STUDY OF ULTRA-FINE STRUCTURED OPTICAL COMPONENTS USIING MICROMACHINING

利用微加工技术研究超细结构光学元件

• 批准号: 10305020
• 负责人: HANE Kazuhiro
• 金额: $ 25.22万
• 依托单位: TOHOKU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10305020/
• 关键词: GRATING; ANTI-REFLECTION; MICROMACHINING; SUB-WAVELENGTH; ETCHING; NANO-OPTICS; サブ波長格子; グレーティング; 反射防止; モスアイ構造; 微細格子; 電子線描画; シリコン; 光学素子; 回折格子; 高アスペクト比エッチング; 無反射表面

We proposed a fabrication technique for sub-wavelength grating using electron-beam drawing machine and fast atom beam etching machine. On the surface of nonconductive optical glass, 150nm period surface gratings were fabricated. The etching of the nonconductive surface was carried out by using advantageously the neutral fast atom beam instead of ions in the conventional etching plasma. Without charging the surface, the deep etched profile with high aspect ratio was obtained. Using the proposed method, the reflection from the optical glass surface was suppressed considerably.A program for calculating the rigorous electro-magnetic field in sub-wavelength grating was developed. It was revealed that the reflection properties were influenced very much by the period and aspect ratio of the gratings.Using porous alumina membrane as a mask, the sub-wavelength gratings having 100nm period and the aspect ratio of 6 were fabricated on Si substrate. In the wavelength region from 370nm to 800nm, the superior properties for anti-reflection were obtained. Moreover, sub-wavelength gratings were also fabricated on the surface of the gallium arsenic light emission diode. Using the etching property of GaAs, tapered profile of surface grating was fabricated and a increase of the light emission was successfully obtained. In addition, the combinations between the surface gratings and micro-actuators were also investigated.

我们提出了一种使用电子束绘图机和快速原子束蚀刻机的制造技术，用于次波长光栅。在非导电玻璃的表面上，制造了150nm的周期表面光栅。通过有利地使用中性快速原子束而不是离子在常规蚀刻等离子体中进行蚀刻表面的蚀刻。在没有充电表面的情况下，获得了高纵横比的深蚀刻曲线。使用所提出的方法，从光玻璃表面进行了大量抑制。开发了用于计算次波长光栅中严格的电磁场的程序。据揭示，反射特性受到光栅的周期和纵横比的影响很大。使用多孔氧化铝膜作为掩模，具有100nm周期的亚波长光栅，在SI底物上制造了6个纵横比。在从370nm到800nm的波长区域中，获得了抗反流的优质特性。此外，还在砷砷发射二极管的表面上制造了次波长。使用GAA的蚀刻特性，制造了表面光栅的锥形曲线，并成功获得了光发射的增加。此外，还研究了表面光栅和微型演员之间的组合。

项目成果

Y.Kanamori,M.Sasaki,K.Hane: "Antireflection structures for visible and infrared wave lengths fabricated on silicon substrates by fast atom beam etching" Proc.Opt.Eng.for Sensing and Nanotechnology. 1(印刷中). (1999)

Y.Kanamori、M.Sasaki、K.Hane：“通过快速原子束蚀刻在硅基底上制造可见光和红外波长的抗反射结构”Proc.Opt.Eng.for Sensing and Nanotechnology 1（正在出版）。 ）

Y.Kanamori, H.Kikuta, K.Hane: "Broadband antireflection gratings for glass substrates fabricated by fast atom beam etching"Jpn. J. Appl. Phys. Part2. 39. L735-L737 (2000)

Y.Kanamori、H.Kikuta、K.Hane：“通过快速原子束蚀刻制造的玻璃基板的宽带抗反射光栅”Jpn。

H.Sai,H.Yagami.Y.Akiyama,Y.Kanamori,K.Hane: "Spectorl control of thermal emission by periodic microstructured surfaces"Journal Optics A : pure Applied Optics. (in press).

H.Sai、H.Yagami.Y.Akiyama、Y.Kanamori、K.Hane：“周期性微结构表面热发射的光谱控制”光学杂志 A：纯应用光学。

S.Kumagai,M.Sasaki,M.Koyanagi,K.Hane: "Dominance of Cl_2^- or Cl^+ Ions in Time-Modulated Inductively Coupled Cl_2 Plasma Investigated with Laser-Induced Fluorescence and Probe Measurement "Japan Journal of Applied Phusics. 39. 6980-6984 (2000)

S.Kumagai、M.Sasaki、M.Koyanagi、K.Hane：“用激光诱导荧光和探针测量研究时间调制感应耦合 Cl_2 等离子体中 Cl_2^- 或 Cl^ 离子的优势”日本应用物理学杂志。

Y.Li,M.Sasaki,K.Hane: "A Simple Si Pitch-variable Grating With Shape Memory Alloy Actuator"電気学会論文誌E. 120・11. 503-508 (2000)

Y.Li、M.Sasaki、K.Hane：“带有形状记忆合金执行器的简单硅间距可变光栅”IEEJ Transactions E. 120・11 (2000)。