Limited super resolution of optical lithography by applying quantum optical inetefrence

应用量子光学干涉的光学光刻有限超分辨率

基本信息

批准号：
15560036
负责人：
SHIBUYA Masato
金额：
$ 2.3万
依托单位：
Tokyo Polytechnic University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2003
资助国家：
日本
起止时间：
2003 至 2004
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-15560036/
关键词：
Super Resolution Quantum Optics Optical Lithography 光リソグラフィー

项目摘要

By using the entangled two-photon pair and two-photon absorption resist, the super resolution method had been proposed. But for practical realization of this method, we found that it has conflicting needs that the light field should be sufficiently weak to contain only two photons per mode yet should be sufficiently strong to excite two-photon absorption especially for high throughput. We propose the new method that allows the use of intense coherent light field yet still produces super-resolution by use of polarization-dependent two-photon absorption resist. In our proposed scheme, the coherent laser light is incident on the PBS(Polarization Beam Splitter) and is divided into P-polarized coherent light and S-polarized coherent light. On the polarization-dependent two-photon absorption resist, these two beams interfere with each other and the super resolution can be obtained. Our proposal can be regarded as the quantum interference between the two excited electron wave-functions, one w … More ave-function is caused by the transition of absorption of two P-polarized photons and the other is caused by two S-polarized photons. These results have been presented in the NGL(New Generation Lithography) workshop 2003 and in the Physical Society of Japan Autumn Meeting 2003 and is published in Nonliner Optics Quantum Optics Vol.32(2004).As polarization-dependent two-photon phenomenon is observed in CuCl crystal, we have researched experimentally by exposing laser light. We had tried to expose the super resolution pattern in the Azo-benzene polymer in 2003Fy and in KRFLR-Y200N in 2004Fy. But we have not observed clearly the two-photon absorption.As the scheme of two beam interference is not practical, we discuss the super resolution can be obtained or not when the conventional optical lithograph configuration, which has the conjugate reticle and wafer, is adopted. We have found that the super resolution can be hardly obtained in the conventional configuration and presented at NGL 2003. Also we have continuously considered not only the scheme of object and image as conjugate relation but also the scheme of pupil and image as relation of Fourier transformation. Less

通过使用纠缠的两光子对和两光子滥用耐药性，已经提出了超级分辨率方法。但是，为了实现这种方法，我们发现它具有相互矛盾的需求，即光场应该足够弱，只能在每种模式中只包含两张照片，但应足够强大，可以激发两光侵蚀的滥用，尤其是对于高吞吐量。我们提出了一种新方法，该方法允许使用强烈的相干光场，但仍然通过使用依赖极化的两光损耗的电阻来产生超分辨率。在我们提出的方案中，相干激光入射在PBS（极化束分离器）上，并将其分为P偏振相干光和S偏振相干光。在依赖极化的两光子损耗电阻上，这两个梁相互干扰，可以获得超级分辨率。我们的建议可以被认为是两个激发电子波功能之间的量子干扰，一个w…更多的AVE功能是由两张P偏振照片的痛苦过渡引起的，另一个是由两个S极化照片引起的。这些结果已在NGL（新一代光刻）2003年和日本物理学会2003年的秋季会议上介绍，并发表在Nonliner Optics量子量子量子光学第32卷（2004年）中。由于极化依赖性的两光子现象在CUCL晶体中观察到了Cucl Crystal，我们已经通过expimentiment expimentiment expimentiment expimentiment expimentiment expiment expiment expimentiment expiment expiment expiment expiment。我们曾试图在2003年FY和2004年FY中揭露偶氮偶氮聚合物的超级分辨率模式。但是我们尚未清楚地观察到两光子滥用。由于两个光束干扰的方案是不切实际的，因此我们可以在采用具有共轭率和晶圆的常规光刻构型构型时获得超级分辨率。我们发现，超级分辨率几乎可以在常规构型中获得，并在NGL 2003中呈现。我们还继续将对象和图像方案视为共轭关系，还将瞳孔和图像方案视为傅立叶变换的关系。较少的