors, CVD and ALD growth studies, and characterization of the deposited material. Comparative studies of microstructure and Cu diffusion in MOCVD and physical vapor deposition (PVD) WNx films will allow evaluation of their potential in barrier applications.A critical problem in the electronics industry, development of a suitable barrier material against Cu diffusion and a method of depositing it in high aspect ratio vias, will be investigated using a multidisciplinary approach This collaboration connects precursor chemistry development, deposition process refinement, materials characterization, computational modeling and device fabrication. The investigators will investigate WNx in addition to new materials. Students and postdoctoral associates will gain exposure to team-based training and problem solving skills that reach outside their own disciplines of graduate study. In addition, the interaction with Intel will broaden their perspectives beyond academic research. This collaboration has a history of diversity that reflects the local population. Activities such as educational module development and outreach to grade 8-12 girls will encourage participation by others in related areas of science.

佛罗里达大学材料科学与工程系化学工程学系化学系的化学系，蒂莫西·J·安德森（Timothy J.计划由化学司，物理司，分子，细胞生物学和多学科活动办公室提供的资金。 这个多方面的团队将调查与子孙后代的综合电路相比，新扩散屏障材料对铜扩散更稳定。该协作项目涉及为WNX的金属有机化学蒸气沉积（MOCVD）和原子层沉积（ALD）制备单一源前体，然后筛选前体，CVD和ALD生长研究以及沉积材料的表征。对MOCVD和物理蒸气沉积（PVD）WNX膜中微结构和CU扩散的比较研究将允许评估其在屏障应用中的潜力。电子行业中的一个关键问题，开发适合CU扩散的合适障碍物的材料，并将其在高度远景比率中进行研究，将其用于高度息息相关的方法，该方法是在高度远景比例中进行了研究，该方法是在多种层面上进行的连接，并且可以在多个层面上进行连接，并且培养的方法是多数的，培训是多数的。材料表征，计算建模和设备制造。调查人员除了新材料外还将研究WNX。 学生和博士后同事将获得基于团队的培训和解决问题的技能，这些技能超出了自己的研究生学习学科。此外，与英特尔的互动将把他们的观点扩展到学术研究之外。这项合作具有反映当地人口的多样性历史。教育模块发展和对8-12年级女孩的宣传等活动将鼓励其他人参与相关的科学领域。