A development of novel decomposition technology for NDMA by short wavelength UV lamp

短波长紫外灯分解NDMA新技术的开发

• 批准号: 23760500
• 负责人: SAKAI Hiroshi
• 金额: $ 2.83万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2012
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23760500/
• 关键词: 紫外線水処理; 国際情報交流

In this study, we picked up NDMA as a new disinfection by-product. We examined the efficiency of ultraviolet treatment as the treatment method. The potential benefit of ultraviolet radiation of shorter wavelength than traditional was revelaed. I examined the lamp of 222nm shorter than 254nm conventional lamp. We investigated the effect of dissolved matters on the decomposition efficiency of NDMA by 222nm lamp. We obtained a result which lamp is more suitable for the degradation, depending on water conditions. Further, it was found that using the novel fluorescent excimer lamp to output a 220-254nm, NDMA was decomposed efficiently while suppressing the formation of nitrite as a by-products.

在这项研究中，我们选择了 NDMA 作为一种新的消毒副产品。我们检查了作为处理方法的紫外线处理的效率。人们揭示了波长比传统紫外线辐射更短的紫外线辐射的潜在好处。我测试了比254nm传统灯短的222nm灯。我们研究了溶解物对222nm灯分解NDMA效率的影响。我们得出了哪种灯更适合降解的结果，具体取决于水的条件。此外，发现使用新型荧光准分子灯输出220-254nm，NDMA被有效分解，同时抑制副产物亚硝酸盐的形成。

项目成果

共存物質がN-ニトロソジメチルアミンの紫外線分解と塩素添加による再生成に与える影響

共存物质对N-亚硝基二甲胺紫外分解及加氯再生的影响

• 发表时间: 2012
• 作者: 高松達朗;酒井宏治;小熊久美子;小坂浩司;浅見真理;滝沢智
• 通讯作者: 滝沢智

Degradation of N-Nitrosodimethylamine (NDMA) by 222 nm and 254 nm UV light

222 nm 和 254 nm 紫外光降解 N-亚硝基二甲胺 (NDMA)

• 发表时间: 2011
• 作者: Hiroshi SAKAI;Tatsuro TAKAMATSU;Koji KOSAKA;Naoyuki KAMIKO;Satoshi TAKIZAWA
• 通讯作者: Satoshi TAKIZAWA

Effects of Natural Organic Matter and Nitrate on the Behavior of NDMA during UV Irradiation and Chloramination

天然有机物和硝酸盐对 NDMA 在紫外线照射和氯胺化过程中行为的影响

• 发表时间: 2014
• 期刊: Journal of Water Supply : Research and Technology - Aqua
• 作者: Hiroshi Sakai;Tatsuro Takamatsu;Kumiko Oguma;Michio Murakami;Koji Kosaka;Mari Asami;and Satoshi Takizawa
• 通讯作者: and Satoshi Takizawa

Change in Haloacetic Acid Formation Potential during UV and UV/H2O2 Treatment of Model Organic Compounds

模型有机化合物在 UV 和 UV/H2O2 处理过程中卤乙酸形成电位的变化

• 发表时间: 2019
• 作者: Hiroshi Sakai;Olivier Autin;Simon Parsons
• 通讯作者: Simon Parsons

紫外線処理過程におけるNDMA生成能の変化

紫外线处理过程中NDMA生成能力的变化

• 发表时间: 2012
• 作者: 酒井宏治;高松達朗;小熊久美子;村上道夫;小坂浩司;浅見真理;滝沢智
• 通讯作者: 滝沢智