SBIR Phase I: Plasma Enhanched Hot Filament Chemical Vapor Deposition of Ultrananocrystalline Diamond Thin Films

SBIR 第一阶段：超纳米晶金刚石薄膜的等离子体增强热丝化学气相沉积

• 批准号: 0610914
• 负责人: John Carlisle
• 金额: --
• 依托单位: ADVANCED DIAMOND TECHNOLOGIES
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-07-01 至 2007-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0610914&HistoricalAwards=false
• 关键词: SBIR; Phase; Plasma; Enhanched; Hot

This Small Business Innovation Research (SBIR) Phase I project will determine the feasibility and suitability of using a plasma enhanced hot filament chemical vapor deposition (PEHFCVD) technology as a manufacturing platform for the large scale deposition of ultra nanocrystalline diamond (UNCD) thin films. UNCD is synthesized today using a unique argon-rich plasma chemistry via microwave plasma chemical vapor deposition (MPCVD). As of today, MPCVD is the only known way to deposit UNCD, since C2 and C2H radicals are produced via Penning ionization collisions between Ar+ and C2H2. HFCVD is an attractive candidate to create a more scalable and economical manufacturing platform because recent advances have made it suitable for the large area uniform deposition of microcrystalline and nanocrystalline diamond thin films, but normally only produces radicals via thermal decomposition. The focus of the proposed work is to investigate the transferability of the unique (and patented) UNCD growth process to the HFCVD platform by utilizing a DC plasma discharge to generate C2 via nonequilibrium processes in addition to thermal decomposition, and to assay the films grown in this way using a variety of material characterization techniques to ensure that the films possess the desired materials properties inherent to UNCD thin films.The commercial value of this endeavor is to increase manufacturing throughput and lower costs through the development of a more robust large-area platform for UNCD deposition as compared to MPCVD. A large area, economical platform for manufacturing UNCD would make diamond a compelling material that would become affordable for applications ranging from tribological coatings (saving energy by lowering friction); electronics (extraordinary thermal management); and biomedical devices (implantable devices such as retinal prostheses).

这项小型企业创新研究（SBIR）I阶段项目将确定使用血浆增强的热丝细丝化学蒸气沉积（PEHFCVD）技术的可行性和适用性，作为用于大规模沉积Ultra纳米晶体钻石（UNC）薄膜的大规模沉积的制造平台。如今，使用微波等离子体化学蒸气沉积（MPCVD）使用独特的富含氩气的血浆化学合成UNCD。截至目前，MPCVD是唯一已知的沉积UNCD的方法，因为C2和C2H自由基是通过AR+和C2H2之间的笔球电离碰撞产生的。 HFCVD是创建一个更具扩展性和经济制造平台的有吸引力的候选人，因为最近的进步使其适合微晶和纳米晶型钻石薄膜的大面积均匀沉积，但通常仅通过热分解产生自由基。拟议工作的重点是通过利用DC血浆放电来调查独特（和专利的）UNCD增长过程向HFCVD平台的转移性，除了热分解外，通过非元素过程生成C2，除了热分解外，还可以通过这种材料属性来确保薄膜在薄膜中生长，以确保薄膜的薄膜属性，该材料属性属性属于薄膜，使得薄膜属于薄膜，并具有薄膜的属性，即构造的材料属性属性属性，以确保薄膜的属性属性。与MPCVD相比，努力是通过开发一个更健壮的大区域平台来增加制造吞吐量和降低成本。制造UNCD的一个大面积，经济的平台将使钻石成为引人入胜的材料，从摩擦学涂料（通过降低摩擦来节省能源）的应用将使钻石变得负担得起；电子设备（非凡的热管理）；和生物医学设备（视网膜假体等植入设备）。