Replacement of an Excimer laser for pulse laser deposition system
更换脉冲激光沉积系统的准分子激光器
基本信息
- 批准号:359426-2008
- 负责人:
- 金额:$ 7.95万
- 依托单位:
- 依托单位国家:加拿大
- 项目类别:Research Tools and Instruments - Category 1 (<$150,000)
- 财政年份:2007
- 资助国家:加拿大
- 起止时间:2007-01-01 至 2008-12-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Pulsed Laser Deposition (PLD) is a unique and easy technique for producing thin films of materials specifically Oxides. In the PLD technique a very short and high energy laser pulse is focused on a target material located in an ultra high vacuum chamber. The focused laser beam is intense enough to produce a plume of vaporized material. In order to grow an epitaxial film a substrate located on a heater at a short distance away from the target allowing the vaporized material to recombine and form a layer of film on substrate. In PLD one needs to adjust few parameters in order to grow an epitaxial thin films of materials. With this technique one also can produce multi-layers film containing several materials. At Brock such a system is in operation since 1991. We have used a Lumonics excimer laser, 200 mJ of energy per pulse,that was built in 1983. This excimer laser is no longer safe to be used due to the leakage of halogen gas and the broken front mirror (no longer available commercially).The PLD system has served the student at Brock well for entering into the Canadian job market in this advanced field of thin films of material research technology. Indeed since 1991, two visiting Professors, two post doctoral fellows, two PhD students (co-supervised), ten MSc students, and seven fourth year students (thesis projects) used the pulse laser deposition system for their projects. This training helped many of my students to find jobs in industries or to continue successfully their education in a PhD program. My present graduate and undergraduate students need the PLD system not only for their thesis project but also helping them to contribute to the future of Canadian work force in the electronic industries.
脉冲激光沉积 (PLD) 是一种独特且简单的技术,用于生产材料(特别是氧化物)薄膜。在 PLD 技术中,聚焦激光将非常短的高能量激光脉冲聚焦在位于超高真空室中的目标材料上。在 PLD 中,光束的强度足以产生蒸发材料的羽流,以便在距目标很短距离的加热器上生长外延薄膜,从而使蒸发的材料在基板上重新组合并形成薄膜层。一个需要调整几个参数以生长材料的外延薄膜,这种技术还可以生产包含多种材料的多层薄膜,这样的系统自 1991 年以来一直在运行。我们使用了 Lumonics 准分子激光器,200。每脉冲能量 mJ,建于 1983 年。由于卤素气体泄漏和前镜损坏(不再可用),该准分子激光器不再安全使用事实上,自 1991 年以来,PLD 系统为布鲁克大学的学生进入薄膜材料研究技术这一先进领域的加拿大就业市场提供了良好的帮助,两名客座教授、两名博士后研究员、两名博士生(合作)。 -指导),十名硕士生和七名四年级学生(论文项目)在他们的项目中使用了脉冲激光沉积系统。这次培训帮助我的许多学生在行业中找到了工作或继续成功地攻读博士学位。我现在的研究生和本科生学生不仅需要 PLD 系统来完成他们的论文项目,还需要帮助他们为加拿大电子行业劳动力的未来做出贡献。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Razavi, Fereidoon其他文献
Razavi, Fereidoon的其他文献
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