"Development of Scanning Laser Micro-polariscope and its Applications for Stress Evaluation"

《扫描激光微偏光镜的研制及其在应力评估中的应用》

• 批准号: 07555034
• 负责人: NIITSU Yasushi
• 金额: $ 3.01万
• 依托单位: Tokyo Denki University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1996
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555034/
• 关键词: Stress Measurement; Laser Photoelasticity; Nondestructive Evaluation; Experimental Strss Analysis; シリコン単結晶

We have developed an optical equipment that possesses high detection sensitivity for measuring the small optical retardation induced by small stress by means of laser photoelasticity. A He-Ne laser is used as a light source to measure small stress in transparent materials. We worked on the theory and process of the measurement of optical retardation in the materials. The magnitudes of principal stress difference and the directions of the principal stress are obtained simultaneously and quantitatively using our equipment. To evaluate the validity of the measurement results of the equiment, the stress distribution of a pulled rectangular glass plate with notches at both sides is measured using the equipment. The experimental results of stress distribution agree well with the analytical results of FEM.The stress distribution can be determined quickly by using the equipment and scanning stress distribution measurement has been realized. The features of the developed optical equipment and future applications are as follows,(1)This optical equipment has high resolution power of measurement less than 1 nm retardation and this technology can be applicable to the static and dynamic force evaluations in bio-membrane, bio-cell and several kinds of thin layrs,(2)This method can achieve the spatial-resolution of about 12 micrometer and has possibility of higher spatial-resolution up to 1 micrometer with the lens system like a microscope.

我们开发了一种具有高检测灵敏度的光学设备，可以利用激光光弹性来测量由小应力引起的小光学延迟。使用氦氖激光器作为光源来测量透明材料中的小应力。我们致力于材料光学延迟测量的理论和过程。使用我们的设备同时定量地获得主应力差的大小和主应力的方向。为了评估设备测量结果的有效性，使用该设备测量了两侧有缺口的拉制矩形玻璃板的应力分布。应力分布实验结果与有限元分析结果吻合较好，利用该设备可以快速确定应力分布，实现了扫描应力分布测量。所开发的光学设备的特点和未来应用如下：（1）该光学设备具有测量延迟小于1 nm的高分辨率，该技术可适用于生物膜、生物材料等领域的静态和动态力评估。细胞和多种薄层，（2）该方法可以实现约12微米的空间分辨率，并且具有像显微镜一样的透镜系统高达1微米的更高空间分辨率的可能性。

项目成果

Y. NIITSU: "“Scanning Stress Measurement Method by Laser Photoelasticity"" JSME Int. Journal Series-A. 38-4. 500-505 (1995)

Y. NIITSU：“激光光弹性扫描应力测量方法”，JSME Int. Series-A 500-505。

K.Gomi, Y.Niitsu: "Effect of Crystalline Orientation on Photoelastic Property of Si Single Crystal (in Japanese)" Trans.of JSME,Series-A. Vol.62, No.604. 2651-2656 (1996)

K.Gomi、Y.Niitsu：“晶体取向对硅单晶光弹性性能的影响（日文）”Trans.of JSME，Series-A。

新津・五味・一瀬: "走査型レーザ光弾性法の開発" 日本機械学会論文集. 62-600,A. 123-128 (1996)

Niitsu、Gomi 和 Ichinose：“扫描激光光弹性方法的发展”，日本机械工程师学会会刊 62-600，A 123-128 (1996)。

Kenji GOMI and Yasushi Niitsu: "Photoelastic Property of Gallium Arsenide Crystal" Proc.of ASME Int.,Intersociety Electronic & Photonic Packaging Conference. (印刷中). (1997)

Kenji GOMI 和 Yasushi Niitsu：“砷化镓晶体的光弹性”Proc.，ASME 国际电子与光子封装会议（1997 年）。

Y.Niitsu, K.Gomi, T.Ono: "Investigation of Photoelastic Property of Semiconductor Wafers" Proc.of Appl.Exp.Mech.Elec.Pack.ASME. AMD-Vol.214. 103-108 (1995)

Y.Niitsu、K.Gomi、T.Ono：“半导体晶圆光弹性特性的研究”Proc.of Appl.Exp.Mech.Elec.Pack.ASME。