MRI: High Aspect Ratio Etching System for Micro and Nanoscale Sensor and Sensor Systems Applications

MRI：用于微米级和纳米级传感器及传感器系统应用的高深宽比蚀刻系统

• 批准号: 0321099
• 负责人: Srinivas Tadigadapa
• 金额: $ 37.1万
• 依托单位: Pennsylvania State Univ University Park
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-08-15 至 2004-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0321099&HistoricalAwards=false
• 关键词: MRI; Aspect; Ratio; Etching; System

This Major Research Instrumentation (MRI) award provides funding for an inductively coupled plasma etching system consisting of three process modules: (i) advanced silicon etch module for high etch-rate, high aspect ratio etching of silicon; (ii) oxide etch module for high aspect ratio etching of quartz, silicon dioxide, and other ceramic materials; and (iii) a xenon difluoride vapor phase etching module for isotropic chemical etching of silicon with high selectivity. The instrument will be used by more than 25 research groups in 10 academic departments at Penn State University to conduct research in the areas of microfluidics, biochemical sensors, high-speed switches and nanoscale resonators for radio frequency applications, integration of high-performance piezoelectric and polymeric thin films into silicon microsystems and investigation into fundamental quantum mechanical effects at the nanoscale. It will also be used to develop undergraduate and graduate level laboratory courses in microfabrication techniques as part of a course curriculum in micro and nanosystems technology.The proposed tool configuration will allow researchers at Penn State to develop novel sensors, actuators, and electronic systems for applications ranging from biomedical technology to homeland security. In addition to fostering interdisciplinary research, the tool will provide hands-on fabrication experience to students and will be instrumental in the creation of a workforce skilled in the areas of micro and nanoscale science and technology. The advanced etching capability with the uniquely developed etching processes will attract new research collaborations with industry and national laboratories to Penn State University. The etch tool will also impact the nano-camp and chip-camp programs currently offered for K-12 students on nanoscience and nanotechnology.

这项主要的研究仪器（MRI）奖为电感耦合等离子体蚀刻系统提供资金，该系统由三个过程模块组成：（i）用于高蚀刻速率的高级硅蚀刻模块，用于硅的高蚀刻速率，高纵横比蚀刻； （ii）石英，二氧化硅和其他陶瓷材料的高纵横比蚀刻的氧化物蚀刻模块； （iii）浅选择性高的各向同性化学蚀刻的氙色氟化物蒸气相蚀刻模块。该仪器将在宾夕法尼亚州立大学10个学术系中的25个以上的研究小组使用，以在微流体学，生化传感器，高速开关和纳米级共振器的领域进行无线电频率应用，高表现频率的整合，将高性能电力和聚合物薄膜的高表现型和聚合物薄膜和硅化量的量子量进行了努力，并进行了均可促成的均效应。它还将用于开发微分解技术的本科和研究生级实验室课程，作为微型和纳米系统技术课程的一部分。该建议的工具配置将使宾夕法尼亚州立大学的研究人员能够开发新型传感器，执行器，执行器和电子系统，用于从生物医学技术到本地技术的应用。除了培养跨学科研究外，该工具还将为学生提供动手制造的经验，并有助于创建在微观和纳米级科学技术领域的劳动力。具有独特开发的蚀刻过程的先进蚀刻能力将吸引与宾夕法尼亚州立大学的工业和国家实验室的新研究合作。 Etch工具还将影响目前为纳米科学和纳米技术提供的K-12学生提供的纳米训练营和芯片训练营计划。