MRI: Acquisition of an Electron Beam Lithography System for Quantum Engineering and Nanoscience Research, Education and Training

MRI：采购用于量子工程和纳米科学研究、教育和培训的电子束光刻系统

• 批准号: 2215550
• 负责人: Juliet Gopinath
• 金额: $ 137.9万
• 依托单位: University of Colorado at Boulder
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2022
• 资助国家: 美国
• 起止时间: 2022-09-01 至 2025-08-31
• 项目状态: 未结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=2215550&HistoricalAwards=false
• 关键词: MRI; Acquisition; Electron; Beam; Lithography

Abstract TitleThe acquisition of a state-of-the-art electron beam lithography system that will enable high resolution patterning of materials and devices.AbstractThe capability of high-resolution patterning a wide range of materials into nanostructures is a fundamental requirement for almost all solid-state materials and device research. This has been instrumental in key technological advancements including high-performance classical and quantum computing, photonic communications, chip-scale optical frequency combs, integrated sensors, energy harvesting, and flexible electronics. Future breakthroughs will lead to long-distance quantum networks, fault-tolerant quantum computers, miniature chip-scale optical clocks, new materials for thermal transport, personalized medicine, and nanosensors for force, position and navigation. The proposed acquisition of a state-of-the-art electron beam lithography (EBL) system at University of Colorado Boulder will provide the required nanofabrication capabilities. It will greatly enhance scientific research and education for a broad array of researchers and students, including under-represented groups, in the Rocky Mountain Region, as well as nationwide. This will help to address the national need for expertise in the semiconductor and quantum industries. The EBL’s unique capabilities have attracted over 64 research programs, with strong interest in an electron beam lithography system at University of Colorado Boulder. The system will provide the region’s only state-of-the-art 100 kV electron beam writer in an open access shared user facility. The goal of the project is the acquisition of a state-of-the-art electron beam lithography system at the University of Colorado Boulder that will enable nanofabrication capabilities in terms of high pattern resolution, large field of view, low stitching/overlay errors and features with low side-wall roughness. Research on solid-state nano-scale devices requires the ability to produce complex, high-quality patterns on functional materials. For further progress, fabrication techniques that yield nanometer-scale resolution, low roughness, and high quality devices are critical. Electron beam lithography, with its wide applicability to a vast array of materials, nanometer-scale resolution, and ability to produce high quality devices is well-suited to the next generation of devices that will form the backbone of nano-, photonic, quantum and electronic technology. The system will spark a wide array of nanoscience and quantum engineering research, transforming materials and device research in the Rocky Mountain region and on a national scale. The proposed EBL system will greatly enhance regional and national research and collaboration in the areas of quantum technologies, photonics, sensing and metrology, bioengineering, and energy, providing fabrication capabilities currently unavailable to most researchers and students in the Rocky Mountain Region. It will be a cornerstone for the research at the University of Colorado Boulder, as well as for the broader research community and industry in the Rocky Mountain Region and across the United States.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.

抽象滴定了最先进的电子束岩性系统的获取，该系统将使材料和设备的高分辨率模式化。取得几乎所有固态材料和设备研究的高分辨率将各种材料构成纳米结构的能力是基本要求。这在关键的技术进步中发挥了重要作用，包括高性能经典和量子计算，光子通信，芯片尺度的光频梳，集成传感器，能量收集和灵活的电子设备。未来的突破将导致长距离量子网络，容忍故障的量子计算机，微型芯片尺度光学时钟，用于热传输的新材料，个性化医学和纳米传感器，用于力，位置和导航。拟议的科罗拉多大学博尔德大学最先进的电子束岩性（EBL）系统的收购将提供所需的纳米纳法功能。它将为洛矶山脉地区以及国家范围内的各种研究人员和学生（包括代表性不足的群体）以及包括代表性不足的群体（包括代表性不足的群体）增强科学研究和教育。这将有助于满足半导体和量子行业中国家对专业知识的需求。 EBL的独特功能吸引了64多个研究计划，对科罗拉多大学博尔德大学的电子束岩性系统感兴趣。该系统将在开放访问共享用户设施中为该地区提供该地区唯一的最先进的100 kV电子束作者。该项目的目的是在科罗拉多大学博尔德大学获得最先进的电子束光刻系统，该系统将在高模式分辨率，较大的视野，低缝线/叠加层/叠加错误和具有低侧壁粗糙度的特征方面实现纳米化功能。对固态纳米级设备的研究需要在功能材料上产生复杂的高质量模式的能力。为了进一步的进展，产生纳米尺度分辨率，低粗糙度和高质量设备的制造技术至关重要。电子束光刻图具有广泛的适用性，可用于大量材料，纳米尺度分辨率以及生产高质量设备的能力，非常适合下一代的设备，这些设备将形成纳米，光子，量子，量子和电子技术的骨干。该系统将引发各种各样的纳米科学和量子工程研究，在落基山地区和国家规模上改变材料和设备研究。拟议的EBL系统将极大地增强量子技术，光子学，敏感性和计量，生物工程以及能源领域的区域和国家研究和合作，从而为落基山地区的大多数研究人员和学生提供了织物能力。这将是科罗拉多大学博尔德大学以及落基山地区和整个美国的更广泛的研究社区和工业研究的基石。该奖项反映了NSF的法定任务，并通过基金会的知识分子优点和更广泛的影响来评估NSF的法定任务。