Study on Heat and Mass Transfer in the Magnetic Fields Applied Czochralski Method

磁场中传热传质应用直拉法研究

• 批准号: 02452143
• 负责人: FUKUDA Tsuguo
• 金额: $ 3.78万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1990
• 资助国家: 日本
• 起止时间: 1990 至 1991
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-02452143/
• 关键词: Single Crystal; Czochralski Method; Applied Magnetic Field; Convective Phenomena; Heat Transfer; 融液内対流; 自然対流; マランゴニ対流; 磁界印加結晶育成; 半導体結晶; 半導体混晶; 酸化物結晶; 熱・物質の移動現象

1. Effects of applied magnetic field on convection in melt :Temperature distributions on the melt surface under the conditions with or without magnetic fields were observed by the thermoviewer system. As increasing strength of the applied magnetic field, dominant heat transfer in the melt changed from convective transfer to conductive one. A remote sensing system for convective phenomena under the applied magnetic field conditions was developed. We successfully estimated very weak convection, which could not be observed on the melt surface, by using this method.2. Control of mass transfer by applied magnetic field :A mechanism of oxygen transfer during silicon crystal growth by Czochralski method was clarified. A new magnetic field applied system, Cusp magnetic field, was developed and applied to silicon crystal growth by Czochralski method. We could control the oxygen concentration in the grown crystal with uniform distribution of oxygen along the growth direction and in the wafer.3. Development of strong magnetic field applied system :A vertical Bridgeman with strong magnetic field up to 80, 000 Gauss available was developed.

1. 外加磁场对熔体对流的影响：通过热观察仪系统观察有磁场和无磁场条件下熔体表面的温度分布。随着施加磁场强度的增加，熔体中的主要传热方式从对流传递转变为传导传递。开发了外加磁场条件下对流现象的遥感系统。利用该方法我们成功地估计了熔体表面无法观测到的非常弱的对流。 2．通过施加磁场控制传质：阐明了直拉法硅晶体生长过程中氧转移的机制。开发了一种新的磁场应用系统Cusp磁场，并将其应用于直拉法硅晶体生长。我们可以控制生长晶体中的氧浓度，使氧沿生长方向和晶片均匀分布。 3．强磁场应用系统的开发：开发了强磁场高达80, 000高斯的立式Bridgeman。

项目成果

S.Kan,M.Sakamoto,Y.Okano T.Fukuda,J Sato,T.Tsukada H.Hozawa and N.Imaishi: "Characteristics of Thermal Field in LiNbO_3 Single Crystal Grown by the Czochralski Method" J.Crystal Growth.

S.Kan，M.Sakamoto，Y.Okano T.Fukuda，J Sato，Tsukada H.Hozawa和N.Imaishi：“直拉法生长的LiNbO_3单晶的热场特征”J.Crystal Growth。

M.Amano,K.Kumoyama,M.Kasuga,Y.Okano,H.Hoshkawa and T.Fukuda: "Remote Sensing of Induced Current in Conductor Moving in Magnetic Field" J.Crystal Growth.

M.Amano、K.Kumoyama、M.Kasuga、Y.Okano、H.Hoshkawa 和 T.Fukuda：“磁场中运动导体感应电流的遥感”J.晶体生长。

H. Hirata and K. Hoshikawa: "Three-Dimensional Numerical Analysis of the Effect of a Cusp Magnetic Field on the Flow, Oxygen Transport and Heat Transfer in a Czochralski Silicon Melt" J. Crystal Growth.

H. Hirata 和 K. Hoshikawa：“尖点磁场对直拉硅熔体中流动、氧传输和传热影响的三维数值分析”J. 晶体生长。

S.Kan,M.Sakamoto,Y.Okano,T.Fukuda,J Sato,T.Tsukada,H.Hozawa and N.Imaishi: "Characteristics of Thermal Field in LiNbO_3 Single Crystal Grown by the Czochralski Method" J.Crystal Growth.

S.Kan，M.Sakamoto，Y.Okano，T.Fukuda，J Sato，Tsukada，H.Hozawa和N.Imaishi：“直拉法生长的LiNbO_3单晶的热场特征” J.Crystal Growth

Yasumori Okano: "Numerical study on Czochralski growth of oxide crystals." J.Crystal Growth. 109. 94-98 (1991)

Yasumori Okano：“氧化物晶体直拉法生长的数值研究。”