Dynamics of Electron Beam Ablation

电子束烧蚀动力学

• 批准号: 9522282
• 负责人: Ronald Gilgenbach
• 金额: $ 26.05万
• 依托单位: Regents of the University of Michigan - Ann Arbor
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1995
• 资助国家: 美国
• 起止时间: 1995-08-15 至 1999-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9522282&HistoricalAwards=false
• 关键词: Dynamics; Electron; Beam; Ablation

Abstract Gilgenbach CTS-9522282 The PI proposes to extend his work on pulsed laser ablation to the new film growth method of channel-spark pulsed electron beam ablation. The objectives would be to develop a knowledge base and scaling laws on electron beam ablation, which can be compared to laser ablation and thus evaluate new engineering applications. Five research tasks will be addressed. These include: (1) electron beam characterization, energy deposition mechanisms and electrical efficiency; (2) diagnostic characterization, using laser and optical techniques, of species composition (atoms, ions and electrons); (3) particulate and molten droplet generation mechanisms, size and density; (4) effects of electron transport, focusing, and plasma chemistry in background gases; and (5) electron beam ablative deposition of thin films and correlation with diagnostics. Where applicable comparisons will be made with the corresponding laser ablation results. The electron beams will be generated using a channel-spark device in which high currents (~1.5 kA),and moderate voltages (~20 keV) are employed, resulting in beam energy of approximately 1 J/pulse. The PI plans to carry out both experimental and modeling efforts during the course of this investigation.

摘要Gilgenbach CTS-9522282 PI提议将其在脉冲激光消融上的工作扩展到新的薄膜生长方法的新膜生长方法，即频道螺旋脉冲脉冲电子束消融。 目的是制定有关电子束消融的知识库和扩展定律，可以将其与激光消融相提并论，从而评估新的工程应用。 将解决五项研究任务。其中包括：（1）电子束表征，能量沉积机理和电效率； （2）使用激光和光学技术对物种组成（原子，离子和电子）的诊断表征； （3）颗粒和熔融液滴的产生机制，大小和密度； （4）背景气体中电子传输，聚焦和等离子体化学的影响； （5）薄膜的电子束烧蚀沉积以及与诊断的相关性。如果适用的比较将与相应的激光消融结果进行。 电子梁将使用通道链接设备生成，其中高电流（〜1.5 ka）和中等电压（〜20 keV），导致梁的能量约为1 J/脉冲。 PI计划在调查过程中同时进行实验和建模工作。