Fabrication of field emission and microdischarge devices using femtosemnd laser lithop-aphy
使用飞秒激光光刻技术制造场发射和微放电装置
基本信息
- 批准号:18360354
- 负责人:
- 金额:$ 11.05万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (B)
- 财政年份:2006
- 资助国家:日本
- 起止时间:2006 至 2007
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
In this study, we fabricated field emission and micro-discharge devices using femtosecond laser lithography. The experimental results are as follows:1. Femtosecond laser lithographyWe proposed the combined process of femtosemnd laser-induced nonlinear lithography and etching processes. This process enables to fabricate microstructures onto nonpanar substrates, which is rather difficult for the conventional photolithography processes.2. Space-selective growth of carbon nanotubes on a microelectrode tipThe patterns were formed on Au thin films by field emitted electron beams extracted from the microelectrode tips overall coated with carbon nanotubes. We investigated the effect of curvature radius, gap length between electrodes and applied voltages on the microfabrication of Au thin films by field emitted electron beams. The increases of curvature radius and applied voltages were effective for pattern formation by field emission, resulting in the patterns of 2μm diameters were created. Carbon nanotubes were space-selectively grown only on the top part of a microelectrode tip. The patterns of approximately 2μm diameters could be formed by using the microelectrodes with CNTs.3. Arrayed microdischarge cavitiesArrays of hollow cathode microelectrode cavities were fabricated in Si wafers by semiconductor technology. The diameter of individual cavity was 30μm. Stable glow discharges were generated in atmospheric pressure of Ar gas. The patterns of 33 μm diameters were successfully formed on a resist thin film by using maskless microdischarge processes with O_2 and Ar mixed gas.
在这项研究中,我们使用飞秒板仪制造了田间发射和微设备。通过从碳纳米管涂层的尖端提取的薄膜,我们研究了电极和施加的电压,并通过Auther d em -thin膜通过AUTHIN D发射的电子束在Au薄膜上进行了涂层。对于野外发射,形成了2μm直径的模式在AR气体的气动性Ssure中产生。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Field emission current and vacuum breakdown by a pointed cathode
- DOI:10.1016/j.tsf.2006.02.085
- 发表时间:2007-03
- 期刊:
- 影响因子:2.1
- 作者:Y. Hirata;K. Ozaki;U. Ikeda;M. Mizoshiri
- 通讯作者:Y. Hirata;K. Ozaki;U. Ikeda;M. Mizoshiri
Three-dimensional lithography using a self-trapped filament of femtosecond laser pulses
使用飞秒激光脉冲自陷灯丝进行三维光刻
- DOI:
- 发表时间:2006
- 期刊:
- 影响因子:0
- 作者:M.;Mizoshiri;H.;Nishiyama;Y.;Hirata;J.;Nishii;T.;Kawahara;T.;Kawai
- 通讯作者:Kawai
Formation of periodic structures by the space-selective precipitation of Ge nanoparticles in channel waveguides
通过通道波导中Ge纳米粒子的空间选择性沉淀形成周期性结构
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:H.Nishiyama;Y.Hirata;I.Miyamoto;J.Nishii
- 通讯作者:J.Nishii
マイクロプラズマ生成のための微細電極構造の作製
用于产生微等离子体的精细电极结构的制造
- DOI:
- 发表时间:2007
- 期刊:
- 影响因子:0
- 作者:正森良輔;西山宏昭;伊庭知宏;溝尻瑞枝;平田好則
- 通讯作者:平田好則
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HIRATA Yoshinori其他文献
HIRATA Yoshinori的其他文献
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{{ truncateString('HIRATA Yoshinori', 18)}}的其他基金
Research on Micro-Thermal Materials Processing with Pulsed Field Emission Current
脉冲场发射电流微热材料加工研究
- 批准号:
14350387 - 财政年份:2002
- 资助金额:
$ 11.05万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Experimental research of thermal processing phenomena by micro-arc
微弧热处理现象的实验研究
- 批准号:
10450271 - 财政年份:1998
- 资助金额:
$ 11.05万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Development of micro-arc welding process
微弧焊接工艺的发展
- 批准号:
07555219 - 财政年份:1995
- 资助金额:
$ 11.05万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Sutudy on bridging tranfer phenomena in Gas Metal Arc welding
熔化极气体保护焊桥接过渡现象的研究
- 批准号:
04650663 - 财政年份:1992
- 资助金额:
$ 11.05万 - 项目类别:
Grant-in-Aid for General Scientific Research (C)
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