Beyond direct-write: Dynamically reconfigurable holographic multibeam interference lithography for high-throughput nanomanufacturing

超越直写：用于高通量纳米制造的动态可重构全息多束干涉光刻

基本信息

批准号：
2719982
负责人：
金额：
--
依托单位：
University of Cambridge
依托单位国家：
英国
项目类别：
Studentship
财政年份：
2022
资助国家：
英国
起止时间：
2022 至无数据
项目状态：
未结题

来源：
https://gtr.ukri.org/projects?ref=studentship-2719982
关键词：
Beyond direct write Dynamically reconfigurable

项目摘要

This project aims to develop a laboratory implementation of a new dynamic lithography technique, named "holographic multibeam interference lithography (HMBIL)." This new technique will combine the advantages of interference lithography (e.g. [1]) with holographically pre-shaped beams [2]. Unlike traditional interference lithography - which is limited to periodic patterns - HMBIL is anticipated to enable the patterning of arbitrarily-shaped features. The proposed technique will also achieve comparable write-speeds to interference lithography, with our target to write >25 cm2 device area in under 1 hour with resolution down to 100 nm. Achieving arbitrarily shaped nanoscale features with such fast write-speeds is unachievable with current direct-write technologies (e.g. laser direct-write), and presents a key unmet need in the manufacture of emerging electronic and photonic systems. This PhD project aims to address this need by developing HMBIL. As a proof-of-principle, the project will demonstrate the capability of HMBIL for manufacturing an example device structure: multispectral filter arrays. These filter arrays, when integrated with an image sensor, will allow the acquisition of light spectra for applications as diverse as medical imaging to remote sensing. HMBIL manufacture of multispectral filter arrays will open up a range of avenues for custom detectors and imaging sensors for security, industrial or medical applications.

该项目旨在开发一种新型动态光刻技术的实验室实施，该技术名为“全息多微光干涉光刻（HMBIL）”。这项新技术将结合干扰光刻（例如[1]）的优势与全息束[2]相结合。与传统的干扰光刻不同（仅限于周期性模式），预计HMBIL可以使任意形状的特征具有模式。所提出的技术还将实现与干涉光刻相当的写速，而我们的目标是在1小时以下的不到1小时内写入> 25 cm2设备区域，而分辨率降至100 nm。使用当前的直接处理技术（例如激光直接 - 透射），无法实现具有这样快速写入速度的任意形状的纳米级特征，并且在制造新兴的电子和光子系统方面提出了关键的未满足需求。这个博士学位项目旨在通过发展HMBIL来满足这一需求。作为原理证明，该项目将展示HMBIL在制造示例设备结构的能力：多光谱过滤器阵列。这些过滤器阵列与图像传感器集成时，将允许获取像医学成像到遥感一样多样化的光谱。多光谱过滤器阵列的HMBIL生产将为自定义探测器和成像传感器提供一系列途径，用于安全，工业或医疗应用。