MRI: High Aspect Ratio Etching System for Micro and Nanoscale Sensor and Sensor Systems Applications

MRI：用于微米级和纳米级传感器及传感器系统应用的高深宽比蚀刻系统

• 批准号: 0321099
• 负责人: Srinivas Tadigadapa
• 金额: $ 37.1万
• 依托单位: Pennsylvania State Univ University Park
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-08-15 至 2004-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0321099&HistoricalAwards=false
• 关键词: MRI; Aspect; Ratio; Etching; System

This Major Research Instrumentation (MRI) award provides funding for an inductively coupled plasma etching system consisting of three process modules: (i) advanced silicon etch module for high etch-rate, high aspect ratio etching of silicon; (ii) oxide etch module for high aspect ratio etching of quartz, silicon dioxide, and other ceramic materials; and (iii) a xenon difluoride vapor phase etching module for isotropic chemical etching of silicon with high selectivity. The instrument will be used by more than 25 research groups in 10 academic departments at Penn State University to conduct research in the areas of microfluidics, biochemical sensors, high-speed switches and nanoscale resonators for radio frequency applications, integration of high-performance piezoelectric and polymeric thin films into silicon microsystems and investigation into fundamental quantum mechanical effects at the nanoscale. It will also be used to develop undergraduate and graduate level laboratory courses in microfabrication techniques as part of a course curriculum in micro and nanosystems technology.The proposed tool configuration will allow researchers at Penn State to develop novel sensors, actuators, and electronic systems for applications ranging from biomedical technology to homeland security. In addition to fostering interdisciplinary research, the tool will provide hands-on fabrication experience to students and will be instrumental in the creation of a workforce skilled in the areas of micro and nanoscale science and technology. The advanced etching capability with the uniquely developed etching processes will attract new research collaborations with industry and national laboratories to Penn State University. The etch tool will also impact the nano-camp and chip-camp programs currently offered for K-12 students on nanoscience and nanotechnology.

这项重大研究仪器 (MRI) 奖项为感应耦合等离子体蚀刻系统提供资金，该系统由三个工艺模块组成：(i) 先进的硅蚀刻模块，用于高蚀刻速率、高深宽比蚀刻硅； (ii) 用于石英、二氧化硅和其他陶瓷材料的高深宽比蚀刻的氧化物蚀刻模块； (iii)二氟化氙气相蚀刻模块，用于以高选择性对硅进行各向同性化学蚀刻。该仪器将被宾夕法尼亚州立大学 10 个学术部门的超过 25 个研究小组使用，在微流体、生化传感器、高速开关和射频应用纳米级谐振器、高性能压电和聚合物薄膜进入硅微系统并研究纳米尺度的基本量子力学效应。它还将用于开发微加工技术的本科和研究生水平的实验室课程，作为微米和纳米系统技术课程的一部分。拟议的工具配置将使宾夕法尼亚州立大学的研究人员能够开发新颖的传感器、执行器和电子系统以供应用从生物医学技术到国土安全。除了促进跨学科研究外，该工具还将为学生提供动手制造经验，并将有助于培养在微米和纳米科学技术领域熟练的劳动力。先进的蚀刻能力和独特开发的蚀刻工艺将吸引宾夕法尼亚州立大学与行业和国家实验室进行新的研究合作。该蚀刻工具还将影响目前为 K-12 学生提供的纳米科学和纳米技术纳米训练营和芯片训练营项目。