A New CVD Method Using DC Plasma above the Liquid Surface

一种在液面上方使用直流等离子体的新 CVD 方法

基本信息

批准号：
11305052
负责人：
SUZUKI Takeyuki
金额：
$ 19.78万
依托单位：
Tokyo University of Agriculture and Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A).
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2000
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11305052/
关键词：
DC Plasma Chemical Vapor Deposition Plasma Jet Diamond Titanium Oxide CVD Film Electric Discharge 液体

项目摘要

[Purpose] The aim of this research is to develop a new film formation technique assisted by DC plasma1 using liquid as starting materials. The principle lies in generating the gaseous chemical species by sputtering the liquid. 1. Film Formation on Metal Substrate (Electrode)(1) Diamond forming liquid of alcohol-water system was investigated. High quality diamond was deposited at a rate of about 20 micron m/h using 40〜90 mol % methanol and 10〜20 mol % ethanol. (2) Highly (110) oriented rutile-type TiO2 films were formed using dilute aqueous solutions. TiO2 was also formed by immersing the quartz substrate in the plasma which was generated by sputtering the aqueous TiCl3 solution. (3) Sputtering yield of water was found to be about 100〜1000 under the applied voltage of about 1 kV.The yield is two orders of magnitude greater than that of metals. Further investigation is underway. 2. Plasma Jet Generation and its application to Film Formation (1) Conditions for plasma jet generation were investigated separating the liquid chamber and the substrate chamber by a copper nozzle. (2) Diamond film was formed locally by hitting the silicon wafer with the jet. (3) Deposition on a few mm diameter area was successfully demonstrated using one nozzle. Further experiments are planned for larger area deposition using a multi-nozzle system.

[目的]这项研究的目的是开发一种新的膜形成技术，在DC Plasma1使用液体作为起始材料的帮助下。原理在于通过溅射液体来产生气态化学物种。 1。在金属底物（电极）上形成膜（1）钻石形成酒精水系统的液体。使用40-90 mol％甲醇和10-20 mol％乙醇以约20微米/小时的速度沉积高质量的钻石。（2）使用稀水溶液形成高度（110）个面向的金红石型TiO2膜。 TIO2也是通过将石英底物浸入血浆中来形成的，该血浆是通过溅射TICL3溶液而产生的。（3）在大约1 kV的施加电压下发现水的溅射率约为100-1000。产量比金属大两个数量级。进一步调查正在进行中。 2。血浆喷气机及其在膜形成中的应用（1）血浆喷气生成的条件，通过铜喷嘴将液体室和底物腔室分开。（2）钻石膜是通过用喷气机击中硅晶片的本地形成的。（3）使用一个喷嘴成功证明了对几毫米直径区域的沉积。计划进一步实验，以使用多核对系统进行更大的面积沉积。