Deposition Behaviors of Co-Ni and Co-Fe alloys by Electrochemical Graphoepitaxy
Co-Ni 和 Co-Fe 合金的电化学石墨外延沉积行为
基本信息
- 批准号:12650741
- 负责人:
- 金额:$ 2.43万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2000
- 资助国家:日本
- 起止时间:2000 至 2001
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The electrodeposition of Co-Fe and Co-Ni alloys, which can be applied to the magnetic materials for records, has been noticed in recent years, since this method have been the economical and simple process in comparison with other method such as chemical vapor deposition and spattering.In such situation, we have prepared the thin film of Co-Fe and Cc-Ni alloys by the electrodeposition. Moreover, we have specified the optimum experimental condition on the preparation of these alloys and analyzed the lattice structure and surface morphology of them. The composition of these alloys prepared in this work only depends on that of the electrolyte bath. Then, the deposition behavior on this preparation shows anomalous type. Based on this result, we have selected the copper single crystal [Cu (100), Cu (110), Cu (111)] as a substrate, which would enable the epitaxial growth of these alloys, from the viewpoint of misfit to C axis of cobalt. In Co-Fe system, the thin film prepared on Cu (100) and Cu (110) has poly-crystal. On the other hand, that on Cu (111) has the strongly orientation. These knowledge obtained in this work indicate the possibility to the practical application of electrochemical graphoepitaxy of Co-Fe or Co-Ni alloys.
Co-Fe和Co-Ni合金的电沉积可应用于记录用磁性材料,近年来受到关注,因为与化学气相沉积等其他方法相比,该方法经济且简单。针对这种情况,我们采用电沉积的方法制备了Co-Fe和Cc-Ni合金薄膜。此外,我们还确定了制备这些合金的最佳实验条件,并对它们的晶格结构和表面形貌进行了分析。本工作中制备的这些合金的成分仅取决于电解液的成分。然后,该制剂上的沉积行为表现出反常类型。基于这一结果,我们选择铜单晶[Cu(100)、Cu(110)、Cu(111)]作为衬底,从与C轴失配的角度来看,这将使这些合金能够外延生长钴。在Co-Fe体系中,在Cu(100)和Cu(110)上制备的薄膜具有多晶。另一方面,Cu(111)上的取向性较强。这项工作中获得的这些知识表明了 Co-Fe 或 Co-Ni 合金电化学石墨外延实际应用的可能性。
项目成果
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