NER: Supercritical Carbon Dioxide Assisted Deposition and Interfacial Properties of Metal Oxide Thin Films

NER：超临界二氧化碳辅助金属氧化物薄膜的沉积和界面性能

• 批准号: 0506690
• 负责人: Theodosia Gougousi
• 金额: $ 10万
• 依托单位: University of Maryland Baltimore County
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-07-01 至 2007-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0506690&HistoricalAwards=false
• 关键词: NER; Supercritical; Carbon; Dioxide; Assisted

NER: Supercritical carbon dioxide assisted deposition and Interfacial properties of metal oxide thin films.NSF Nanoscale Exploratory ResearchPI: Prof. Theodosia GougousiDepartment of Physics, University of Maryland Baltimore CountyThis proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category NER. The objective of this research is to investigate whether salvation forces from supercritical fluids can be used to enable deposition of thin insulating films with good interfacial properties. Mainstream vacuum-based deposition techniques are usually mass transport limited by the low vapor pressure of the precursors, and proceed through a chemical reaction on a heated substrate (300 C), high pressure process that uses soluble organic peroxides and metal organic precursors to a surface, b) provide energy for film formation, and c) accomplish reaction by-product removal.This research is important because fabrication of future nanoscale devise may entail formation of multilayer miniaturized structures on patterned surfaces, and may involve depositions on microporous structures and on temperature sensitive materials such as organic or biological molecules. Nanoscale materials have different properties from bulk materials because the proportion of surfaces and interfaces in significant compared to the volume. As a result, interface phenomena are important because they define the operation of nanodevices. Conventional chemical vapor deposition techniques are unable to deposit uniform films on deep, narrow wells or inside porous materials. They involve high temperature steps that augment undesirable interface reactivity and would either destroy or render inactive most organic/biological molecules. Processing in supercritical carbon dioxide may provide a low temperature avenue for the deposition of uniform, high purity, thin films, with desirable interfacial properties and quality on patterned surfaces or microporpous structures, impacting technological fields such nanoelectronics, molecular electronics, biocatalysis, NEMS and bioNEMS. Students will be trained in these novel approaches providing the human infrastructure required for the wider implementation of these techniques.

NER：金属氧化物薄膜的超临界二氧化碳的辅助沉积和界面特性。 这项研究的目的是研究是否可以使用超临界流体的救赎力来使具有良好界面特性的薄绝缘膜沉积。 基于主流真空的沉积技术通常受到前体的低蒸气压力的限制，并通过对加热的底物（300 c）的化学反应进行，使用的高压过程，使用溶解有机过氧化物和金属有机物前体对表面上的金属有机前体进行，b）为膜形成的能量提供了对膜的反应，以实现纽约。多层化表面上的多层化结构，可能涉及微孔结构和温度敏感材料（例如有机或生物分子）上的沉积。 纳米级材料与大量材料具有不同的特性，因为与体积相比，表面和界面的比例在很大程度上。 结果，界面现象很重要，因为它们定义了纳米版的操作。 常规的化学蒸气沉积技术无法在深，狭窄的井或多孔材料上沉积均匀的薄膜。 它们涉及高温步骤，以增强不良界面反应性，并且会破坏或造成不活跃的大多数有机/生物分子。 在超临界二氧化碳中的加工可能会为均匀，高纯度，薄膜的沉积提供低温途径，并具有理想的界面性能和质量，并在图案化表面或微疏松结构上影响纳米电子领域，例如分子电子，生物核分析，nems和biionems和Biionems。 将对这些新颖的方法进行培训，以提供更广泛实施这些技术所需的人类基础设施。