DEVELOPMENT OF MULTI-ANODE ARC DISCHARGE PLASMA JET CVD APPARATUS FOR DIAMOND SYNTHESIS

金刚石合成多阳极电弧放电等离子体喷射CVD装置的研制

基本信息

  • 批准号:
    09355005
  • 负责人:
  • 金额:
    $ 16.9万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
  • 财政年份:
    1997
  • 资助国家:
    日本
  • 起止时间:
    1997 至 1998
  • 项目状态:
    已结题

项目摘要

This research aimed to develop a synthesis apparatus of high purity diamond and diamond like carbon film at higher growth rate on large area. The apparatus developed consists of a plasma source, power supply, gas feed system, vacuum system, cooling system and a reaction chamber. Connection flanges for the plasma source to activate carbon atoms and an ion beam source to sputter graphite target, a window for laser beam are mounted on the reaction chamber wall. Diamond and diamond like carbon films are synthesized from carbon atoms vaporized by ion beam sputtering or laser ablation, which activated with plasma jet includes electron up to 80A.Synthesis of carbon films were performed by sputtering of graphite target with argon ion beam under various plasma source power, substrate arrangement and bias voltage. Carbon films deposited were characterized by Raman spectroscopy, FT-IR and friction test. Raman spectra shows the carbon films that have different structure from conventional diamond like carbon films were synthesized by increasing plasma source power at shorter distance between a substrate and the source. Moreover, the carbon film shows no absorption band in infrared region and low friction coefficient of 0.05 between steel ball in air.
这项研究旨在开发出高纯度钻石和钻石的合成设备,例如碳膜,在大​​面积上以较高的生长速度。开发的设备由等离子体来源,电源,气体进料系统,真空系统,冷却系统和反应室组成。血浆源的连接法兰激活碳原子和离子束源以溅射石墨目标,将激光束的窗口安装在反应室壁上。钻石和钻石之类的碳膜是由通过离子束溅射或激光消融蒸发的碳原子合成的,该碳原子被等离子体喷气激活的碳原子包括最高80A的电子。碳膜的融合是通过在各种血浆源源源和BBIAS sudstrate and substrate and substrate and byias volictage和Bias soptage和Bias volicement和Biias volicement and Biias volictage和BaiiS soptage ssudtage和Bagias beam的溅射进行的。沉积的碳膜以拉曼光谱,FT-IR和摩擦测试为特征。拉曼光谱显示,通过增加基板和源之间较短距离的等离子体源功率来合成与传统钻石不同结构的碳膜。此外,碳膜在红外区域没有吸收带,在空气中钢球之间的低摩擦系数为0.05。

项目成果

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YOSHIKAWA Masanori其他文献

YOSHIKAWA Masanori的其他文献

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{{ truncateString('YOSHIKAWA Masanori', 18)}}的其他基金

'The lung- gut network'contributes to development of chronic obstructive pulmonary disease (COPD).
“肺-肠网络”导致慢性阻塞性肺病(COPD)的发展。
  • 批准号:
    20590903
  • 财政年份:
    2008
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Mechanical Properties of CVD Diamond
CVD 金刚石的机械性能
  • 批准号:
    14550105
  • 财政年份:
    2002
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Development of Transparent Diamond Plates Synthesis Apparatus by magnetic field assisted Arc Discharge Plasma Jet
磁场辅助电弧放电等离子射流透明金刚石板合成装置的研制
  • 批准号:
    07555037
  • 财政年份:
    1995
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Fundamental Study on a Synthesis Apparatus of Transparent Diamond Films by Chemical Vapor Deposition
化学气相沉积透明金刚石薄膜合成装置的基础研究
  • 批准号:
    06452157
  • 财政年份:
    1994
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Development of low temperatuer diamond synthesis apparatus using high magnetic field assisted dc plasma
高磁场辅助直流等离子体低温金刚石合成装置的研制
  • 批准号:
    05555042
  • 财政年份:
    1993
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Evaluation of the Mechanical Properties of Chemical vapor deposited Diamond Plate
化学气相沉积金刚石板力学性能评价
  • 批准号:
    04452129
  • 财政年份:
    1992
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
Development of Diamond Chemical Vapor Deposition Apparatus at High Growth Rate
高增长率金刚石化学气相沉积装置的开发
  • 批准号:
    03555024
  • 财政年份:
    1991
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Developmental Scientific Research (B)
Evaluation of Mechanical and Electrical Properties of Diamond Synthesized from Gas Phase
气相合成金刚石的机械和电学性能评价
  • 批准号:
    01460089
  • 财政年份:
    1989
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)

相似国自然基金

气体循环直流旋转电弧等离子体喷射动态气相环境下生长金刚石大单晶研究
  • 批准号:
    51102013
  • 批准年份:
    2011
  • 资助金额:
    25.0 万元
  • 项目类别:
    青年科学基金项目

相似海外基金

Development of in-liquid plasma jet production method and synthesis of diamond semiconductor crystal
液体等离子射流生产方法的开发及金刚石半导体晶体的合成
  • 批准号:
    20K05170
  • 财政年份:
    2020
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
A New CVD Method Using DC Plasma above the Liquid Surface
一种在液面上方使用直流等离子体的新 CVD 方法
  • 批准号:
    11305052
  • 财政年份:
    1999
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A).
Development of a Large-Diameter Thermal Plasma Processing Device and its Application to Synthesis of Thermoelectric Materials
大直径热等离子体加工装置的研制及其在热电材料合成中的应用
  • 批准号:
    07558066
  • 财政年份:
    1995
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Development of Transparent Diamond Plates Synthesis Apparatus by magnetic field assisted Arc Discharge Plasma Jet
磁场辅助电弧放电等离子射流透明金刚石板合成装置的研制
  • 批准号:
    07555037
  • 财政年份:
    1995
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Fundamental Study on a Synthesis Apparatus of Transparent Diamond Films by Chemical Vapor Deposition
化学气相沉积透明金刚石薄膜合成装置的基础研究
  • 批准号:
    06452157
  • 财政年份:
    1994
  • 资助金额:
    $ 16.9万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
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